DE69711157T2 - Belichtungsapparat - Google Patents

Belichtungsapparat

Info

Publication number
DE69711157T2
DE69711157T2 DE69711157T DE69711157T DE69711157T2 DE 69711157 T2 DE69711157 T2 DE 69711157T2 DE 69711157 T DE69711157 T DE 69711157T DE 69711157 T DE69711157 T DE 69711157T DE 69711157 T2 DE69711157 T2 DE 69711157T2
Authority
DE
Germany
Prior art keywords
chamber
exposure device
exposure
heat insulating
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69711157T
Other languages
German (de)
English (en)
Other versions
DE69711157D1 (de
Inventor
Saburo Kamiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE69711157D1 publication Critical patent/DE69711157D1/de
Application granted granted Critical
Publication of DE69711157T2 publication Critical patent/DE69711157T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Public Health (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69711157T 1996-11-25 1997-11-24 Belichtungsapparat Expired - Fee Related DE69711157T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP31327596 1996-11-25
JP9280574A JPH10209040A (ja) 1996-11-25 1997-10-14 露光装置

Publications (2)

Publication Number Publication Date
DE69711157D1 DE69711157D1 (de) 2002-04-25
DE69711157T2 true DE69711157T2 (de) 2002-08-14

Family

ID=26553831

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69711157T Expired - Fee Related DE69711157T2 (de) 1996-11-25 1997-11-24 Belichtungsapparat

Country Status (4)

Country Link
EP (1) EP0844532B1 (enExample)
JP (1) JPH10209040A (enExample)
KR (1) KR19980042711A (enExample)
DE (1) DE69711157T2 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5529499A (en) 1998-09-14 2000-04-03 Nikon Corporation Exposure apparatus and its manufacturing method, and device producing method
TW588222B (en) * 2000-02-10 2004-05-21 Asml Netherlands Bv Cooling of voice coil motors in lithographic projection apparatus
EP1124161A3 (en) * 2000-02-10 2004-01-07 ASML Netherlands B.V. Lithographic projection apparatus having a temperature controlled heat shield
EP1178357A1 (en) * 2000-08-03 2002-02-06 Asm Lithography B.V. Lithographic apparatus
US6630984B2 (en) 2000-08-03 2003-10-07 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
KR100689705B1 (ko) * 2001-05-04 2007-03-08 삼성전자주식회사 투영 렌즈 온도 조절 수단을 구비하는 노광장치
US6598283B2 (en) 2001-12-21 2003-07-29 Cabot Corporation Method of preparing aerogel-containing insulation article
EP1477850A1 (en) * 2003-05-13 2004-11-17 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1491955A1 (en) 2003-06-27 2004-12-29 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
EP1510867A1 (en) 2003-08-29 2005-03-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7061579B2 (en) 2003-11-13 2006-06-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6977713B2 (en) * 2003-12-08 2005-12-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4614386B2 (ja) * 2005-02-04 2011-01-19 キヤノン株式会社 位置決め装置、露光装置およびそれを用いたデバイス製造方法
JP2006261273A (ja) * 2005-03-16 2006-09-28 Canon Inc チャンバおよびこれを用いた露光装置
NL1036433A1 (nl) 2008-01-31 2009-08-03 Asml Netherlands Bv Lithographic apparatus, method and device manufacturing method.
NL1036596A1 (nl) 2008-02-21 2009-08-24 Asml Holding Nv Re-flow and buffer system for immersion lithography.
CN101276150B (zh) * 2008-03-21 2010-06-02 上海微电子装备有限公司 一种步进重复曝光装置
NL2004453A (en) 2009-04-24 2010-10-26 Asml Netherlands Bv Lithographic apparatus having a substrate support with open cell plastic foam parts.
NL2005244A (en) * 2009-09-22 2011-03-23 Asml Netherlands Bv Support or table for lithographic apparatus, method of manufacturing such support or table and lithographic apparatus comprising such support or table.
JP6335480B2 (ja) * 2013-11-11 2018-05-30 キヤノン株式会社 露光装置、およびデバイスの製造方法
SG11201608032YA (en) 2014-04-30 2016-10-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US10133197B2 (en) 2014-07-16 2018-11-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2016298A (en) * 2015-03-23 2016-09-30 Asml Netherlands Bv Lithographic apparatus, and device manufacturing method
JP7360308B2 (ja) * 2019-11-25 2023-10-12 キヤノン株式会社 露光装置、露光方法、および物品製造方法
CN112925175A (zh) * 2021-01-29 2021-06-08 深圳市大族数控科技股份有限公司 一种曝光机

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58119638A (ja) * 1982-01-08 1983-07-16 Seiko Epson Corp 露光装置
US4564284A (en) * 1983-09-12 1986-01-14 Canon Kabushiki Kaisha Semiconductor exposure apparatus
JPS62296135A (ja) * 1986-06-17 1987-12-23 Nec Kyushu Ltd 縮小投影型露光装置
JP2794587B2 (ja) * 1989-01-30 1998-09-10 株式会社ニコン 投影露光装置
US4989031A (en) * 1990-01-29 1991-01-29 Nikon Corporation Projection exposure apparatus
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
US5376449A (en) * 1993-07-09 1994-12-27 Martin Marietta Energy Systems, Inc. Silica powders for powder evacuated thermal insulating panel and method
US5601897A (en) * 1994-10-17 1997-02-11 Owens-Corning Fiberglass Technology Inc. Vacuum insulation panel having carbonized asphalt coated glass fiber filler
JP3506158B2 (ja) * 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法

Also Published As

Publication number Publication date
KR19980042711A (ko) 1998-08-17
DE69711157D1 (de) 2002-04-25
JPH10209040A (ja) 1998-08-07
EP0844532A2 (en) 1998-05-27
EP0844532B1 (en) 2002-03-20
EP0844532A3 (en) 1999-08-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee