DE69701749D1 - Optische Halbleitervorrichtung, Herstellungsverfahren, Modulationsverfahren, Lichtquelle und optisches Kommunikationssystem oder Verfahren zu deren Herstellung - Google Patents
Optische Halbleitervorrichtung, Herstellungsverfahren, Modulationsverfahren, Lichtquelle und optisches Kommunikationssystem oder Verfahren zu deren HerstellungInfo
- Publication number
- DE69701749D1 DE69701749D1 DE69701749T DE69701749T DE69701749D1 DE 69701749 D1 DE69701749 D1 DE 69701749D1 DE 69701749 T DE69701749 T DE 69701749T DE 69701749 T DE69701749 T DE 69701749T DE 69701749 D1 DE69701749 D1 DE 69701749D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- light source
- semiconductor device
- communication system
- same
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/14—Semiconductor lasers with special structural design for lasing in a specific polarisation mode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06233—Controlling other output parameters than intensity or frequency
- H01S5/06236—Controlling other output parameters than intensity or frequency controlling the polarisation, e.g. TM/TE polarisation switching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3403—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having a strained layer structure in which the strain performs a special function, e.g. general strain effects, strain versus polarisation
- H01S5/3404—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having a strained layer structure in which the strain performs a special function, e.g. general strain effects, strain versus polarisation influencing the polarisation
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP02052896A JP3387720B2 (ja) | 1996-01-11 | 1996-01-11 | 偏波変調半導体レーザとその作製方法 |
JP20933296A JP3466826B2 (ja) | 1996-07-19 | 1996-07-19 | 利得優位な偏波モードの異なる複数種の活性層を持つ半導体光デバイス |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69701749D1 true DE69701749D1 (de) | 2000-05-31 |
DE69701749T2 DE69701749T2 (de) | 2000-09-07 |
Family
ID=26357492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69701749T Expired - Fee Related DE69701749T2 (de) | 1996-01-11 | 1997-01-09 | Optische Halbleitervorrichtung, Herstellungsverfahren, Modulationsverfahren, Lichtquelle und optisches Kommunikationssystem oder Verfahren zu deren Herstellung |
Country Status (3)
Country | Link |
---|---|
US (1) | US5946336A (de) |
EP (1) | EP0784366B1 (de) |
DE (1) | DE69701749T2 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3387746B2 (ja) * | 1996-07-31 | 2003-03-17 | キヤノン株式会社 | 屈曲チャンネルストライプの偏波変調可能な半導体レーザ |
JPH118442A (ja) | 1996-10-07 | 1999-01-12 | Canon Inc | 光半導体デバイス、それを用いた光通信システム及び方法 |
JP3006553B2 (ja) * | 1997-07-08 | 2000-02-07 | 日本電気株式会社 | 半導体集積型偏波モード変換器 |
JPH11243256A (ja) * | 1997-12-03 | 1999-09-07 | Canon Inc | 分布帰還形半導体レーザとその駆動方法 |
JPH11233898A (ja) | 1997-12-03 | 1999-08-27 | Canon Inc | 分布帰還型半導体レーザとその駆動方法 |
US6175446B1 (en) * | 1998-09-23 | 2001-01-16 | Sarnoff Corporation | Polarization-independent semiconductor optical amplifier |
US6470102B2 (en) | 2000-01-19 | 2002-10-22 | Finisar Corporation | All-polymer waveguide polarization modulator and method of mode profile control and excitation |
CA2411445C (en) | 2000-06-08 | 2011-08-16 | Nichia Corporation | Semiconductor laser device, and method of manufacturing the same |
US7009210B2 (en) * | 2000-10-06 | 2006-03-07 | Alphion Corporation | Method and apparatus for bit-rate and format insensitive performance monitoring of lightwave signals |
JP4789320B2 (ja) * | 2000-12-01 | 2011-10-12 | 富士通株式会社 | 半導体光増幅器 |
JP3652252B2 (ja) * | 2001-01-17 | 2005-05-25 | キヤノン株式会社 | 半導体光装置 |
WO2002061499A1 (en) * | 2001-02-01 | 2002-08-08 | The Regents Of The University Of California | Electroabsorption modulator having a barrier inside a quantum well |
US6834068B2 (en) * | 2001-06-29 | 2004-12-21 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser device and method for fabricating the same |
US20030068125A1 (en) * | 2001-09-28 | 2003-04-10 | The Furukawa Electric Co., Ltd. | Semiconductor laser device, semiconductor laser module and optical fiber amplifier using the semiconductor laser module |
JP4439193B2 (ja) * | 2003-03-20 | 2010-03-24 | 富士通株式会社 | 半導体光増幅器及び光増幅方法 |
KR100584412B1 (ko) * | 2003-10-10 | 2006-05-26 | 삼성전자주식회사 | 이득 고정된 반도체 광증폭기 |
JP2009025091A (ja) * | 2007-07-18 | 2009-02-05 | Canon Inc | センサー装置 |
JP4998238B2 (ja) * | 2007-12-07 | 2012-08-15 | 三菱電機株式会社 | 集積型半導体光素子 |
GB2465754B (en) * | 2008-11-26 | 2011-02-09 | Univ Dublin City | A semiconductor optical amplifier with a reduced noise figure |
US8594469B2 (en) * | 2008-12-22 | 2013-11-26 | Electronics And Telecommunications Research Institute | Optical amplifier |
US8599895B2 (en) | 2011-01-27 | 2013-12-03 | Rohm Co., Ltd. | Semiconductor laser device and manufacturing method thereof |
US8611386B2 (en) | 2011-01-27 | 2013-12-17 | Rohm Co., Ltd. | Semiconductor laser device and manufacturing method thereof |
CN111082312A (zh) * | 2019-11-29 | 2020-04-28 | 河南仕佳光子科技股份有限公司 | 一种省隔离器边发射光器件及制作方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4918701A (en) * | 1988-09-27 | 1990-04-17 | Siemens Aktiengesellschaft | Semiconductor laser arrangement and method for the operation thereof |
US5117469A (en) * | 1991-02-01 | 1992-05-26 | Bell Communications Research, Inc. | Polarization-dependent and polarization-diversified opto-electronic devices using a strained quantum well |
JP3226065B2 (ja) * | 1993-06-28 | 2001-11-05 | キヤノン株式会社 | 単一波長半導体レーザ |
JP3210159B2 (ja) * | 1993-12-10 | 2001-09-17 | キヤノン株式会社 | 半導体レーザ、光源装置、光通信システム及び光通信方法 |
EP0668641B1 (de) * | 1994-02-18 | 2001-06-06 | Canon Kabushiki Kaisha | Polarisationsselektiver Halbleiterlaser, Lichtsender und optisches Kommunikationssystem unter Verwendung dieses Lasers |
JPH07307530A (ja) * | 1994-03-17 | 1995-11-21 | Canon Inc | 偏波変調可能な半導体レーザ |
-
1996
- 1996-12-26 US US08/774,014 patent/US5946336A/en not_active Expired - Fee Related
-
1997
- 1997-01-09 DE DE69701749T patent/DE69701749T2/de not_active Expired - Fee Related
- 1997-01-09 EP EP97100259A patent/EP0784366B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69701749T2 (de) | 2000-09-07 |
EP0784366A2 (de) | 1997-07-16 |
US5946336A (en) | 1999-08-31 |
EP0784366A3 (de) | 1997-11-19 |
EP0784366B1 (de) | 2000-04-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |