JPH10209040A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPH10209040A
JPH10209040A JP9280574A JP28057497A JPH10209040A JP H10209040 A JPH10209040 A JP H10209040A JP 9280574 A JP9280574 A JP 9280574A JP 28057497 A JP28057497 A JP 28057497A JP H10209040 A JPH10209040 A JP H10209040A
Authority
JP
Japan
Prior art keywords
exposure apparatus
heat insulating
chamber
insulating member
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9280574A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10209040A5 (enExample
Inventor
Saburo Kamiya
三郎 神谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9280574A priority Critical patent/JPH10209040A/ja
Priority to DE69711157T priority patent/DE69711157T2/de
Priority to EP97309445A priority patent/EP0844532B1/en
Priority to KR1019970062553A priority patent/KR19980042711A/ko
Publication of JPH10209040A publication Critical patent/JPH10209040A/ja
Priority to US09/907,763 priority patent/US6714278B2/en
Publication of JPH10209040A5 publication Critical patent/JPH10209040A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Public Health (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9280574A 1996-11-25 1997-10-14 露光装置 Pending JPH10209040A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP9280574A JPH10209040A (ja) 1996-11-25 1997-10-14 露光装置
DE69711157T DE69711157T2 (de) 1996-11-25 1997-11-24 Belichtungsapparat
EP97309445A EP0844532B1 (en) 1996-11-25 1997-11-24 Exposure apparatus
KR1019970062553A KR19980042711A (ko) 1996-11-25 1997-11-25 노광 장치
US09/907,763 US6714278B2 (en) 1996-11-25 2001-07-19 Exposure apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP31327596 1996-11-25
JP8-313275 1996-11-25
JP9280574A JPH10209040A (ja) 1996-11-25 1997-10-14 露光装置

Publications (2)

Publication Number Publication Date
JPH10209040A true JPH10209040A (ja) 1998-08-07
JPH10209040A5 JPH10209040A5 (enExample) 2005-06-30

Family

ID=26553831

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9280574A Pending JPH10209040A (ja) 1996-11-25 1997-10-14 露光装置

Country Status (4)

Country Link
EP (1) EP0844532B1 (enExample)
JP (1) JPH10209040A (enExample)
KR (1) KR19980042711A (enExample)
DE (1) DE69711157T2 (enExample)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000016381A1 (en) * 1998-09-14 2000-03-23 Nikon Corporation Exposure apparatus and its manufacturing method, and device producing method
US6598283B2 (en) 2001-12-21 2003-07-29 Cabot Corporation Method of preparing aerogel-containing insulation article
JP2005203754A (ja) * 2003-12-08 2005-07-28 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2006216866A (ja) * 2005-02-04 2006-08-17 Canon Inc 位置決め装置、露光装置およびそれを用いたデバイス製造方法
JP2006261273A (ja) * 2005-03-16 2006-09-28 Canon Inc チャンバおよびこれを用いた露光装置
US7359032B2 (en) 2003-08-29 2008-04-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009182326A (ja) * 2008-01-31 2009-08-13 Asml Netherlands Bv リソグラフィ装置、方法、およびデバイス製造方法
JP2009200494A (ja) * 2008-02-21 2009-09-03 Asml Holding Nv 液浸リソグラフィのリフロ及びバッファシステム
JP2010258448A (ja) * 2009-04-24 2010-11-11 Asml Netherlands Bv 開放気泡プラスチック発泡体部品がある基板支持体を有するリソグラフィ装置
JP2011071509A (ja) * 2009-09-22 2011-04-07 Asml Netherlands Bv リソグラフィ装置の支持体又はテーブル、そのような支持体又はテーブルの製造方法、及びそのような支持体又はテーブルを備えるリソグラフィ装置
JP2015095503A (ja) * 2013-11-11 2015-05-18 キヤノン株式会社 露光装置、およびデバイスの製造方法
JP2017515142A (ja) * 2014-04-30 2017-06-08 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
JP2021085911A (ja) * 2019-11-25 2021-06-03 キヤノン株式会社 露光装置、および物品製造方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW588222B (en) * 2000-02-10 2004-05-21 Asml Netherlands Bv Cooling of voice coil motors in lithographic projection apparatus
EP1124161A3 (en) * 2000-02-10 2004-01-07 ASML Netherlands B.V. Lithographic projection apparatus having a temperature controlled heat shield
EP1178357A1 (en) * 2000-08-03 2002-02-06 Asm Lithography B.V. Lithographic apparatus
US6630984B2 (en) 2000-08-03 2003-10-07 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
KR100689705B1 (ko) * 2001-05-04 2007-03-08 삼성전자주식회사 투영 렌즈 온도 조절 수단을 구비하는 노광장치
EP1477850A1 (en) * 2003-05-13 2004-11-17 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1491955A1 (en) 2003-06-27 2004-12-29 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7061579B2 (en) 2003-11-13 2006-06-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101276150B (zh) * 2008-03-21 2010-06-02 上海微电子装备有限公司 一种步进重复曝光装置
US10133197B2 (en) 2014-07-16 2018-11-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2016298A (en) * 2015-03-23 2016-09-30 Asml Netherlands Bv Lithographic apparatus, and device manufacturing method
CN112925175A (zh) * 2021-01-29 2021-06-08 深圳市大族数控科技股份有限公司 一种曝光机

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58119638A (ja) * 1982-01-08 1983-07-16 Seiko Epson Corp 露光装置
US4564284A (en) * 1983-09-12 1986-01-14 Canon Kabushiki Kaisha Semiconductor exposure apparatus
JPS62296135A (ja) * 1986-06-17 1987-12-23 Nec Kyushu Ltd 縮小投影型露光装置
JP2794587B2 (ja) * 1989-01-30 1998-09-10 株式会社ニコン 投影露光装置
US4989031A (en) * 1990-01-29 1991-01-29 Nikon Corporation Projection exposure apparatus
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
US5376449A (en) * 1993-07-09 1994-12-27 Martin Marietta Energy Systems, Inc. Silica powders for powder evacuated thermal insulating panel and method
US5601897A (en) * 1994-10-17 1997-02-11 Owens-Corning Fiberglass Technology Inc. Vacuum insulation panel having carbonized asphalt coated glass fiber filler
JP3506158B2 (ja) * 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6583857B2 (en) 1998-09-14 2003-06-24 Nikon Corporation Exposure apparatus and its making method, and device manufacturing method
WO2000016381A1 (en) * 1998-09-14 2000-03-23 Nikon Corporation Exposure apparatus and its manufacturing method, and device producing method
US6598283B2 (en) 2001-12-21 2003-07-29 Cabot Corporation Method of preparing aerogel-containing insulation article
US7679720B2 (en) 2003-08-29 2010-03-16 Asml Netherlands B.V. Apparatus configured to position a workpiece
US7359032B2 (en) 2003-08-29 2008-04-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005203754A (ja) * 2003-12-08 2005-07-28 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2006216866A (ja) * 2005-02-04 2006-08-17 Canon Inc 位置決め装置、露光装置およびそれを用いたデバイス製造方法
JP2006261273A (ja) * 2005-03-16 2006-09-28 Canon Inc チャンバおよびこれを用いた露光装置
US8310651B2 (en) 2008-01-31 2012-11-13 Asml Netherlands B.V. Lithographic apparatus, method and device manufacturing method
JP2009182326A (ja) * 2008-01-31 2009-08-13 Asml Netherlands Bv リソグラフィ装置、方法、およびデバイス製造方法
JP2009200494A (ja) * 2008-02-21 2009-09-03 Asml Holding Nv 液浸リソグラフィのリフロ及びバッファシステム
US8451422B2 (en) 2008-02-21 2013-05-28 Asml Netherlands B.V. Re-flow and buffer system for immersion lithography
JP2010258448A (ja) * 2009-04-24 2010-11-11 Asml Netherlands Bv 開放気泡プラスチック発泡体部品がある基板支持体を有するリソグラフィ装置
US8400617B2 (en) 2009-04-24 2013-03-19 Asml Netherlands B.V. Lithographic apparatus having a substrate support with open cell plastic foam parts
JP2011071509A (ja) * 2009-09-22 2011-04-07 Asml Netherlands Bv リソグラフィ装置の支持体又はテーブル、そのような支持体又はテーブルの製造方法、及びそのような支持体又はテーブルを備えるリソグラフィ装置
JP2015095503A (ja) * 2013-11-11 2015-05-18 キヤノン株式会社 露光装置、およびデバイスの製造方法
JP2017515142A (ja) * 2014-04-30 2017-06-08 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
US9921497B2 (en) 2014-04-30 2018-03-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2021085911A (ja) * 2019-11-25 2021-06-03 キヤノン株式会社 露光装置、および物品製造方法

Also Published As

Publication number Publication date
KR19980042711A (ko) 1998-08-17
DE69711157D1 (de) 2002-04-25
EP0844532A2 (en) 1998-05-27
EP0844532B1 (en) 2002-03-20
EP0844532A3 (en) 1999-08-18
DE69711157T2 (de) 2002-08-14

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