DE69715056D1 - Verfahren und Gerät zur Erzeugung feiner Muster auf Leiterplatten - Google Patents

Verfahren und Gerät zur Erzeugung feiner Muster auf Leiterplatten

Info

Publication number
DE69715056D1
DE69715056D1 DE69715056T DE69715056T DE69715056D1 DE 69715056 D1 DE69715056 D1 DE 69715056D1 DE 69715056 T DE69715056 T DE 69715056T DE 69715056 T DE69715056 T DE 69715056T DE 69715056 D1 DE69715056 D1 DE 69715056D1
Authority
DE
Germany
Prior art keywords
printed circuit
circuit boards
fine patterns
producing fine
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69715056T
Other languages
English (en)
Other versions
DE69715056T2 (de
Inventor
Alan E Ferry
Maureen Yee Lau
Joon Han Byung
Scruton, Sr
King Lien Tai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nokia of America Corp
Original Assignee
Lucent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucent Technologies Inc filed Critical Lucent Technologies Inc
Application granted granted Critical
Publication of DE69715056D1 publication Critical patent/DE69715056D1/de
Publication of DE69715056T2 publication Critical patent/DE69715056T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DE69715056T 1996-01-16 1997-01-14 Verfahren und Gerät zur Erzeugung feiner Muster auf Leiterplatten Expired - Lifetime DE69715056T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/586,347 US5834160A (en) 1996-01-16 1996-01-16 Method and apparatus for forming fine patterns on printed circuit board

Publications (2)

Publication Number Publication Date
DE69715056D1 true DE69715056D1 (de) 2002-10-10
DE69715056T2 DE69715056T2 (de) 2003-05-22

Family

ID=24345372

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69715056T Expired - Lifetime DE69715056T2 (de) 1996-01-16 1997-01-14 Verfahren und Gerät zur Erzeugung feiner Muster auf Leiterplatten

Country Status (4)

