DE69605479D1 - Beleuchtungssystem mit räumlich getrennten Senkrechten und waagrechten Bildebenen für die Photolithographie - Google Patents

Beleuchtungssystem mit räumlich getrennten Senkrechten und waagrechten Bildebenen für die Photolithographie

Info

Publication number
DE69605479D1
DE69605479D1 DE69605479T DE69605479T DE69605479D1 DE 69605479 D1 DE69605479 D1 DE 69605479D1 DE 69605479 T DE69605479 T DE 69605479T DE 69605479 T DE69605479 T DE 69605479T DE 69605479 D1 DE69605479 D1 DE 69605479D1
Authority
DE
Germany
Prior art keywords
photolithography
illumination system
spatially separated
image planes
horizontal image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69605479T
Other languages
English (en)
Other versions
DE69605479T2 (de
Inventor
Mark Oskotsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SVG Lithography Systems Inc
Original Assignee
SVG Lithography Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SVG Lithography Systems Inc filed Critical SVG Lithography Systems Inc
Application granted granted Critical
Publication of DE69605479D1 publication Critical patent/DE69605479D1/de
Publication of DE69605479T2 publication Critical patent/DE69605479T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
DE69605479T 1995-05-24 1996-05-15 Beleuchtungssystem mit räumlich getrennten Senkrechten und waagrechten Bildebenen für die Photolithographie Expired - Lifetime DE69605479T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/448,994 US5724122A (en) 1995-05-24 1995-05-24 Illumination system having spatially separate vertical and horizontal image planes for use in photolithography

Publications (2)

Publication Number Publication Date
DE69605479D1 true DE69605479D1 (de) 2000-01-13
DE69605479T2 DE69605479T2 (de) 2000-04-27

Family

ID=23782458

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69605479T Expired - Lifetime DE69605479T2 (de) 1995-05-24 1996-05-15 Beleuchtungssystem mit räumlich getrennten Senkrechten und waagrechten Bildebenen für die Photolithographie

Country Status (6)

Country Link
US (1) US5724122A (de)
EP (1) EP0744663B1 (de)
JP (1) JP3913288B2 (de)
KR (1) KR100411833B1 (de)
CA (1) CA2177199A1 (de)
DE (1) DE69605479T2 (de)

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US6027865A (en) * 1997-02-10 2000-02-22 Texas Instruments Incorporated Method for accurate patterning of photoresist during lithography process
US6013401A (en) * 1997-03-31 2000-01-11 Svg Lithography Systems, Inc. Method of controlling illumination field to reduce line width variation
EP0881542A1 (de) * 1997-05-26 1998-12-02 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Lithographisches System
US5844727A (en) * 1997-09-02 1998-12-01 Cymer, Inc. Illumination design for scanning microlithography systems
US6833904B1 (en) 1998-02-27 2004-12-21 Nikon Corporation Exposure apparatus and method of fabricating a micro-device using the exposure apparatus
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
JP3530769B2 (ja) * 1999-05-10 2004-05-24 キヤノン株式会社 照明装置及びそれを用いた光加工機
US6307682B1 (en) 2000-02-16 2001-10-23 Silicon Valley Group, Inc. Zoom illumination system for use in photolithography
US6509952B1 (en) 2000-05-23 2003-01-21 Silicon Valley Group, Inc. Method and system for selective linewidth optimization during a lithographic process
US6611387B1 (en) 2000-09-29 2003-08-26 Intel Corporation Adjustment of the partial coherence of the light energy in an imaging system
TW528879B (en) * 2001-02-22 2003-04-21 Ishikawajima Harima Heavy Ind Illumination optical system and laser processor having the same
DE10144244A1 (de) 2001-09-05 2003-03-20 Zeiss Carl Zoom-System, insbesondere für eine Beleuchtungseinrichtung
US6813003B2 (en) * 2002-06-11 2004-11-02 Mark Oskotsky Advanced illumination system for use in microlithography
US6784976B2 (en) * 2002-04-23 2004-08-31 Asml Holding N.V. System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control
US6888615B2 (en) * 2002-04-23 2005-05-03 Asml Holding N.V. System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position
EP1482363A1 (de) 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographischer Apparat
EP1491960B1 (de) * 2003-05-30 2012-04-25 ASML Netherlands B.V. Lithographischer Apparat
US20060268251A1 (en) * 2003-07-16 2006-11-30 Markus Deguenther Illumination system for a microlithographic projection exposure apparatus
JP4387359B2 (ja) * 2003-09-26 2009-12-16 カール・ツァイス・エスエムティー・アーゲー 光学特性の測定方法、及び波面検出系を備えた投影露光システム
JP2005309380A (ja) * 2004-03-26 2005-11-04 Fuji Photo Film Co Ltd 画像露光装置
JP2005310942A (ja) 2004-04-20 2005-11-04 Canon Inc 露光装置、露光方法、及びそれを用いたデバイス製造方法
US8525075B2 (en) * 2004-05-06 2013-09-03 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation apparatus
US20070285644A1 (en) * 2004-09-13 2007-12-13 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus
US7382439B2 (en) * 2005-05-31 2008-06-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070127005A1 (en) * 2005-12-02 2007-06-07 Asml Holding N.V. Illumination system
US7397535B2 (en) 2005-12-21 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7884921B2 (en) * 2006-04-12 2011-02-08 Nikon Corporation Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method
EP2009678A4 (de) * 2006-04-17 2011-04-06 Nikon Corp Optische beleuchtungsvorrichtung, belichtungsvorrichtung und bauelementeherstelllungsverfahren
JP5171061B2 (ja) * 2007-02-20 2013-03-27 キヤノン株式会社 駆動機構
JP2008270571A (ja) * 2007-04-20 2008-11-06 Canon Inc 照明光学装置、引き回し光学系、露光装置及びデバイス製造方法
US8290358B1 (en) * 2007-06-25 2012-10-16 Adobe Systems Incorporated Methods and apparatus for light-field imaging
US8559756B2 (en) * 2007-08-06 2013-10-15 Adobe Systems Incorporated Radiance processing by demultiplexing in the frequency domain
US8081296B2 (en) * 2007-08-09 2011-12-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US8244058B1 (en) 2008-05-30 2012-08-14 Adobe Systems Incorporated Method and apparatus for managing artifacts in frequency domain processing of light-field images
GB2460648A (en) * 2008-06-03 2009-12-09 M Solv Ltd Method and apparatus for laser focal spot size control
NL2002295C2 (en) * 2008-12-05 2009-12-14 Michel Robert Ten Wolde Illumination system including a variety of illumination devices.
US8189089B1 (en) 2009-01-20 2012-05-29 Adobe Systems Incorporated Methods and apparatus for reducing plenoptic camera artifacts
US8345144B1 (en) 2009-07-15 2013-01-01 Adobe Systems Incorporated Methods and apparatus for rich image capture with focused plenoptic cameras
US8228417B1 (en) 2009-07-15 2012-07-24 Adobe Systems Incorporated Focused plenoptic camera employing different apertures or filtering at different microlenses
US8817015B2 (en) 2010-03-03 2014-08-26 Adobe Systems Incorporated Methods, apparatus, and computer-readable storage media for depth-based rendering of focused plenoptic camera data
KR101238571B1 (ko) * 2010-08-20 2013-02-28 최원영 오염하천의 바닥청소에 의한 수질환경개선 방법 및 그 장치
US8803918B2 (en) 2010-08-27 2014-08-12 Adobe Systems Incorporated Methods and apparatus for calibrating focused plenoptic camera data
US8665341B2 (en) 2010-08-27 2014-03-04 Adobe Systems Incorporated Methods and apparatus for rendering output images with simulated artistic effects from focused plenoptic camera data
US8724000B2 (en) 2010-08-27 2014-05-13 Adobe Systems Incorporated Methods and apparatus for super-resolution in integral photography
US8749694B2 (en) 2010-08-27 2014-06-10 Adobe Systems Incorporated Methods and apparatus for rendering focused plenoptic camera data using super-resolved demosaicing
WO2012116710A1 (en) * 2011-02-28 2012-09-07 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus
US9197798B2 (en) 2011-03-25 2015-11-24 Adobe Systems Incorporated Thin plenoptic cameras using microspheres
JP6667535B2 (ja) * 2015-01-20 2020-03-18 ３アイ‐インプレサ インジェニェリア イタリア エス．アール．エル３Ｉ − Ｉｍｐｒｅｓａ Ｉｎｇｅｇｎｅｒｉａ Ｉｔａｌｉａ Ｓ．Ｒ．Ｌ． 一次シリンドリカルレンズを有するテレセントリック光学対物系を備えた撮像装置
US10942456B1 (en) * 2020-01-17 2021-03-09 National Applied Research Laboratories Device of light source with diode array emitting high-uniformity ultraviolet

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Also Published As

Publication number Publication date
US5724122A (en) 1998-03-03
EP0744663B1 (de) 1999-12-08
DE69605479T2 (de) 2000-04-27
KR100411833B1 (ko) 2004-04-17
JP3913288B2 (ja) 2007-05-09
CA2177199A1 (en) 1996-11-25
EP0744663A1 (de) 1996-11-27
JPH097941A (ja) 1997-01-10
KR960042908A (ko) 1996-12-21

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