DE69620371D1 - Verfahren zur Messung von Dimensionen von Mustern auf einer Probe - Google Patents
Verfahren zur Messung von Dimensionen von Mustern auf einer ProbeInfo
- Publication number
- DE69620371D1 DE69620371D1 DE69620371T DE69620371T DE69620371D1 DE 69620371 D1 DE69620371 D1 DE 69620371D1 DE 69620371 T DE69620371 T DE 69620371T DE 69620371 T DE69620371 T DE 69620371T DE 69620371 D1 DE69620371 D1 DE 69620371D1
- Authority
- DE
- Germany
- Prior art keywords
- samples
- sample
- measuring dimensions
- dimensions
- measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
- H01J2237/2814—Measurement of surface topography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
- H01J2237/2817—Pattern inspection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Electromagnetism (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7342932A JPH09184714A (ja) | 1995-12-28 | 1995-12-28 | パターン寸法測定方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69620371D1 true DE69620371D1 (de) | 2002-05-08 |
DE69620371T2 DE69620371T2 (de) | 2002-08-14 |
Family
ID=18357637
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69637937T Expired - Lifetime DE69637937D1 (de) | 1995-12-28 | 1996-12-20 | Verfahren und Apparat zur Messung von Musterdimensionen |
DE69620371T Expired - Lifetime DE69620371T2 (de) | 1995-12-28 | 1996-12-20 | Verfahren zur Messung von Dimensionen von Mustern auf einer Probe |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69637937T Expired - Lifetime DE69637937D1 (de) | 1995-12-28 | 1996-12-20 | Verfahren und Apparat zur Messung von Musterdimensionen |
Country Status (4)
Country | Link |
---|---|
US (1) | US5750990A (de) |
EP (2) | EP1102031B1 (de) |
JP (1) | JPH09184714A (de) |
DE (2) | DE69637937D1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109540050A (zh) * | 2017-09-22 | 2019-03-29 | 三星电子株式会社 | 关键尺寸测量系统和使用其测量关键尺寸的方法 |
Families Citing this family (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6452677B1 (en) * | 1998-02-13 | 2002-09-17 | Micron Technology Inc. | Method and apparatus for detecting defects in the manufacture of an electronic device |
US6476388B1 (en) * | 1998-10-19 | 2002-11-05 | Hitachi, Ltd. | Scanning electron microscope having magnification switching control |
US6517669B2 (en) * | 1999-02-26 | 2003-02-11 | Micron Technology, Inc. | Apparatus and method of detecting endpoint of a dielectric etch |
US6068955A (en) * | 1999-03-19 | 2000-05-30 | Vlsi Technology, Inc. | Methods of inspecting for mask-defined, feature dimensional conformity between multiple masks |
US6373053B1 (en) * | 2000-01-31 | 2002-04-16 | Advanced Micro Devices, Inc. | Analysis of CD-SEM signal to detect scummed/closed contact holes and lines |
JP2001304840A (ja) * | 2000-04-26 | 2001-10-31 | Advantest Corp | 電子ビーム測長装置及び測長方法 |
US6627887B1 (en) * | 2000-06-20 | 2003-09-30 | Advanced Micro Devices, Inc. | System and method for constructing a profile of a structure in an integrated circuit |
US6563116B1 (en) * | 2000-10-26 | 2003-05-13 | General Miosphorix Llc | Method of measuring sizes of trapezoidal structure |
KR100383258B1 (ko) * | 2000-11-09 | 2003-05-09 | 삼성전자주식회사 | 주사 전자 현미경을 이용한 측정 장치의 측정 에러 검출방법 |
DE10108827C2 (de) | 2001-02-23 | 2003-01-30 | Infineon Technologies Ag | Messverfahren zur Bestimmung der Breite einer Struktur auf einer Maske |
JP4035974B2 (ja) * | 2001-09-26 | 2008-01-23 | 株式会社日立製作所 | 欠陥観察方法及びその装置 |
US7274820B2 (en) * | 2001-09-26 | 2007-09-25 | Kabushiki Kaisha Toshiba | Pattern evaluation system, pattern evaluation method and program |
JP3944373B2 (ja) * | 2001-10-12 | 2007-07-11 | 株式会社日立ハイテクノロジーズ | 試料の測長方法、及び走査顕微鏡 |
JP2003329563A (ja) * | 2002-05-16 | 2003-11-19 | Seiko Instruments Inc | 走査型プローブ顕微鏡 |
DE10250893B4 (de) * | 2002-10-31 | 2008-04-03 | Advanced Micro Devices, Inc., Sunnyvale | Verfahren und Vorrichtung zum Bestimmen der Abmessung eines Strukturelements durch Variieren eines die Auflösung bestimmenden Parameters |
US20040234106A1 (en) * | 2003-05-23 | 2004-11-25 | Luu Victor Van | Method and apparatus for providing nanoscale dimensions to SEM (Scanning Electron Microscopy) or other nanoscopic images |
US7511280B2 (en) * | 2003-10-16 | 2009-03-31 | Alis Corporation | Ion sources, systems and methods |
US7485873B2 (en) * | 2003-10-16 | 2009-02-03 | Alis Corporation | Ion sources, systems and methods |
US7368727B2 (en) | 2003-10-16 | 2008-05-06 | Alis Technology Corporation | Atomic level ion source and method of manufacture and operation |
US7414243B2 (en) * | 2005-06-07 | 2008-08-19 | Alis Corporation | Transmission ion microscope |
US20070228287A1 (en) * | 2006-03-20 | 2007-10-04 | Alis Technology Corporation | Systems and methods for a gas field ionization source |
US7511279B2 (en) * | 2003-10-16 | 2009-03-31 | Alis Corporation | Ion sources, systems and methods |
US7786451B2 (en) * | 2003-10-16 | 2010-08-31 | Alis Corporation | Ion sources, systems and methods |
US7488952B2 (en) * | 2003-10-16 | 2009-02-10 | Alis Corporation | Ion sources, systems and methods |
US7557361B2 (en) * | 2003-10-16 | 2009-07-07 | Alis Corporation | Ion sources, systems and methods |
US7521693B2 (en) * | 2003-10-16 | 2009-04-21 | Alis Corporation | Ion sources, systems and methods |
US7601953B2 (en) * | 2006-03-20 | 2009-10-13 | Alis Corporation | Systems and methods for a gas field ion microscope |
US8110814B2 (en) | 2003-10-16 | 2012-02-07 | Alis Corporation | Ion sources, systems and methods |
US7495232B2 (en) * | 2003-10-16 | 2009-02-24 | Alis Corporation | Ion sources, systems and methods |
US7504639B2 (en) * | 2003-10-16 | 2009-03-17 | Alis Corporation | Ion sources, systems and methods |
US7557358B2 (en) * | 2003-10-16 | 2009-07-07 | Alis Corporation | Ion sources, systems and methods |
US7321118B2 (en) * | 2005-06-07 | 2008-01-22 | Alis Corporation | Scanning transmission ion microscope |
US7786452B2 (en) * | 2003-10-16 | 2010-08-31 | Alis Corporation | Ion sources, systems and methods |
US7554096B2 (en) * | 2003-10-16 | 2009-06-30 | Alis Corporation | Ion sources, systems and methods |
US9159527B2 (en) * | 2003-10-16 | 2015-10-13 | Carl Zeiss Microscopy, Llc | Systems and methods for a gas field ionization source |
