DE69515289D1 - Verfahren zur herstellung einer schicht aus teilchen auf einem substrat, verfahren zum glätten unregelmässiger substratoberflächen und teilchenbeschichtetes substrat - Google Patents
Verfahren zur herstellung einer schicht aus teilchen auf einem substrat, verfahren zum glätten unregelmässiger substratoberflächen und teilchenbeschichtetes substratInfo
- Publication number
- DE69515289D1 DE69515289D1 DE69515289T DE69515289T DE69515289D1 DE 69515289 D1 DE69515289 D1 DE 69515289D1 DE 69515289 T DE69515289 T DE 69515289T DE 69515289 T DE69515289 T DE 69515289T DE 69515289 D1 DE69515289 D1 DE 69515289D1
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- particle layer
- particle
- liquid
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
- Y10T428/24372—Particulate matter
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24893—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including particulate material
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Laminated Bodies (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21314894A JP3280804B2 (ja) | 1994-08-15 | 1994-08-15 | 基材上への粒子層の形成方法、基材凹凸面の平坦化方法および粒子層付基材 |
PCT/JP1995/001610 WO1996004998A1 (fr) | 1994-08-15 | 1995-08-11 | Procede d'elaboration d'une couche de particules sur un substrat, procede d'aplanissement de la surface irreguliere d'un substrat et substrat revetu de particules |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69515289D1 true DE69515289D1 (de) | 2000-04-06 |
DE69515289T2 DE69515289T2 (de) | 2000-11-30 |
Family
ID=16634375
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69515289T Expired - Lifetime DE69515289T2 (de) | 1994-08-15 | 1995-08-11 | Verfahren zur herstellung einer schicht aus teilchen auf einem substrat, verfahren zum glätten unregelmässiger substratoberflächen und teilchenbeschichtetes substrat |
Country Status (8)
Country | Link |
---|---|
US (1) | US6090446A (de) |
EP (1) | EP0728531B1 (de) |
JP (1) | JP3280804B2 (de) |
KR (1) | KR100338332B1 (de) |
AT (1) | ATE189978T1 (de) |
DE (1) | DE69515289T2 (de) |
TW (1) | TW311106B (de) |
WO (1) | WO1996004998A1 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10314700A1 (de) * | 2003-03-31 | 2004-10-14 | Behr Gmbh & Co. Kg | Verfahren zur Herstellung oberflächenmodifizierter Werkstücke |
DE102004049107A1 (de) * | 2004-10-07 | 2006-04-13 | Behr Gmbh & Co. Kg | Beschichtungsverfahren |
DE102005039517A1 (de) * | 2005-08-20 | 2007-02-22 | Carl Zeiss Smt Ag | Phasenverzögerungselement und Verfahren zur Herstellung eines Phasenverzögerungselementes |
US8425985B2 (en) * | 2008-08-22 | 2013-04-23 | Corning Incorporated | Method for particulate coating |
FR2941159B1 (fr) * | 2009-01-19 | 2012-02-24 | Commissariat Energie Atomique | Procede de depot d'un materiau a la surface d'un objet. |
TWI421209B (zh) * | 2010-08-12 | 2014-01-01 | Academia Sinica | 大面積單層微粒膜及其製備方法 |
US9153451B2 (en) | 2012-12-12 | 2015-10-06 | Micron Technology, Inc. | Method of forming a planar surface for a semiconductor device structure, and related methods of forming a semiconductor device structure |
JP6417525B2 (ja) * | 2013-08-30 | 2018-11-07 | コーニング インコーポレイテッド | 低反射率物品およびその方法 |
CN106103370B (zh) | 2014-03-21 | 2020-05-01 | 康宁股份有限公司 | 具有图案化涂层的制品 |
KR101699275B1 (ko) | 2014-09-11 | 2017-01-25 | 코닝정밀소재 주식회사 | 유기발광소자용 광추출 기판, 그 제조방법 및 이를 포함하는 유기발광소자 |
FR3031683B1 (fr) * | 2015-01-16 | 2017-02-17 | Commissariat Energie Atomique | Procede de formation d'un film compact de particules a la surface d'un liquide porteur |
KR101866243B1 (ko) | 2015-01-21 | 2018-06-12 | 코닝정밀소재 주식회사 | 유기발광소자용 광추출 기판 및 이를 포함하는 유기발광소자 |
KR101999294B1 (ko) | 2016-03-23 | 2019-07-15 | 코닝 인코포레이티드 | 유기발광소자용 광추출 기판, 그 제조방법 및 이를 포함하는 유기발광소자 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2633426A (en) * | 1950-07-07 | 1953-03-31 | Gen Electric | Method of forming a powder coating on a surface |
US4051275A (en) * | 1974-06-21 | 1977-09-27 | Forestek Clarence W | Embedding and compacting particles in porous surfaces |
JPH0611794B2 (ja) * | 1985-04-01 | 1994-02-16 | 新技術開発事業団 | 高分子超微粒子とその複合体 |
JPH0642043B2 (ja) * | 1986-04-10 | 1994-06-01 | 富士写真フイルム株式会社 | 固体粒子膜の形成方法 |
US4801476A (en) * | 1986-09-24 | 1989-01-31 | Exxon Research And Engineering Company | Method for production of large area 2-dimensional arrays of close packed colloidal particles |
JPH02307571A (ja) * | 1989-05-19 | 1990-12-20 | Fuji Photo Film Co Ltd | 固体粒子膜の形成方法 |
JPH03157162A (ja) * | 1989-11-15 | 1991-07-05 | Hitachi Ltd | 有機薄膜の作製方法 |
JP2885587B2 (ja) * | 1992-10-28 | 1999-04-26 | 科学技術振興事業団 | 2次元粒子薄膜製造方法 |
-
1994
- 1994-08-15 JP JP21314894A patent/JP3280804B2/ja not_active Expired - Lifetime
-
1995
- 1995-08-11 DE DE69515289T patent/DE69515289T2/de not_active Expired - Lifetime
- 1995-08-11 EP EP95928022A patent/EP0728531B1/de not_active Expired - Lifetime
- 1995-08-11 US US08/624,537 patent/US6090446A/en not_active Expired - Lifetime
- 1995-08-11 KR KR1019960701917A patent/KR100338332B1/ko not_active IP Right Cessation
- 1995-08-11 AT AT95928022T patent/ATE189978T1/de active
- 1995-08-11 WO PCT/JP1995/001610 patent/WO1996004998A1/ja active IP Right Grant
- 1995-09-12 TW TW084109497A patent/TW311106B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0728531B1 (de) | 2000-03-01 |
ATE189978T1 (de) | 2000-03-15 |
JP3280804B2 (ja) | 2002-05-13 |
KR100338332B1 (ko) | 2002-07-18 |
EP0728531A1 (de) | 1996-08-28 |
TW311106B (de) | 1997-07-21 |
KR960704643A (ko) | 1996-10-09 |
JPH0857295A (ja) | 1996-03-05 |
DE69515289T2 (de) | 2000-11-30 |
EP0728531A4 (de) | 1996-10-16 |
WO1996004998A1 (fr) | 1996-02-22 |
US6090446A (en) | 2000-07-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |