DE69615273T2 - Polieren der Randbereiche von Wafers - Google Patents
Polieren der Randbereiche von WafersInfo
- Publication number
- DE69615273T2 DE69615273T2 DE69615273T DE69615273T DE69615273T2 DE 69615273 T2 DE69615273 T2 DE 69615273T2 DE 69615273 T DE69615273 T DE 69615273T DE 69615273 T DE69615273 T DE 69615273T DE 69615273 T2 DE69615273 T2 DE 69615273T2
- Authority
- DE
- Germany
- Prior art keywords
- wafers
- polishing
- edge areas
- areas
- edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title 1
- 235000012431 wafers Nutrition 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15381395 | 1995-05-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69615273D1 DE69615273D1 (de) | 2001-10-25 |
DE69615273T2 true DE69615273T2 (de) | 2002-06-27 |
Family
ID=15570671
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69615273T Expired - Fee Related DE69615273T2 (de) | 1995-05-29 | 1996-05-16 | Polieren der Randbereiche von Wafers |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0745456B1 (ko) |
KR (1) | KR960043006A (ko) |
DE (1) | DE69615273T2 (ko) |
TW (1) | TW303487B (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5692950A (en) * | 1996-08-08 | 1997-12-02 | Minnesota Mining And Manufacturing Company | Abrasive construction for semiconductor wafer modification |
US8092707B2 (en) | 1997-04-30 | 2012-01-10 | 3M Innovative Properties Company | Compositions and methods for modifying a surface suited for semiconductor fabrication |
JP2001007064A (ja) * | 1999-06-17 | 2001-01-12 | Sumitomo Metal Ind Ltd | 半導体ウエーハの研削方法 |
JP4034096B2 (ja) * | 2002-03-19 | 2008-01-16 | 日本碍子株式会社 | 半導体支持装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57184662A (en) * | 1981-05-09 | 1982-11-13 | Hitachi Ltd | Chamfering method and device of wafer |
JP3027882B2 (ja) * | 1992-07-31 | 2000-04-04 | 信越半導体株式会社 | ウエーハ面取部研磨装置 |
JP2798347B2 (ja) * | 1993-07-08 | 1998-09-17 | 信越半導体株式会社 | ウェーハのノッチ部研磨装置 |
JP2832138B2 (ja) * | 1993-09-30 | 1998-12-02 | 信越半導体株式会社 | ウェーハ外周部の研磨装置 |
JP2832142B2 (ja) * | 1993-10-29 | 1998-12-02 | 信越半導体株式会社 | ウェーハのノッチ部研磨装置 |
JPH07171749A (ja) * | 1993-12-20 | 1995-07-11 | Shin Etsu Handotai Co Ltd | ウェーハ外周部の研磨装置 |
JPH08168946A (ja) * | 1994-12-13 | 1996-07-02 | Shin Etsu Handotai Co Ltd | ウェーハ外周部の研磨装置 |
-
1996
- 1996-05-14 TW TW085105672A patent/TW303487B/zh active
- 1996-05-16 EP EP96303484A patent/EP0745456B1/en not_active Expired - Lifetime
- 1996-05-16 DE DE69615273T patent/DE69615273T2/de not_active Expired - Fee Related
- 1996-05-28 KR KR1019960019606A patent/KR960043006A/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP0745456A1 (en) | 1996-12-04 |
DE69615273D1 (de) | 2001-10-25 |
KR960043006A (ko) | 1996-12-21 |
TW303487B (ko) | 1997-04-21 |
EP0745456B1 (en) | 2001-09-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |