DE69603801T2 - Verfahren zur Herstellung eines dielektrischen Dünnschichtelements - Google Patents

Verfahren zur Herstellung eines dielektrischen Dünnschichtelements

Info

Publication number
DE69603801T2
DE69603801T2 DE69603801T DE69603801T DE69603801T2 DE 69603801 T2 DE69603801 T2 DE 69603801T2 DE 69603801 T DE69603801 T DE 69603801T DE 69603801 T DE69603801 T DE 69603801T DE 69603801 T2 DE69603801 T2 DE 69603801T2
Authority
DE
Germany
Prior art keywords
dielectric
thin film
film
oxide
oxygen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69603801T
Other languages
German (de)
English (en)
Other versions
DE69603801D1 (de
Inventor
Hisako Arai
Ryusuke Kita
Masayoshi Koba
Yoshiyuki Masuda
Yoshiyuki Matsu
Noboru Ohtani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Application granted granted Critical
Publication of DE69603801D1 publication Critical patent/DE69603801D1/de
Publication of DE69603801T2 publication Critical patent/DE69603801T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/088—Oxides of the type ABO3 with A representing alkali, alkaline earth metal or Pb and B representing a refractory or rare earth metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Formation Of Insulating Films (AREA)
  • Semiconductor Memories (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Physical Vapour Deposition (AREA)
  • Semiconductor Integrated Circuits (AREA)
DE69603801T 1995-07-21 1996-06-28 Verfahren zur Herstellung eines dielektrischen Dünnschichtelements Expired - Fee Related DE69603801T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7186025A JPH0931645A (ja) 1995-07-21 1995-07-21 誘電体薄膜素子の製造方法

Publications (2)

Publication Number Publication Date
DE69603801D1 DE69603801D1 (de) 1999-09-23
DE69603801T2 true DE69603801T2 (de) 2000-01-13

Family

ID=16181086

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69603801T Expired - Fee Related DE69603801T2 (de) 1995-07-21 1996-06-28 Verfahren zur Herstellung eines dielektrischen Dünnschichtelements

Country Status (4)

Country Link
US (1) US5856242A (enExample)
EP (1) EP0754776B1 (enExample)
JP (1) JPH0931645A (enExample)
DE (1) DE69603801T2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11168106A (ja) * 1997-09-30 1999-06-22 Fujitsu Ltd 半導体基板の処理方法
EP2233607A1 (en) * 2000-12-12 2010-09-29 Konica Corporation Dielectric coated electrode, and plasma discharge apparatus using the electrode
CN1258617C (zh) * 2001-03-20 2006-06-07 马特森技术公司 用于在衬底上沉积具有较高介电常数的涂层的方法
US6806553B2 (en) 2001-03-30 2004-10-19 Kyocera Corporation Tunable thin film capacitor
US20040247787A1 (en) * 2002-04-19 2004-12-09 Mackie Neil M. Effluent pressure control for use in a processing system
DE10392519T5 (de) * 2002-04-19 2005-08-04 Mattson Technology Inc., Fremont System zur Abscheidung eines Films auf einem Substrat unter Verwendung eines Gas-Precursors mit niedrigem Dampfdruck
EP1587137A1 (en) * 2004-04-16 2005-10-19 International Business Machines Corporation Deposition process for non-volatile resistance switching memory

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3911176A (en) * 1974-01-02 1975-10-07 Rca Corp Method for vapor-phase growth of thin films of lithium niobate
US5527629A (en) * 1990-12-17 1996-06-18 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process of depositing a layer of silicon oxide bonded to a substrate of polymeric material using high pressure and electrical discharge
DE4119748C2 (de) * 1991-06-15 1994-06-09 Luchtenberg Gmbh & Co Abklappbarer Rückspiegel
US5192871A (en) * 1991-10-15 1993-03-09 Motorola, Inc. Voltage variable capacitor having amorphous dielectric film
EP0579018B1 (de) * 1992-07-02 1998-09-30 Balzers Aktiengesellschaft Verfahren zur Herstellung einer Metalloxidschicht, Vakuumbehandlungsanlage hierfür sowie mit mindestens einer Metalloxidschicht beschichteter Teil
US5527567A (en) * 1994-09-02 1996-06-18 Ceram Incorporated Metalorganic chemical vapor deposition of layered structure oxides
US5670218A (en) * 1995-10-04 1997-09-23 Hyundai Electronics Industries Co., Ltd. Method for forming ferroelectric thin film and apparatus therefor

Also Published As

Publication number Publication date
US5856242A (en) 1999-01-05
EP0754776B1 (en) 1999-08-18
EP0754776A3 (enExample) 1997-02-26
DE69603801D1 (de) 1999-09-23
JPH0931645A (ja) 1997-02-04
EP0754776A2 (en) 1997-01-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee