DE69509435D1 - Für Bestrahlung im sichtbaren Bereich empfindliche Zusammensetzung und daraus herstellbares Aufzeichnungsmaterial - Google Patents

Für Bestrahlung im sichtbaren Bereich empfindliche Zusammensetzung und daraus herstellbares Aufzeichnungsmaterial

Info

Publication number
DE69509435D1
DE69509435D1 DE69509435T DE69509435T DE69509435D1 DE 69509435 D1 DE69509435 D1 DE 69509435D1 DE 69509435 T DE69509435 T DE 69509435T DE 69509435 T DE69509435 T DE 69509435T DE 69509435 D1 DE69509435 D1 DE 69509435D1
Authority
DE
Germany
Prior art keywords
radiation
visible range
recording material
visible
produced therefrom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69509435T
Other languages
English (en)
Other versions
DE69509435T2 (de
DE69509435T3 (de
Inventor
Harald Baumann
Hans-Joachim Timpe
Hans-Peter Herting
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphics Holding Inc
Original Assignee
Kodak Graphics Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6519187&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69509435(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Kodak Graphics Holding Inc filed Critical Kodak Graphics Holding Inc
Priority to DE69509435T priority Critical patent/DE69509435T3/de
Publication of DE69509435D1 publication Critical patent/DE69509435D1/de
Publication of DE69509435T2 publication Critical patent/DE69509435T2/de
Application granted granted Critical
Publication of DE69509435T3 publication Critical patent/DE69509435T3/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photoreceptors In Electrophotography (AREA)
DE69509435T 1994-05-27 1995-05-26 Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial Expired - Fee Related DE69509435T3 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE69509435T DE69509435T3 (de) 1994-05-27 1995-05-26 Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4418645 1994-05-27
DE4418645A DE4418645C1 (de) 1994-05-27 1994-05-27 Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial
DE69509435T DE69509435T3 (de) 1994-05-27 1995-05-26 Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial

Publications (3)

Publication Number Publication Date
DE69509435D1 true DE69509435D1 (de) 1999-06-10
DE69509435T2 DE69509435T2 (de) 2000-01-05
DE69509435T3 DE69509435T3 (de) 2004-07-08

Family

ID=6519187

Family Applications (2)

Application Number Title Priority Date Filing Date
DE4418645A Expired - Fee Related DE4418645C1 (de) 1994-05-27 1994-05-27 Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial
DE69509435T Expired - Fee Related DE69509435T3 (de) 1994-05-27 1995-05-26 Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE4418645A Expired - Fee Related DE4418645C1 (de) 1994-05-27 1994-05-27 Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial

Country Status (5)

Country Link
US (1) US6051366A (de)
EP (1) EP0684522B2 (de)
AT (1) ATE179804T1 (de)
CA (1) CA2150341A1 (de)
DE (2) DE4418645C1 (de)

Families Citing this family (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9611291D0 (en) * 1996-05-30 1996-07-31 Dow Corning Room temperature curable compositions
US6569594B2 (en) * 1998-04-15 2003-05-27 Agfa-Gevaert Heat mode sensitive imaging element for making positive working printing plates
US7129021B2 (en) * 1999-12-17 2006-10-31 Creo Srl Polymer system with switchable physical properties and its use in direct exposure printing plates
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
AU2001269837A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Process for producing microfluidic articles
US7014988B2 (en) * 2000-06-15 2006-03-21 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
AU2001270320A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
JP2004503928A (ja) * 2000-06-15 2004-02-05 スリーエム　イノベイティブ　プロパティズ　カンパニー 多方向光反応吸収方法
ATE440308T1 (de) * 2000-06-15 2009-09-15 3M Innovative Properties Co Methode und gerät zur erzielung wiederholter multiphotonabsorption
US6548215B2 (en) 2001-02-09 2003-04-15 Kodak Polychrome Graphics Llc Method for the production of a printing plate using the dual-feed technology
JP4512281B2 (ja) 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US6706454B2 (en) 2001-07-05 2004-03-16 Kodak Polychrome Graphics Llc Method for the production of a printing plate using particle growing acceleration by an additive polymer
US6664025B2 (en) * 2002-02-12 2003-12-16 Kodak Polychrome Graphics Llc Visible radiation sensitive composition
US6783913B2 (en) 2002-04-05 2004-08-31 Kodak Polychrome Graphics Llc Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing
US6936384B2 (en) 2002-08-01 2005-08-30 Kodak Polychrome Graphics Llc Infrared-sensitive composition containing a metallocene derivative
JP2004126050A (ja) 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
US7338748B2 (en) 2002-09-30 2008-03-04 Fujifilm Corporation Polymerizable composition and planographic printing plate precursor
JP4137577B2 (ja) 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
DE10255667B4 (de) 2002-11-28 2006-05-11 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
CN100590525C (zh) 2002-12-18 2010-02-17 富士胶片株式会社 可聚合组合物和平版印刷版前体
JP4150261B2 (ja) 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP4299639B2 (ja) 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
ES2363748T3 (es) * 2003-09-24 2011-08-12 Ibf - Indústria Brasileira De Filmes S/A Composiciones de revestimiento fotosensibles para elementos litográficos.
JP2005099284A (ja) 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
JP4406617B2 (ja) * 2005-03-18 2010-02-03 富士フイルム株式会社 感光性組成物および平版印刷版原版
JP4668111B2 (ja) 2005-12-26 2011-04-13 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版
US7524614B2 (en) * 2006-05-26 2009-04-28 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
US8084182B2 (en) 2008-04-29 2011-12-27 Eastman Kodak Company On-press developable elements and methods of use
EP2194429A1 (de) 2008-12-02 2010-06-09 Eastman Kodak Company Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten
US20100151385A1 (en) 2008-12-17 2010-06-17 Ray Kevin B Stack of negative-working imageable elements
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US20100215919A1 (en) 2009-02-20 2010-08-26 Ting Tao On-press developable imageable elements
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
US8318405B2 (en) 2009-03-13 2012-11-27 Eastman Kodak Company Negative-working imageable elements with overcoat
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
ATE555904T1 (de) 2009-08-10 2012-05-15 Eastman Kodak Co Lithografische druckplattenvorläufer mit betahydroxy-alkylamid-vernetzern
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
EP2293144B1 (de) 2009-09-04 2012-11-07 Eastman Kodak Company Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung
US8426104B2 (en) 2009-10-08 2013-04-23 Eastman Kodak Company Negative-working imageable elements
US8329383B2 (en) 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
US20120090486A1 (en) 2010-10-18 2012-04-19 Celin Savariar-Hauck Lithographic printing plate precursors and methods of use
US8900798B2 (en) 2010-10-18 2014-12-02 Eastman Kodak Company On-press developable lithographic printing plate precursors
US20120141935A1 (en) 2010-12-03 2012-06-07 Bernd Strehmel Developer and its use to prepare lithographic printing plates
US20120141941A1 (en) 2010-12-03 2012-06-07 Mathias Jarek Developing lithographic printing plate precursors in simple manner
US20120141942A1 (en) 2010-12-03 2012-06-07 Domenico Balbinot Method of preparing lithographic printing plates
US20120199028A1 (en) 2011-02-08 2012-08-09 Mathias Jarek Preparing lithographic printing plates
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8703381B2 (en) 2011-08-31 2014-04-22 Eastman Kodak Company Lithographic printing plate precursors for on-press development
US8632941B2 (en) 2011-09-22 2014-01-21 Eastman Kodak Company Negative-working lithographic printing plate precursors with IR dyes
US9029063B2 (en) 2011-09-22 2015-05-12 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8889341B2 (en) 2012-08-22 2014-11-18 Eastman Kodak Company Negative-working lithographic printing plate precursors and use
US8927197B2 (en) 2012-11-16 2015-01-06 Eastman Kodak Company Negative-working lithographic printing plate precursors
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
US20170021656A1 (en) 2015-07-24 2017-01-26 Kevin Ray Lithographic imaging and printing with negative-working photoresponsive printing members
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL87862C (de) 1951-08-20
US2875047A (en) 1955-01-19 1959-02-24 Oster Gerald Photopolymerization with the formation of coherent plastic masses
NL287134A (de) 1959-08-05
DE2025291C3 (de) 1970-05-23 1974-03-14 Farbwerke Hoechst Ag, Vormals Meister Lucius & Bruening, 6000 Frankfurt Benzoxanthen- und Benzothioxanthenfarbstoffe und Verfahren zu ihrer Herstellung
US3729313A (en) † 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3717558A (en) 1972-03-30 1973-02-20 Scm Corp Photopolymerization catalyst comprising a metallocene and an active halogen-containing compound
US4175963A (en) * 1974-05-02 1979-11-27 General Electric Company Method of exposing and curing an epoxy composition containing an aromatic onium salt
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4590287A (en) 1983-02-11 1986-05-20 Ciba-Geigy Corporation Fluorinated titanocenes and photopolymerizable composition containing same
US4548891A (en) * 1983-02-11 1985-10-22 Ciba Geigy Corporation Photopolymerizable compositions containing prepolymers with olefin double bonds and titanium metallocene photoinitiators
US4713401A (en) * 1984-12-20 1987-12-15 Martin Riediker Titanocenes and a radiation-polymerizable composition containing these titanocenes
GB8515475D0 (en) * 1985-06-19 1985-07-24 Ciba Geigy Ag Forming images
KR910000199B1 (ko) 1986-04-15 1991-01-23 시바-가이기 코오포레이숀 액체 광개시제 혼합물
US4857654A (en) 1986-08-01 1989-08-15 Ciba-Geigy Corporation Titanocenes and their use
DE3784199D1 (de) * 1986-08-01 1993-03-25 Ciba Geigy Ag Titanocene und deren verwendung.
DE3768919D1 (en) * 1986-11-26 1991-05-02 Ciba Geigy Ag Fluessige photoinitiatorgemische.
EP0277915B1 (de) * 1987-02-02 1991-09-04 Ciba-Geigy Ag Photoinitiatorengemische enthaltend ein Titanocen und ein 3-Ketocoumarin
US5147900A (en) * 1987-08-28 1992-09-15 Minnesosta Mining And Manufacturing Company Energy-induced dual curable compositions
US5086086A (en) * 1987-08-28 1992-02-04 Minnesota Mining And Manufacturing Company Energy-induced curable compositions
US5008302A (en) * 1987-12-01 1991-04-16 Ciba-Geigy Corporation Titanocenes, the use thereof, and N-substituted pyrroles
US4959297A (en) * 1987-12-09 1990-09-25 Minnesota Mining And Manufacturing Company Ternary photoinitiator system for addition polymerization
DE3743457A1 (de) 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US4921827A (en) * 1988-11-23 1990-05-01 Minnesota Mining And Manufacturing Company Sensitized photoinitiator system for addition polymerization
US4971892A (en) * 1988-11-23 1990-11-20 Minnesota Mining And Manufacturing Company High sensitivity photopolymerizable composition
JP2571113B2 (ja) * 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
US5192642A (en) 1989-06-01 1993-03-09 Ciba-Geigy Corporation Oxygen-containing titanocenes, and the use thereof
DE4007428A1 (de) † 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE4008815A1 (de) 1990-03-20 1991-09-26 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE4013358A1 (de) † 1990-04-26 1991-10-31 Hoechst Ag Verfahren zur herstellung von druckformen oder photoresists durch bildmaessiges bestrahlen eines photopolymerisierbaren aufzeichnungsmaterials
JP2758737B2 (ja) * 1991-07-11 1998-05-28 日本ペイント株式会社 光重合性組成物及び感光性平版印刷版
DE4217495A1 (de) † 1992-05-27 1993-12-02 Hoechst Ag Photopolymerisierbares Gemisch und daraus hergestelltes Aufzeichnungsmaterial
US5629354A (en) * 1995-02-28 1997-05-13 Eastman Kodak Company Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator

Also Published As

Publication number Publication date
ATE179804T1 (de) 1999-05-15
CA2150341A1 (en) 1995-11-28
DE4418645C1 (de) 1995-12-14
US6051366A (en) 2000-04-18
EP0684522B1 (de) 1999-05-06
EP0684522B2 (de) 2003-09-24
EP0684522A1 (de) 1995-11-29
DE69509435T2 (de) 2000-01-05
DE69509435T3 (de) 2004-07-08

Similar Documents

Publication Publication Date Title
DE69509435D1 (de) Für Bestrahlung im sichtbaren Bereich empfindliche Zusammensetzung und daraus herstellbares Aufzeichnungsmaterial
ATE104451T1 (de) Photopolymerisierbare zusammensetzungen und grundstoffe fuer die aufzeichnung von beugungsbildern.
GB1522199A (en) Photopolymerizable binders for printing inks and coating compositions
ATE87198T1 (de) Mit sichtbarem licht aushaertbare dentalmassen.
FI922969A0 (fi) Foerfaranden och kompositioner foer avlaegsnande av syre.
ATE155259T1 (de) Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
KR950032528A (ko) 자외선 경화형 열변색성 잉크 조성물
BR8806307A (pt) Processo para a preparacao de titanocenos,composicao polimerizavel e aplicacao
KR900016807A (ko) 삼차원 물품의 제조방법 및 이에 의해 얻어진 삼차원 고체부품
ES2046326T3 (es) Tintas de imprimir reversiblemente fotocromicas.
AU561989B2 (en) Monitoring pit formation
DE69024786D1 (de) Neue oniumsalze und deren verwendung als photoinitiatoren
ES2145550T3 (es) Masas de moldeo de abs con comportamiento al olor mejorado.
EP0295547A3 (de) Durch Photopolymerisation vernetzbares Gemisch
DE3476159D1 (de) Polymerisable composition
DE2500906A1 (de) Lithographische platten zur aufzeichnung mittels laserstrahlen
ATE88284T1 (de) Lichtempfindliches aufzeichnungsmaterial, dessen verwendung und dafuer geeignete neue leukoverbindung.
ES2058532T3 (es) Composiciones intensificadoras de puntos para sistemas fotograficos y metodos para su uso.
EP0403100A3 (de) Photopolymerisierbare Zusammensetzungen mit hoher Empfindlichkeit, die wasserstoffabgebende Merkaptane enthalten
ATE133642T1 (de) Verwendung eines irreversibel und stufenweise verformbaren materials zum schützen von gegenständen vor schlägen
BR8304780A (pt) Mistura fotopolimerizavel e 1,3-diaza-9-tia-antracen-2,4-dionas
ES441081A1 (es) Un procedimiento para la polimerizacion de un sistema foto- polimerizable.
JPS6440388A (en) Optical data recording medium for compact disc
JPH0417405B2 (de)
JPS56123537A (en) Photosensitive and heat-sensitive type recording member

Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings
8339 Ceased/non-payment of the annual fee