DE69730185T2 - Verfahren und vorrichtung zur herstellung von substraten mit dünnen filmen - Google Patents
Verfahren und vorrichtung zur herstellung von substraten mit dünnen filmen Download PDFInfo
- Publication number
- DE69730185T2 DE69730185T2 DE69730185T DE69730185T DE69730185T2 DE 69730185 T2 DE69730185 T2 DE 69730185T2 DE 69730185 T DE69730185 T DE 69730185T DE 69730185 T DE69730185 T DE 69730185T DE 69730185 T2 DE69730185 T2 DE 69730185T2
- Authority
- DE
- Germany
- Prior art keywords
- film
- film forming
- substrates
- substrate
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 488
- 238000000034 method Methods 0.000 title claims abstract description 129
- 239000010409 thin film Substances 0.000 title claims abstract description 109
- 239000010408 film Substances 0.000 claims abstract description 1034
- 239000002245 particle Substances 0.000 claims abstract description 157
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 17
- 230000015572 biosynthetic process Effects 0.000 claims description 130
- 238000012549 training Methods 0.000 claims description 61
- 230000008569 process Effects 0.000 claims description 48
- 230000003287 optical effect Effects 0.000 claims description 33
- 239000000463 material Substances 0.000 claims description 29
- 238000010438 heat treatment Methods 0.000 claims description 13
- 230000008859 change Effects 0.000 claims description 12
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 238000007733 ion plating Methods 0.000 claims description 8
- 238000007738 vacuum evaporation Methods 0.000 claims description 8
- 239000012788 optical film Substances 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 238000012544 monitoring process Methods 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 4
- 230000008020 evaporation Effects 0.000 claims description 4
- 239000004973 liquid crystal related substance Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 39
- 238000007796 conventional method Methods 0.000 abstract description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 29
- 239000011347 resin Substances 0.000 description 28
- 229920005989 resin Polymers 0.000 description 28
- 239000001301 oxygen Substances 0.000 description 27
- 229910052760 oxygen Inorganic materials 0.000 description 27
- 150000002500 ions Chemical class 0.000 description 18
- 239000000523 sample Substances 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 16
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 14
- 229910052681 coesite Inorganic materials 0.000 description 13
- 229910052906 cristobalite Inorganic materials 0.000 description 13
- 239000000377 silicon dioxide Substances 0.000 description 13
- 230000003595 spectral effect Effects 0.000 description 13
- 229910052682 stishovite Inorganic materials 0.000 description 13
- 229910052905 tridymite Inorganic materials 0.000 description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 12
- 229910004298 SiO 2 Inorganic materials 0.000 description 11
- -1 argon ions Chemical class 0.000 description 11
- 210000002381 plasma Anatomy 0.000 description 11
- 229910010413 TiO 2 Inorganic materials 0.000 description 10
- 238000011282 treatment Methods 0.000 description 10
- 230000000704 physical effect Effects 0.000 description 9
- 238000007740 vapor deposition Methods 0.000 description 9
- 241001136792 Alle Species 0.000 description 8
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 8
- 230000003667 anti-reflective effect Effects 0.000 description 8
- 229920003023 plastic Polymers 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- 230000033001 locomotion Effects 0.000 description 6
- 238000010924 continuous production Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000009434 installation Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- 238000009489 vacuum treatment Methods 0.000 description 4
- 238000002679 ablation Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000002123 temporal effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 241001295925 Gegenes Species 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000002596 correlated effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000007872 degassing Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000006479 redox reaction Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 210000002023 somite Anatomy 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 210000002268 wool Anatomy 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002627 poly(phosphazenes) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000007666 vacuum forming Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Vapour Deposition (AREA)
- Inorganic Insulating Materials (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7884096 | 1996-04-01 | ||
| JP7884096 | 1996-04-01 | ||
| PCT/JP1997/001054 WO1997037051A1 (fr) | 1996-04-01 | 1997-03-27 | Procede de fabrication d'un substrat a couche mince et dispositif de fabrication |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69730185D1 DE69730185D1 (de) | 2004-09-16 |
| DE69730185T2 true DE69730185T2 (de) | 2005-08-18 |
Family
ID=13673031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69730185T Expired - Fee Related DE69730185T2 (de) | 1996-04-01 | 1997-03-27 | Verfahren und vorrichtung zur herstellung von substraten mit dünnen filmen |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5993614A (enExample) |
| EP (1) | EP0834596B1 (enExample) |
| KR (1) | KR19990022135A (enExample) |
| AT (1) | ATE273403T1 (enExample) |
| DE (1) | DE69730185T2 (enExample) |
| TW (1) | TW320687B (enExample) |
| WO (1) | WO1997037051A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020003578A1 (de) | 2020-05-20 | 2021-11-25 | Schneider Gmbh & Co. Kg | Beschichtungsanlage, Spannring und Magazin für Brillengläser und Verfahren zum Beschichten von Brillengläsern |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3370806B2 (ja) * | 1994-11-25 | 2003-01-27 | 株式会社半導体エネルギー研究所 | Ｍｉｓ型半導体装置の作製方法 |
| US6742066B2 (en) * | 1999-05-17 | 2004-05-25 | Hewlett-Packard Development Company, L.P. | System and method for controlling remote console functionality assist logic |
| US6275744B1 (en) * | 1997-08-01 | 2001-08-14 | Kokusai Electric Co., Ltd. | Substrate feed control |
| US6556189B1 (en) * | 1998-04-24 | 2003-04-29 | Nissha Printing Co., Ltd. | Touch panel device |
| JP4345158B2 (ja) * | 1999-10-15 | 2009-10-14 | ソニー株式会社 | 光学部品の製造装置及び製造方法 |
| KR100323991B1 (ko) * | 1999-11-16 | 2002-02-16 | 이경희 | 박막 제조 방법 및 제조 장치 |
| TW490714B (en) | 1999-12-27 | 2002-06-11 | Semiconductor Energy Lab | Film formation apparatus and method for forming a film |
| US20020011205A1 (en) | 2000-05-02 | 2002-01-31 | Shunpei Yamazaki | Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device |
| US6881269B2 (en) * | 2000-08-17 | 2005-04-19 | Novartis Ag | Lens plasma coating system |
| CN1216302C (zh) * | 2001-02-27 | 2005-08-24 | 精工爱普生株式会社 | 多层膜截止滤波器及其制造方法 |
| JP2002363733A (ja) * | 2001-06-04 | 2002-12-18 | Nippon Sheet Glass Co Ltd | 被膜の形成方法 |
| JP4120546B2 (ja) * | 2002-10-04 | 2008-07-16 | 株式会社Ｉｈｉ | 薄膜形成方法及び装置並びに太陽電池の製造方法及び装置並びに太陽電池 |
| US20040121146A1 (en) * | 2002-12-20 | 2004-06-24 | Xiao-Ming He | Composite barrier films and method |
| JP4476073B2 (ja) * | 2004-04-08 | 2010-06-09 | 東北パイオニア株式会社 | 有機ｅｌ素子の製造方法及び製造装置 |
| JP2006058473A (ja) * | 2004-08-18 | 2006-03-02 | Oyokoden Lab Co Ltd | 誘電体多層膜フィルタ及びその製造方法 |
| WO2006024031A2 (en) | 2004-08-23 | 2006-03-02 | Hewlett-Packard Development Company, L.P. | Method and apparatus for redirection of video data |
| KR101017187B1 (ko) * | 2004-08-31 | 2011-02-25 | 엘지디스플레이 주식회사 | 스토커 시스템 |
| US20060181266A1 (en) * | 2005-02-14 | 2006-08-17 | Panelvision Technology, A California Corporation | Flat panel display inspection system |
| JP4462197B2 (ja) * | 2006-01-23 | 2010-05-12 | ソニー株式会社 | 光学ローパスフィルタ |
| DE102006057386A1 (de) * | 2006-12-04 | 2008-06-05 | Uhde Gmbh | Verfahren zum Beschichten von Substraten |
| US8318245B2 (en) | 2007-02-23 | 2012-11-27 | Essilor International (Compagnie Generale D'optique) | Method for producing an optical article coated with an antireflection or a reflective coating having improved adhesion and abrasion resistance properties |
| FR2913116B1 (fr) * | 2007-02-23 | 2009-08-28 | Essilor Int | Procede de fabrication d'un article optique revetu d'un revetement anti-reflets ou reflechissant ayant des proprietes d'adhesion et de resistance a l'abrasion ameliorees |
| JP2008033341A (ja) * | 2007-08-21 | 2008-02-14 | Seiko Epson Corp | 多層膜カットフィルターの製造方法 |
| WO2009086494A2 (en) * | 2007-12-27 | 2009-07-09 | Exatec, Llc | Multi-pass vacuum coating systems |
| JP5153410B2 (ja) * | 2008-03-31 | 2013-02-27 | Ｈｏｙａ株式会社 | レンズ成膜方法、蒸着装置及びレンズの製造方法 |
| TWI383207B (zh) | 2008-12-25 | 2013-01-21 | Chunghwa Picture Tubes Ltd | 背光模組之電路板固定結構 |
| CN101988186B (zh) * | 2009-08-04 | 2013-08-21 | 鸿富锦精密工业（深圳）有限公司 | 工件真空溅镀方法及装置 |
| JP2013104127A (ja) * | 2011-11-16 | 2013-05-30 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
| CN103403584B (zh) * | 2011-11-21 | 2016-10-19 | 旭硝子株式会社 | 带光学多层膜的玻璃构件和近红外线截止滤光片玻璃 |
| JP6243898B2 (ja) | 2012-04-19 | 2017-12-06 | インテヴァック インコーポレイテッド | 太陽電池製造のための２重マスク装置 |
| US10062600B2 (en) | 2012-04-26 | 2018-08-28 | Intevac, Inc. | System and method for bi-facial processing of substrates |
| SG11201406893XA (en) | 2012-04-26 | 2014-11-27 | Intevac Inc | System architecture for vacuum processing |
| KR101336225B1 (ko) * | 2012-05-30 | 2013-12-03 | 주식회사 선익시스템 | 기판의 이송속도 조절을 통해 고 증착효율을 갖는 인라인 증착 시스템 |
| CN106688088B (zh) | 2014-08-05 | 2020-01-10 | 因特瓦克公司 | 注入掩膜及对齐 |
| EA034967B1 (ru) * | 2018-05-04 | 2020-04-13 | Общество С Ограниченной Ответственностью "Изовак Технологии" | Технологическая линия для формирования тонкопленочных покрытий в вакууме (варианты) |
| TWI774936B (zh) * | 2019-03-08 | 2022-08-21 | 台灣愛司帝科技股份有限公司 | 承載結構及承載設備 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62260059A (ja) * | 1986-05-02 | 1987-11-12 | Seiko Epson Corp | スパツタ装置 |
| US4859493A (en) * | 1987-03-31 | 1989-08-22 | Lemelson Jerome H | Methods of forming synthetic diamond coatings on particles using microwaves |
| JPS644472A (en) * | 1987-06-25 | 1989-01-09 | Toshiba Corp | Sputtering device |
| JPH0335216A (ja) * | 1989-06-30 | 1991-02-15 | Matsushita Electric Ind Co Ltd | 連続式スパッタ装置およびカラー液晶用基板の製造方法 |
| JPH03193873A (ja) * | 1989-12-21 | 1991-08-23 | Shinku Kikai Kogyo Kk | 連続真空薄膜形成方法および装置 |
| DE4111384C2 (de) * | 1991-04-09 | 1999-11-04 | Leybold Ag | Vorrichtung zur Beschichtung von Substraten |
| US5815396A (en) * | 1991-08-12 | 1998-09-29 | Hitachi, Ltd. | Vacuum processing device and film forming device and method using same |
| US5215420A (en) * | 1991-09-20 | 1993-06-01 | Intevac, Inc. | Substrate handling and processing system |
| US5250660A (en) * | 1991-11-12 | 1993-10-05 | Eli Lilly And Company | Peptide purification process |
| US5474611A (en) * | 1992-05-20 | 1995-12-12 | Yoichi Murayama, Shincron Co., Ltd. | Plasma vapor deposition apparatus |
| JPH0665724A (ja) * | 1992-05-20 | 1994-03-08 | Yoichi Murayama | インラインプラズマ蒸着装置 |
| JPH07278801A (ja) * | 1994-04-13 | 1995-10-24 | Idemitsu Material Kk | 真空成膜装置 |
-
1997
- 1997-03-26 TW TW086103845A patent/TW320687B/zh active
- 1997-03-27 KR KR1019970708614A patent/KR19990022135A/ko not_active Abandoned
- 1997-03-27 US US08/973,312 patent/US5993614A/en not_active Expired - Fee Related
- 1997-03-27 WO PCT/JP1997/001054 patent/WO1997037051A1/ja not_active Ceased
- 1997-03-27 EP EP97908528A patent/EP0834596B1/en not_active Expired - Lifetime
- 1997-03-27 AT AT97908528T patent/ATE273403T1/de not_active IP Right Cessation
- 1997-03-27 DE DE69730185T patent/DE69730185T2/de not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020003578A1 (de) | 2020-05-20 | 2021-11-25 | Schneider Gmbh & Co. Kg | Beschichtungsanlage, Spannring und Magazin für Brillengläser und Verfahren zum Beschichten von Brillengläsern |
Also Published As
| Publication number | Publication date |
|---|---|
| ATE273403T1 (de) | 2004-08-15 |
| WO1997037051A1 (fr) | 1997-10-09 |
| EP0834596A4 (en) | 2003-03-26 |
| EP0834596B1 (en) | 2004-08-11 |
| DE69730185D1 (de) | 2004-09-16 |
| TW320687B (enExample) | 1997-11-21 |
| US5993614A (en) | 1999-11-30 |
| EP0834596A1 (en) | 1998-04-08 |
| KR19990022135A (ko) | 1999-03-25 |
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