US7554097B2 (en) * | 2003-10-16 | 2009-06-30 | Alis Corporation | Ion sources, systems and methods |
US7518122B2 (en) * | 2003-10-16 | 2009-04-14 | Alis Corporation | Ion sources, systems and methods |
US7557359B2 (en) * | 2003-10-16 | 2009-07-07 | Alis Corporation | Ion sources, systems and methods |
US7557360B2 (en) * | 2003-10-16 | 2009-07-07 | Alis Corporation | Ion sources, systems and methods |
JP4476733B2 (ja) | 2004-07-30 | 2010-06-09 | 株式会社東芝 | パターン評価方法、プログラムおよびパターン評価装置 |
JP4587742B2 (ja) * | 2004-08-23 | 2010-11-24 | 株式会社日立ハイテクノロジーズ | 荷電粒子線顕微方法及び荷電粒子線応用装置 |
US7662648B2 (en) * | 2005-08-31 | 2010-02-16 | Micron Technology, Inc. | Integrated circuit inspection system |
US20070116373A1 (en) * | 2005-11-23 | 2007-05-24 | Sonosite, Inc. | Multi-resolution adaptive filtering |
US20070227883A1 (en) * | 2006-03-20 | 2007-10-04 | Ward Billy W | Systems and methods for a helium ion pump |
JP4074643B2 (ja) | 2006-03-27 | 2008-04-09 | 株式会社アドバンテスト | 線幅測定調整方法及び走査型電子顕微鏡 |
CN101173853B (zh) * | 2006-11-01 | 2011-02-02 | 鸿富锦精密工业(深圳)有限公司 | 定位测量装置及方法 |
US7804068B2 (en) * | 2006-11-15 | 2010-09-28 | Alis Corporation | Determining dopant information |
US8263543B2 (en) | 2009-04-17 | 2012-09-11 | The Procter & Gamble Company | Fabric care compositions comprising organosiloxane polymers |
EP2584362A1 (de) * | 2011-10-18 | 2013-04-24 | FEI Company | Abtastverfahren zum Abtasten einer Probe mit einer Sonde |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4675528A (en) * | 1985-06-28 | 1987-06-23 | Control Data Corporation | Method for measurement of spotsize and edgewidth in electron beam lithography |
JP2823450B2 (ja) * | 1992-11-19 | 1998-11-11 | 株式会社東芝 | 回路パターンの寸法測定方法 |
JP2802571B2 (ja) * | 1993-03-23 | 1998-09-24 | 株式会社日立製作所 | 電子線測長装置 |
US5644512A (en) * | 1996-03-04 | 1997-07-01 | Advanced Surface Microscopy, Inc. | High precision calibration and feature measurement system for a scanning probe microscope |
-
1995
- 1995-12-28 JP JP7342932A patent/JPH09184714A/ja active Pending
-
1996
- 1996-12-20 US US08/771,325 patent/US5750990A/en not_active Expired - Lifetime
- 1996-12-20 DE DE69637937T patent/DE69637937D1/de not_active Expired - Lifetime
- 1996-12-20 EP EP01104828A patent/EP1102031B1/de not_active Expired - Lifetime
- 1996-12-20 EP EP96120644A patent/EP0781976B1/de not_active Expired - Lifetime
- 1996-12-20 DE DE69620371T patent/DE69620371T2/de not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109540050A (zh) * | 2017-09-22 | 2019-03-29 | 三星电子株式会社 | 关键尺寸测量系统和使用其测量关键尺寸的方法 |
CN109540050B (zh) * | 2017-09-22 | 2022-05-24 | 三星电子株式会社 | 关键尺寸测量系统和使用其测量关键尺寸的方法 |
Also Published As
Publication number | Publication date |
---|---|
DE69620371T2 (de) | 2002-08-14 |
EP1102031A3 (de) | 2001-11-28 |
JPH09184714A (ja) | 1997-07-15 |
EP1102031A2 (de) | 2001-05-23 |
EP0781976A2 (de) | 1997-07-02 |
EP0781976A3 (de) | 1998-06-10 |
EP0781976B1 (de) | 2002-04-03 |
EP1102031B1 (de) | 2009-05-20 |
DE69637937D1 (de) | 2009-07-02 |
US5750990A (en) | 1998-05-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |