DE69719614D1 - UV-härtbare Polysiloxanzusammensetzung und Verfahren zur Herstellung gehärteter Muster daraus - Google Patents

UV-härtbare Polysiloxanzusammensetzung und Verfahren zur Herstellung gehärteter Muster daraus

Info

Publication number
DE69719614D1
DE69719614D1 DE69719614T DE69719614T DE69719614D1 DE 69719614 D1 DE69719614 D1 DE 69719614D1 DE 69719614 T DE69719614 T DE 69719614T DE 69719614 T DE69719614 T DE 69719614T DE 69719614 D1 DE69719614 D1 DE 69719614D1
Authority
DE
Germany
Prior art keywords
polysiloxane composition
curable polysiloxane
making cured
patterns therefrom
cured patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69719614T
Other languages
English (en)
Other versions
DE69719614T2 (de
Inventor
Brain R Harkness
Mamoru Tachikawa
Kasumi Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Toray Specialty Materials KK
Original Assignee
Dow Corning Asia Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Asia Ltd filed Critical Dow Corning Asia Ltd
Application granted granted Critical
Publication of DE69719614D1 publication Critical patent/DE69719614D1/de
Publication of DE69719614T2 publication Critical patent/DE69719614T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/07—Aldehydes; Ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/20—Carboxylic acid amides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69719614T 1996-06-27 1997-06-26 UV-härtbare Polysiloxanzusammensetzung und Verfahren zur Herstellung gehärteter Muster daraus Expired - Lifetime DE69719614T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8167488A JPH1010741A (ja) 1996-06-27 1996-06-27 紫外線硬化性ポリシロキサン組成物およびこれを用いた硬化物パターンの製造方法
JP16748896 1996-06-27

Publications (2)

Publication Number Publication Date
DE69719614D1 true DE69719614D1 (de) 2003-04-17
DE69719614T2 DE69719614T2 (de) 2004-02-19

Family

ID=15850619

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69719614T Expired - Lifetime DE69719614T2 (de) 1996-06-27 1997-06-26 UV-härtbare Polysiloxanzusammensetzung und Verfahren zur Herstellung gehärteter Muster daraus

Country Status (4)

Country Link
US (2) US6051625A (de)
EP (1) EP0816419B9 (de)
JP (1) JPH1010741A (de)
DE (1) DE69719614T2 (de)

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US6177143B1 (en) * 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
US20040058090A1 (en) * 2001-09-14 2004-03-25 Carlo Waldfried Low temperature UV pretreating of porous low-k materials
US7041748B2 (en) * 2003-01-08 2006-05-09 International Business Machines Corporation Patternable low dielectric constant materials and their use in ULSI interconnection
CN1570762B (zh) * 2003-03-03 2010-10-13 罗姆和哈斯电子材料有限责任公司 聚合物和含有该聚合物的光刻胶
WO2007086323A1 (ja) * 2006-01-24 2007-08-02 Asahi Kasei Emd Corporation 感光性樹脂組成物
KR100857521B1 (ko) * 2006-06-13 2008-09-08 엘지디스플레이 주식회사 박막트랜지스터 제조용 몰드의 제조방법 및 그 제조장비
US8349410B2 (en) * 2006-08-17 2013-01-08 University of Pittsburgh—of the Commonwealth System of Higher Education Modification of surfaces with polymers
JP2008203613A (ja) * 2007-02-21 2008-09-04 Asahi Kasei Electronics Co Ltd ポリオルガノシロキサン組成物
JP4932527B2 (ja) * 2007-02-21 2012-05-16 旭化成イーマテリアルズ株式会社 ポリオルガノシロキサン組成物
CN101646978B (zh) * 2007-04-04 2011-11-02 旭化成电子材料株式会社 感光性树脂组合物
US9488916B2 (en) 2007-04-08 2016-11-08 Immunolight, Llc. Interior energy-activation of photo-reactive species inside a medium or body
US8376013B2 (en) 2008-03-11 2013-02-19 Duke University Plasmonic assisted systems and methods for interior energy-activation from an exterior source
US8133644B2 (en) * 2007-10-31 2012-03-13 3M Innovative Properties Company Method of forming an image having multiple phases
US7998587B2 (en) 2007-10-31 2011-08-16 3M Innovative Properties Company Method of modifying light with silicone (meth)acrylate copolymers
US7838200B2 (en) * 2007-12-13 2010-11-23 International Business Machines Corporation Photoresist compositions and method for multiple exposures with multiple layer resist systems
US7838198B2 (en) * 2007-12-13 2010-11-23 International Business Machines Corporation Photoresist compositions and method for multiple exposures with multiple layer resist systems
KR100965434B1 (ko) * 2008-01-29 2010-06-24 한국과학기술연구원 졸-겔 및 광경화 반응에 의해 광경화 투명고분자 내에금속산화물 나노입자를 포함하는 게이트 절연층을 이용한유기박막 트랜지스터 및 그의 제조방법
WO2009105662A1 (en) 2008-02-21 2009-08-27 Immunolight, Llc. Methods and systems for treating cell proliferation disorders using plasmonics enhanced photospectral therapy (pepst) and exciton-plasmon enhanced phototherapy (epep)
KR101541939B1 (ko) * 2008-03-05 2015-08-04 다우 코닝 코포레이션 실세스퀴옥산 수지
CA2720513C (en) 2008-04-04 2018-09-25 Immunolight, Llc Non-invasive systems and methods for in-situ photobiomodulation
US8323866B2 (en) 2008-07-08 2012-12-04 Massachusetts Institute Of Technology Inorganic resist sensitizer
US8158338B2 (en) 2008-07-08 2012-04-17 Massachusetts Institute Of Technology Resist sensitizer
US8394573B2 (en) 2010-09-16 2013-03-12 International Business Machines Corporation Photoresist compositions and methods for shrinking a photoresist critical dimension
EP2729175B1 (de) 2011-07-08 2021-12-01 Duke University System zur lichtstimulation in einem medium
JP5411919B2 (ja) * 2011-12-02 2014-02-12 旭化成イーマテリアルズ株式会社 ポリオルガノシロキサン組成物
JP5652387B2 (ja) * 2011-12-22 2015-01-14 信越化学工業株式会社 高信頼性硬化性シリコーン樹脂組成物及びそれを使用した光半導体装置
CN107615168B (zh) 2015-06-11 2023-12-19 日产化学工业株式会社 感放射线性组合物
JP6603115B2 (ja) * 2015-11-27 2019-11-06 信越化学工業株式会社 ケイ素含有縮合物、ケイ素含有レジスト下層膜形成用組成物、及びパターン形成方法
JP7104161B2 (ja) * 2017-10-26 2022-07-20 サイド・タイムール・アフマド 疎水性、疎油性および親油性コーティングのための非ニュートン流体を含む組成物、およびその使用方法
JP2019095695A (ja) * 2017-11-27 2019-06-20 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ ネガ型感光性シロキサン組成物、ならびにそれを用いた硬化膜および電子素子の製造方法
CN112292638B (zh) * 2018-04-24 2024-06-11 美国陶氏有机硅公司 正色调可光图案化有机硅
CN118271848A (zh) * 2024-05-06 2024-07-02 东莞市泰亚电子科技有限公司 一种耐高温的硅橡胶复合材料的制备工艺

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1257435B (de) * 1961-08-07 1967-12-28 Elfriede Husemann Dr Verfahren zur Herstellung von Polysiloxanen mit endstaendig ungesaettigten Gruppen
JPS60238827A (ja) * 1984-05-14 1985-11-27 Nippon Telegr & Teleph Corp <Ntt> 感光性樹脂組成物
US4702990A (en) * 1984-05-14 1987-10-27 Nippon Telegraph And Telephone Corporation Photosensitive resin composition and process for forming photo-resist pattern using the same
JPH0640221B2 (ja) * 1985-03-29 1994-05-25 インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション ネガティブ・レジスト組成物を使用したリソグラフィ方法
US4693960A (en) * 1985-03-29 1987-09-15 International Business Machines Corporation Photolithographic etching process using organosilicon polymer composition
JP2868672B2 (ja) * 1992-08-31 1999-03-10 沖電気工業株式会社 シリコーン樹脂組成物及びこれを用いたケイ酸ガラス薄膜の製造方法

Also Published As

Publication number Publication date
US6258506B1 (en) 2001-07-10
EP0816419B1 (de) 2003-03-12
EP0816419B9 (de) 2003-10-22
EP0816419A3 (de) 1998-05-20
EP0816419A2 (de) 1998-01-07
JPH1010741A (ja) 1998-01-16
DE69719614T2 (de) 2004-02-19
US6051625A (en) 2000-04-18

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