Country Link
US (1) US5834160A (de)
EP (1) EP0785471B1 (de)
JP (1) JP3280259B2 (de)
DE (1) DE69715056T2 (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19757074A1 (de) * 1997-12-20 1999-06-24 Zeiss Carl Fa Projektionsbelichtungsanlage und Belichtungsverfahren
US6383720B1 (en) * 1998-08-18 2002-05-07 Matsushita Electric Industrial Co., Ltd. Method of manufacturing fine pattern and printed circuit board manufactured with this method
US6246706B1 (en) 1999-05-27 2001-06-12 Spectra Physics Lasers, Inc. Laser writing method and apparatus
US6822978B2 (en) * 1999-05-27 2004-11-23 Spectra Physics, Inc. Remote UV laser system and methods of use
US6373565B1 (en) 1999-05-27 2002-04-16 Spectra Physics Lasers, Inc. Method and apparatus to detect a flaw in a surface of an article
US6421573B1 (en) * 1999-05-27 2002-07-16 Spectra Physics Lasers, Inc. Quasi-continuous wave lithography apparatus and method
US6734387B2 (en) 1999-05-27 2004-05-11 Spectra Physics Lasers, Inc. Method and apparatus for micro-machining of articles that include polymeric materials
AU6531600A (en) 1999-08-27 2001-03-26 Lex Kosowsky Current carrying structure using voltage switchable dielectric material
US7825491B2 (en) 2005-11-22 2010-11-02 Shocking Technologies, Inc. Light-emitting device using voltage switchable dielectric material
US7695644B2 (en) 1999-08-27 2010-04-13 Shocking Technologies, Inc. Device applications for voltage switchable dielectric material having high aspect ratio particles
US7446030B2 (en) 1999-08-27 2008-11-04 Shocking Technologies, Inc. Methods for fabricating current-carrying structures using voltage switchable dielectric materials
US6414884B1 (en) 2000-02-04 2002-07-02 Lucent Technologies Inc. Method and apparatus for securing electronic circuits
US6407341B1 (en) 2000-04-25 2002-06-18 International Business Machines Corporation Conductive substructures of a multilayered laminate
US6518516B2 (en) 2000-04-25 2003-02-11 International Business Machines Corporation Multilayered laminate
JP2004501405A (ja) * 2000-06-22 2004-01-15 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 光学イメージを形成する方法、この方法に用いるマスク、この方法を用いてデバイスを製造する方法、およびこの方法を遂行するための装置
SG103303A1 (en) 2000-07-07 2004-04-29 Nikon Corp Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method
KR20080084812A (ko) 2005-11-22 2008-09-19 쇼킹 테크놀로지스 인코포레이티드 과전압 보호를 위해 전압 변환가능 재료를 포함하는 반도체디바이스
US7968010B2 (en) 2006-07-29 2011-06-28 Shocking Technologies, Inc. Method for electroplating a substrate
KR20090055017A (ko) 2006-09-24 2009-06-01 쇼킹 테크놀로지스 인코포레이티드 스탭 전압 응답을 가진 전압 가변 유전 재료를 위한 조성물및 그 제조 방법
US7793236B2 (en) 2007-06-13 2010-09-07 Shocking Technologies, Inc. System and method for including protective voltage switchable dielectric material in the design or simulation of substrate devices
US8206614B2 (en) 2008-01-18 2012-06-26 Shocking Technologies, Inc. Voltage switchable dielectric material having bonded particle constituents
US8203421B2 (en) 2008-04-14 2012-06-19 Shocking Technologies, Inc. Substrate device or package using embedded layer of voltage switchable dielectric material in a vertical switching configuration
US9208931B2 (en) 2008-09-30 2015-12-08 Littelfuse, Inc. Voltage switchable dielectric material containing conductor-on-conductor core shelled particles
WO2010039902A2 (en) 2008-09-30 2010-04-08 Shocking Technologies, Inc. Voltage switchable dielectric material containing conductive core shelled particles
US8362871B2 (en) 2008-11-05 2013-01-29 Shocking Technologies, Inc. Geometric and electric field considerations for including transient protective material in substrate devices
US8399773B2 (en) 2009-01-27 2013-03-19 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
US8272123B2 (en) 2009-01-27 2012-09-25 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
US9226391B2 (en) 2009-01-27 2015-12-29 Littelfuse, Inc. Substrates having voltage switchable dielectric materials
CN102550132A (zh) 2009-03-26 2012-07-04 肖克科技有限公司 具有电压可切换电介质材料的元件
US9053844B2 (en) 2009-09-09 2015-06-09 Littelfuse, Inc. Geometric configuration or alignment of protective material in a gap structure for electrical devices
US9224728B2 (en) 2010-02-26 2015-12-29 Littelfuse, Inc. Embedded protection against spurious electrical events
US9082622B2 (en) 2010-02-26 2015-07-14 Littelfuse, Inc. Circuit elements comprising ferroic materials
US9320135B2 (en) 2010-02-26 2016-04-19 Littelfuse, Inc. Electric discharge protection for surface mounted and embedded components
US8885357B2 (en) * 2012-01-06 2014-11-11 Cray Inc. Printed circuit board with reduced cross-talk

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4387970A (en) * 1980-03-24 1983-06-14 Xerox Corporation Projection lens assembly
US4346987A (en) * 1980-07-18 1982-08-31 Xerox Corporation Printed circuit board projection imaging system
US4702994A (en) * 1984-10-01 1987-10-27 W. R. Grace & Co. Projection imaged relief printing plates
JPH0821531B2 (ja) * 1986-08-29 1996-03-04 株式会社ニコン 投影光学装置
CA2075026A1 (en) * 1991-08-08 1993-02-09 William E. Nelson Method and apparatus for patterning an imaging member

Also Published As

Publication number Publication date
EP0785471B1 (de) 2002-09-04
JPH09197678A (ja) 1997-07-31
JP3280259B2 (ja) 2002-04-30
EP0785471A3 (de) 1999-03-31
DE69715056T2 (de) 2003-05-22
EP0785471A2 (de) 1997-07-23
US5834160A (en) 1998-11-10

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