ATE179804T1 - Für bestrahlung im sichtbaren bereich empfindliche zusammensetzung und daraus herstellbares aufzeichnungsmaterial - Google Patents
Für bestrahlung im sichtbaren bereich empfindliche zusammensetzung und daraus herstellbares aufzeichnungsmaterialInfo
- Publication number
- ATE179804T1 ATE179804T1 AT95108090T AT95108090T ATE179804T1 AT E179804 T1 ATE179804 T1 AT E179804T1 AT 95108090 T AT95108090 T AT 95108090T AT 95108090 T AT95108090 T AT 95108090T AT E179804 T1 ATE179804 T1 AT E179804T1
- Authority
- AT
- Austria
- Prior art keywords
- radiation
- recording material
- material produced
- visible
- visible area
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title abstract 7
- 239000000203 mixture Substances 0.000 title abstract 5
- 239000000463 material Substances 0.000 title abstract 2
- 239000003999 initiator Substances 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000000975 dye Substances 0.000 abstract 1
- 150000004010 onium ions Chemical class 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/148—Light sensitive titanium compound containing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Photoreceptors In Electrophotography (AREA)
- Polymerisation Methods In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4418645A DE4418645C1 (de) | 1994-05-27 | 1994-05-27 | Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE179804T1 true ATE179804T1 (de) | 1999-05-15 |
Family
ID=6519187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT95108090T ATE179804T1 (de) | 1994-05-27 | 1995-05-26 | Für bestrahlung im sichtbaren bereich empfindliche zusammensetzung und daraus herstellbares aufzeichnungsmaterial |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6051366A (de) |
| EP (1) | EP0684522B2 (de) |
| AT (1) | ATE179804T1 (de) |
| CA (1) | CA2150341A1 (de) |
| DE (2) | DE4418645C1 (de) |
Families Citing this family (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9611291D0 (en) * | 1996-05-30 | 1996-07-31 | Dow Corning | Room temperature curable compositions |
| US6569594B2 (en) * | 1998-04-15 | 2003-05-27 | Agfa-Gevaert | Heat mode sensitive imaging element for making positive working printing plates |
| US7129021B2 (en) * | 1999-12-17 | 2006-10-31 | Creo Srl | Polymer system with switchable physical properties and its use in direct exposure printing plates |
| KR100795759B1 (ko) * | 2000-06-15 | 2008-01-21 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 미세유체 물품의 제조 방법 |
| DE60139624D1 (de) * | 2000-06-15 | 2009-10-01 | 3M Innovative Properties Co | Erzeugung eines mehrfarbenbildes mittels eines multiphoton photochemischen verfahren |
| US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| KR100811017B1 (ko) * | 2000-06-15 | 2008-03-11 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 다중방향성 광반응성 흡수 방법 |
| US7166409B2 (en) * | 2000-06-15 | 2007-01-23 | 3M Innovative Properties Company | Multipass multiphoton absorption method and apparatus |
| KR100810547B1 (ko) * | 2000-06-15 | 2008-03-18 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법 |
| US6548215B2 (en) | 2001-02-09 | 2003-04-15 | Kodak Polychrome Graphics Llc | Method for the production of a printing plate using the dual-feed technology |
| JP4512281B2 (ja) | 2001-02-22 | 2010-07-28 | 富士フイルム株式会社 | ネガ型平版印刷版原版 |
| JP4266077B2 (ja) | 2001-03-26 | 2009-05-20 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷方法 |
| US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
| US6706454B2 (en) | 2001-07-05 | 2004-03-16 | Kodak Polychrome Graphics Llc | Method for the production of a printing plate using particle growing acceleration by an additive polymer |
| US6664025B2 (en) | 2002-02-12 | 2003-12-16 | Kodak Polychrome Graphics Llc | Visible radiation sensitive composition |
| US6783913B2 (en) | 2002-04-05 | 2004-08-31 | Kodak Polychrome Graphics Llc | Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing |
| US6936384B2 (en) | 2002-08-01 | 2005-08-30 | Kodak Polychrome Graphics Llc | Infrared-sensitive composition containing a metallocene derivative |
| EP1857276A3 (de) | 2002-09-30 | 2007-12-05 | FUJIFILM Corporation | Flachdruckplattenvorläufer |
| JP2004126050A (ja) | 2002-09-30 | 2004-04-22 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4137577B2 (ja) | 2002-09-30 | 2008-08-20 | 富士フイルム株式会社 | 感光性組成物 |
| DE10255667B4 (de) | 2002-11-28 | 2006-05-11 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit |
| US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
| US8110337B2 (en) | 2002-12-18 | 2012-02-07 | Fujifilm Corporation | Polymerizable composition and lithographic printing plate precursor |
| JP4150261B2 (ja) | 2003-01-14 | 2008-09-17 | 富士フイルム株式会社 | 平版印刷版原版の製版方法 |
| JP2004252201A (ja) | 2003-02-20 | 2004-09-09 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4299639B2 (ja) | 2003-07-29 | 2009-07-22 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた画像記録材料 |
| JP2005099284A (ja) | 2003-09-24 | 2005-04-14 | Fuji Photo Film Co Ltd | 感光性組成物及び平版印刷版原版 |
| US8741536B2 (en) | 2003-09-24 | 2014-06-03 | IBF Industria Basileira de Filmes S/A | Light sensitive coating compositions useful for lithographic elements |
| JP4406617B2 (ja) * | 2005-03-18 | 2010-02-03 | 富士フイルム株式会社 | 感光性組成物および平版印刷版原版 |
| JP4668111B2 (ja) * | 2005-12-26 | 2011-04-13 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた平版印刷版原版 |
| US7524614B2 (en) * | 2006-05-26 | 2009-04-28 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| US8084182B2 (en) | 2008-04-29 | 2011-12-27 | Eastman Kodak Company | On-press developable elements and methods of use |
| EP2194429A1 (de) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten |
| US20100151385A1 (en) | 2008-12-17 | 2010-06-17 | Ray Kevin B | Stack of negative-working imageable elements |
| US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
| US20100215919A1 (en) | 2009-02-20 | 2010-08-26 | Ting Tao | On-press developable imageable elements |
| US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
| US8318405B2 (en) | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
| US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
| US8257907B2 (en) | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
| EP2284005B1 (de) | 2009-08-10 | 2012-05-02 | Eastman Kodak Company | Lithografische Druckplattenvorläufer mit Betahydroxy-Alkylamid-Vernetzern |
| US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
| EP2293144B1 (de) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung |
| US8426104B2 (en) | 2009-10-08 | 2013-04-23 | Eastman Kodak Company | Negative-working imageable elements |
| US8329383B2 (en) | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
| US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
| US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
| US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8703381B2 (en) | 2011-08-31 | 2014-04-22 | Eastman Kodak Company | Lithographic printing plate precursors for on-press development |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| US8927197B2 (en) | 2012-11-16 | 2015-01-06 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| US20170021656A1 (en) | 2015-07-24 | 2017-01-26 | Kevin Ray | Lithographic imaging and printing with negative-working photoresponsive printing members |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL101499C (de) | 1951-08-20 | |||
| US2875047A (en) | 1955-01-19 | 1959-02-24 | Oster Gerald | Photopolymerization with the formation of coherent plastic masses |
| NL254617A (de) | 1959-08-05 | |||
| DE2025291C3 (de) | 1970-05-23 | 1974-03-14 | Farbwerke Hoechst Ag, Vormals Meister Lucius & Bruening, 6000 Frankfurt | Benzoxanthen- und Benzothioxanthenfarbstoffe und Verfahren zu ihrer Herstellung |
| US3729313A (en) † | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
| US3717558A (en) | 1972-03-30 | 1973-02-20 | Scm Corp | Photopolymerization catalyst comprising a metallocene and an active halogen-containing compound |
| US4175963A (en) * | 1974-05-02 | 1979-11-27 | General Electric Company | Method of exposing and curing an epoxy composition containing an aromatic onium salt |
| US4069054A (en) * | 1975-09-02 | 1978-01-17 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer |
| US4548891A (en) * | 1983-02-11 | 1985-10-22 | Ciba Geigy Corporation | Photopolymerizable compositions containing prepolymers with olefin double bonds and titanium metallocene photoinitiators |
| US4590287A (en) * | 1983-02-11 | 1986-05-20 | Ciba-Geigy Corporation | Fluorinated titanocenes and photopolymerizable composition containing same |
| US4713401A (en) * | 1984-12-20 | 1987-12-15 | Martin Riediker | Titanocenes and a radiation-polymerizable composition containing these titanocenes |
| GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
| KR910000199B1 (ko) | 1986-04-15 | 1991-01-23 | 시바-가이기 코오포레이숀 | 액체 광개시제 혼합물 |
| DE3784199D1 (de) * | 1986-08-01 | 1993-03-25 | Ciba Geigy Ag | Titanocene und deren verwendung. |
| US4857654A (en) * | 1986-08-01 | 1989-08-15 | Ciba-Geigy Corporation | Titanocenes and their use |
| DE3768919D1 (en) | 1986-11-26 | 1991-05-02 | Ciba Geigy Ag | Fluessige photoinitiatorgemische. |
| EP0277915B1 (de) * | 1987-02-02 | 1991-09-04 | Ciba-Geigy Ag | Photoinitiatorengemische enthaltend ein Titanocen und ein 3-Ketocoumarin |
| US5147900A (en) * | 1987-08-28 | 1992-09-15 | Minnesosta Mining And Manufacturing Company | Energy-induced dual curable compositions |
| US5086086A (en) * | 1987-08-28 | 1992-02-04 | Minnesota Mining And Manufacturing Company | Energy-induced curable compositions |
| US5008302A (en) * | 1987-12-01 | 1991-04-16 | Ciba-Geigy Corporation | Titanocenes, the use thereof, and N-substituted pyrroles |
| US4959297A (en) * | 1987-12-09 | 1990-09-25 | Minnesota Mining And Manufacturing Company | Ternary photoinitiator system for addition polymerization |
| DE3743457A1 (de) | 1987-12-22 | 1989-07-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE3832032A1 (de) * | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| US4971892A (en) * | 1988-11-23 | 1990-11-20 | Minnesota Mining And Manufacturing Company | High sensitivity photopolymerizable composition |
| US4921827A (en) * | 1988-11-23 | 1990-05-01 | Minnesota Mining And Manufacturing Company | Sensitized photoinitiator system for addition polymerization |
| JP2571113B2 (ja) * | 1988-12-29 | 1997-01-16 | 富士写真フイルム株式会社 | 光重合性組成物 |
| US5192642A (en) | 1989-06-01 | 1993-03-09 | Ciba-Geigy Corporation | Oxygen-containing titanocenes, and the use thereof |
| DE4007428A1 (de) * | 1990-03-09 | 1991-09-12 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE4008815A1 (de) † | 1990-03-20 | 1991-09-26 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE4013358A1 (de) * | 1990-04-26 | 1991-10-31 | Hoechst Ag | Verfahren zur herstellung von druckformen oder photoresists durch bildmaessiges bestrahlen eines photopolymerisierbaren aufzeichnungsmaterials |
| JP2758737B2 (ja) † | 1991-07-11 | 1998-05-28 | 日本ペイント株式会社 | 光重合性組成物及び感光性平版印刷版 |
| DE4217495A1 (de) * | 1992-05-27 | 1993-12-02 | Hoechst Ag | Photopolymerisierbares Gemisch und daraus hergestelltes Aufzeichnungsmaterial |
| US5629354A (en) * | 1995-02-28 | 1997-05-13 | Eastman Kodak Company | Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator |
-
1994
- 1994-05-27 DE DE4418645A patent/DE4418645C1/de not_active Expired - Fee Related
-
1995
- 1995-05-25 US US08/450,968 patent/US6051366A/en not_active Expired - Fee Related
- 1995-05-26 AT AT95108090T patent/ATE179804T1/de not_active IP Right Cessation
- 1995-05-26 CA CA002150341A patent/CA2150341A1/en not_active Abandoned
- 1995-05-26 EP EP95108090A patent/EP0684522B2/de not_active Expired - Lifetime
- 1995-05-26 DE DE69509435T patent/DE69509435T3/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CA2150341A1 (en) | 1995-11-28 |
| DE69509435T2 (de) | 2000-01-05 |
| DE4418645C1 (de) | 1995-12-14 |
| DE69509435D1 (de) | 1999-06-10 |
| DE69509435T3 (de) | 2004-07-08 |
| US6051366A (en) | 2000-04-18 |
| EP0684522B2 (de) | 2003-09-24 |
| EP0684522B1 (de) | 1999-05-06 |
| EP0684522A1 (de) | 1995-11-29 |
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