DE69609797T2 - Formkörper aus pyrolytischem Bornitrid und Verfahren zu seiner Herstellung - Google Patents

Formkörper aus pyrolytischem Bornitrid und Verfahren zu seiner Herstellung

Info

Publication number
DE69609797T2
DE69609797T2 DE69609797T DE69609797T DE69609797T2 DE 69609797 T2 DE69609797 T2 DE 69609797T2 DE 69609797 T DE69609797 T DE 69609797T DE 69609797 T DE69609797 T DE 69609797T DE 69609797 T2 DE69609797 T2 DE 69609797T2
Authority
DE
Germany
Prior art keywords
production
boron nitride
pyrolytic boron
moldings made
moldings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69609797T
Other languages
English (en)
Other versions
DE69609797D1 (de
Inventor
Jun Honma
Kotaro Mino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
Advanced Ceramics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17594999&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69609797(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Advanced Ceramics Corp filed Critical Advanced Ceramics Corp
Publication of DE69609797D1 publication Critical patent/DE69609797D1/de
Application granted granted Critical
Publication of DE69609797T2 publication Critical patent/DE69609797T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
    • C01B21/0643—Preparation from boron halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/583—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on boron nitride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/50—Solid solutions
    • C01P2002/52—Solid solutions containing elements as dopants
    • C01P2002/54—Solid solutions containing elements as dopants one element only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/40—Electric properties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Ceramic Products (AREA)
DE69609797T 1995-10-03 1996-09-30 Formkörper aus pyrolytischem Bornitrid und Verfahren zu seiner Herstellung Expired - Lifetime DE69609797T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7278269A JP2720381B2 (ja) 1995-10-03 1995-10-03 任意の電気抵抗率を有する熱分解窒化ホウ素成形体の製造方法

Publications (2)

Publication Number Publication Date
DE69609797D1 DE69609797D1 (de) 2000-09-21
DE69609797T2 true DE69609797T2 (de) 2000-12-28

Family

ID=17594999

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69609797T Expired - Lifetime DE69609797T2 (de) 1995-10-03 1996-09-30 Formkörper aus pyrolytischem Bornitrid und Verfahren zu seiner Herstellung

Country Status (6)

Country Link
US (1) US5693581A (de)
EP (1) EP0768389B1 (de)
JP (1) JP2720381B2 (de)
KR (1) KR100570849B1 (de)
DE (1) DE69609797T2 (de)
TW (1) TW462950B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6228453B1 (en) 1995-06-07 2001-05-08 Lanxide Technology Company, Lp Composite materials comprising two jonal functions and methods for making the same
US6410172B1 (en) 1999-11-23 2002-06-25 Advanced Ceramics Corporation Articles coated with aluminum nitride by chemical vapor deposition
NO20023605D0 (no) * 2002-07-29 2002-07-29 Sumit Roy Fremgangsmåte og innretning til innbyrdes forbindelse av to rörformede organer
US7034307B2 (en) * 2003-09-25 2006-04-25 General Electric Company Neutron detector employing doped pyrolytic boron nitride and method of making thereof
JP4278046B2 (ja) * 2003-11-10 2009-06-10 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 ヒータ機構付き静電チャック
US20060096946A1 (en) * 2004-11-10 2006-05-11 General Electric Company Encapsulated wafer processing device and process for making thereof
US7312422B2 (en) * 2006-03-17 2007-12-25 Momentive Performance Materials Inc. Semiconductor batch heating assembly
DE202006007122U1 (de) 2006-05-03 2006-09-07 Retzlaff, Udo, Dr. Mobiler, transportabler, elektrostatischer Substrathalter aus Halbleitermaterial
US7901509B2 (en) * 2006-09-19 2011-03-08 Momentive Performance Materials Inc. Heating apparatus with enhanced thermal uniformity and method for making thereof
US7929269B2 (en) 2008-09-04 2011-04-19 Momentive Performance Materials Inc. Wafer processing apparatus having a tunable electrical resistivity
CN103302431B (zh) * 2012-03-09 2016-03-02 鸿富锦精密工业（深圳）有限公司 芯片焊接装置
JP6349644B2 (ja) * 2013-08-05 2018-07-04 住友電気工業株式会社 多結晶立方晶窒化ホウ素およびその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4402925A (en) * 1981-09-28 1983-09-06 Union Carbide Corporation Porous free standing pyrolytic boron nitride articles
JPS61201607A (ja) * 1985-02-28 1986-09-06 Denki Kagaku Kogyo Kk 熱分解窒化ホウ素物品およびその製造方法
JPS61256905A (ja) * 1985-05-10 1986-11-14 Kawasaki Steel Corp 高純度六方晶窒化硼素微粉末の製造方法
JPS6272505A (ja) * 1985-09-26 1987-04-03 Denki Kagaku Kogyo Kk 熱分解窒化ほう素製器物の製造法
JPS6337637A (ja) * 1986-08-01 1988-02-18 Fujitsu Ltd 多層配線構造の半導体装置および製法
JPS63230507A (ja) * 1987-03-17 1988-09-27 Sharp Corp 高結晶性六方晶窒化ほう素の合成方法
FR2643358B1 (fr) * 1989-02-20 1991-11-22 Rhone Poulenc Chimie Procede de preparation de nitrure de bore
ZA901859B (en) * 1989-06-16 1991-08-28 Gen Electric Process for preparing polycrystalline cubic boron nitride and resulting product
EP0495095B1 (de) * 1990-08-08 1996-01-31 Advanced Ceramics Corporation Verfahren zum herstellen von rissfreiem pyrolytischem bornitrid auf einer kohlenstoffstruktur sowie formkörper
FR2669622B1 (fr) * 1990-11-28 1993-11-19 Aerospatiale Ste Nat Indle Materiau composite a renfort fibreux refractaire et son procede de fabrication.
JP2915750B2 (ja) * 1993-06-23 1999-07-05 信越化学工業株式会社 静電チャック付セラミックスヒーター

Also Published As

Publication number Publication date
KR970020943A (ko) 1997-05-28
DE69609797D1 (de) 2000-09-21
EP0768389B1 (de) 2000-08-16
EP0768389A1 (de) 1997-04-16
JP2720381B2 (ja) 1998-03-04
TW462950B (en) 2001-11-11
KR100570849B1 (ko) 2006-09-15
US5693581A (en) 1997-12-02
JPH0995785A (ja) 1997-04-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: GENERAL ELECTRIC CO., SCHENECTADY, N.Y., US