DE69024786D1 - Neue oniumsalze und deren verwendung als photoinitiatoren - Google Patents

Neue oniumsalze und deren verwendung als photoinitiatoren

Info

Publication number
DE69024786D1
DE69024786D1 DE69024786T DE69024786T DE69024786D1 DE 69024786 D1 DE69024786 D1 DE 69024786D1 DE 69024786 T DE69024786 T DE 69024786T DE 69024786 T DE69024786 T DE 69024786T DE 69024786 D1 DE69024786 D1 DE 69024786D1
Authority
DE
Germany
Prior art keywords
photoinitiators
onium salts
new onium
new
salts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69024786T
Other languages
English (en)
Other versions
DE69024786T2 (de
Inventor
Franklin Donald Saeva
David Thomas Breslin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of DE69024786D1 publication Critical patent/DE69024786D1/de
Application granted granted Critical
Publication of DE69024786T2 publication Critical patent/DE69024786T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C391/00—Compounds containing selenium
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66—Arsenic compounds
    • C07F9/70—Organo-arsenic compounds
    • C07F9/74—Aromatic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
DE69024786T 1989-10-10 1990-10-01 Neue oniumsalze und deren verwendung als photoinitiatoren Expired - Fee Related DE69024786T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/419,245 US5141969A (en) 1988-11-21 1989-10-10 Onium salts and the use thereof as photoinitiators
PCT/US1990/005494 WO1991006039A1 (en) 1989-10-10 1990-10-01 Novel onium salts and the use thereof as photoinitiators

Publications (2)

Publication Number Publication Date
DE69024786D1 true DE69024786D1 (de) 1996-02-22
DE69024786T2 DE69024786T2 (de) 1996-08-29

Family

ID=23661429

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69024786T Expired - Fee Related DE69024786T2 (de) 1989-10-10 1990-10-01 Neue oniumsalze und deren verwendung als photoinitiatoren

Country Status (6)

Country Link
US (1) US5141969A (de)
EP (1) EP0447544B1 (de)
JP (1) JPH04502374A (de)
CA (1) CA2039703A1 (de)
DE (1) DE69024786T2 (de)
WO (1) WO1991006039A1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401607A (en) * 1991-04-17 1995-03-28 Polaroid Corporation Processes and compositions for photogeneration of acid
US5302757A (en) * 1992-09-14 1994-04-12 Eastman Kodak Company Ultraviolet light sensitive onium salts
US5286612A (en) * 1992-10-23 1994-02-15 Polaroid Corporation Process for generation of free superacid and for imaging, and imaging medium for use therein
US5334489A (en) * 1992-10-23 1994-08-02 Polaroid Corporation Process for generation of squaric acid and for imaging, and imaging medium for use therein
US5441850A (en) * 1994-04-25 1995-08-15 Polaroid Corporation Imaging medium and process for producing an image
US5741630A (en) * 1994-04-25 1998-04-21 Polaroid Corporation Process for fixing an image, and medium for use therein
US5798130A (en) * 1995-09-05 1998-08-25 John W. Von Holdt Adjustable mold gate
DE19533607A1 (de) * 1995-09-11 1997-03-13 Basf Ag Positivarbeitendes strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen
EP0951661A1 (de) * 1996-11-27 1999-10-27 Polaroid Corporation Verfahren und zusammensetzung zur erzeugung einer saüre
EP0889360B1 (de) * 1997-06-30 2002-01-30 Siemens Aktiengesellschaft Reaktionsharzmischungen und deren Verwendung
DE59802875D1 (de) * 1997-06-30 2002-03-14 Siemens Ag Initiatoren für die kationische Polymerisation
EP1410907B1 (de) * 2000-06-02 2016-05-18 FUJIFILM Corporation Flachdruckplattenvorläufer
EP1390664A4 (de) * 2001-03-30 2008-01-02 Univ Arizona Materialien, verfahren und verwendungen zur photochemischen erzeugung von säuren und/oder radikalen spezien
US6630047B2 (en) 2001-05-21 2003-10-07 3M Innovative Properties Company Fluoropolymer bonding composition and method
WO2005091068A1 (ja) * 2004-03-24 2005-09-29 Fuji Photo Film Co., Ltd. 画像形成方法、平版印刷版原版および平版印刷方法
US7858291B2 (en) * 2005-02-28 2010-12-28 Fujifilm Corporation Lithographic printing plate precursor, method for preparation of lithographic printing plate precursor, and lithographic printing method
US8026296B2 (en) 2005-12-20 2011-09-27 3M Innovative Properties Company Dental compositions including a thermally labile component, and the use thereof
US20070142498A1 (en) * 2005-12-20 2007-06-21 Brennan Joan V Dental compositions including thermally responsive additives, and the use thereof
US7896650B2 (en) 2005-12-20 2011-03-01 3M Innovative Properties Company Dental compositions including radiation-to-heat converters, and the use thereof
US7776940B2 (en) 2005-12-20 2010-08-17 3M Innovative Properties Company Methods for reducing bond strengths, dental compositions, and the use thereof
US8404427B2 (en) * 2005-12-28 2013-03-26 Fujifilm Corporation Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition
JP2008203573A (ja) * 2007-02-20 2008-09-04 Fujifilm Corp 感光性組成物および２光子吸収光記録媒体
US8772189B2 (en) 2011-05-04 2014-07-08 Ferro Corporation Glass frit compositions for enamels
CN106458879A (zh) * 2014-05-13 2017-02-22 东洋合成工业株式会社 鎓盐、光酸产生剂、感光性树脂组合物及装置的制造方法
CN112300042B (zh) * 2020-09-27 2022-06-07 同济大学 4-苯并五元环-苯基硫鎓盐类化合物及其制备方法和应用

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1512982A (en) * 1974-05-02 1978-06-01 Gen Electric Salts
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4442197A (en) * 1982-01-11 1984-04-10 General Electric Company Photocurable compositions
NO853494L (no) * 1984-09-07 1986-03-10 Pilot Pen Co Ltd Fotosensiv blanding
US4933377A (en) * 1988-02-29 1990-06-12 Saeva Franklin D Novel sulfonium salts and the use thereof as photoinitiators
EP0331496B1 (de) * 1988-03-03 1992-09-16 Sanshin Kagaku Kogyo Co., Ltd. Polyfluorid-Sulfonium-Verbindungen und deren Verwendung als Polymerisierungsinitiator
US5047568A (en) * 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
CA2002873A1 (en) * 1988-11-21 1990-05-21 Franklin Donald Saeva Onium salts and the use thereof as photoinitiators
US4954416A (en) * 1988-12-21 1990-09-04 Minnesota Mining And Manufacturing Company Tethered sulfonium salt photoinitiators for free radical polymerization

Also Published As

Publication number Publication date
JPH04502374A (ja) 1992-04-23
EP0447544A1 (de) 1991-09-25
EP0447544B1 (de) 1996-01-10
WO1991006039A1 (en) 1991-05-02
CA2039703A1 (en) 1991-04-11
US5141969A (en) 1992-08-25
DE69024786T2 (de) 1996-08-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee