DE69424246T2 - Optisches Konfokalsystem für Dickenmessungen an einer Halbleiterscheibe mit einem Muster - Google Patents
Optisches Konfokalsystem für Dickenmessungen an einer Halbleiterscheibe mit einem MusterInfo
- Publication number
- DE69424246T2 DE69424246T2 DE69424246T DE69424246T DE69424246T2 DE 69424246 T2 DE69424246 T2 DE 69424246T2 DE 69424246 T DE69424246 T DE 69424246T DE 69424246 T DE69424246 T DE 69424246T DE 69424246 T2 DE69424246 T2 DE 69424246T2
- Authority
- DE
- Germany
- Prior art keywords
- pattern
- semiconductor wafer
- thickness measurements
- confocal system
- optical confocal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/134,729 US5436725A (en) | 1993-10-12 | 1993-10-12 | Cofocal optical system for thickness measurements of patterned wafers |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69424246D1 DE69424246D1 (de) | 2000-06-08 |
DE69424246T2 true DE69424246T2 (de) | 2000-12-14 |
Family
ID=22464720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69424246T Expired - Lifetime DE69424246T2 (de) | 1993-10-12 | 1994-10-10 | Optisches Konfokalsystem für Dickenmessungen an einer Halbleiterscheibe mit einem Muster |
Country Status (6)
Country | Link |
---|---|
US (1) | US5436725A (de) |
EP (1) | EP0647828B1 (de) |
JP (1) | JP2515090B2 (de) |
DE (1) | DE69424246T2 (de) |
IL (1) | IL111218A (de) |
NO (1) | NO943839L (de) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5555474A (en) * | 1994-12-21 | 1996-09-10 | Integrated Process Equipment Corp. | Automatic rejection of diffraction effects in thin film metrology |
US5640242A (en) * | 1996-01-31 | 1997-06-17 | International Business Machines Corporation | Assembly and method for making in process thin film thickness measurments |
WO2000055686A1 (en) * | 1997-05-21 | 2000-09-21 | Joseph Lyons | Passive shaped chuck for correcting field curvature |
US6337698B1 (en) * | 1998-11-20 | 2002-01-08 | Microsoft Corporation | Pen-based interface for a notepad computer |
US6690473B1 (en) * | 1999-02-01 | 2004-02-10 | Sensys Instruments Corporation | Integrated surface metrology |
US6122064A (en) * | 1999-05-28 | 2000-09-19 | Philips Electronics North America Corporation | Method for measuring thickness of films |
US9607301B2 (en) * | 2000-04-27 | 2017-03-28 | Merck Patent Gmbh | Photovoltaic sensor facilities in a home environment |
KR20010100724A (ko) * | 2000-05-06 | 2001-11-14 | 임쌍근 | 마이크로 머신기술로 제작된 멀티미러 어레이의 평가계측장비 |
US7095511B2 (en) * | 2000-07-06 | 2006-08-22 | Filmetrics, Inc. | Method and apparatus for high-speed thickness mapping of patterned thin films |
US6940592B2 (en) * | 2001-10-09 | 2005-09-06 | Applied Materials, Inc. | Calibration as well as measurement on the same workpiece during fabrication |
AU2002342349A1 (en) | 2001-11-07 | 2003-05-19 | Applied Materials, Inc. | Maskless printer using photoelectric conversion of a light beam array |
US6946655B2 (en) | 2001-11-07 | 2005-09-20 | Applied Materials, Inc. | Spot grid array electron imaging system |
KR20050044371A (ko) * | 2001-11-07 | 2005-05-12 | 어플라이드 머티어리얼스, 인코포레이티드 | 광학 스폿 그리드 어레이 프린터 |
US6639201B2 (en) * | 2001-11-07 | 2003-10-28 | Applied Materials, Inc. | Spot grid array imaging system |
AU2003220252A1 (en) * | 2003-03-14 | 2004-10-11 | Midwest Research Institute | Wafer characteristics via reflectometry |
KR100546796B1 (ko) * | 2003-07-21 | 2006-01-25 | 동부아남반도체 주식회사 | 두께와 광학 이미지의 라이브러리를 이용한 절연막검사방법 |
US7084966B2 (en) * | 2003-10-20 | 2006-08-01 | Infineon Technologies Ag | Optical measurement of device features using lenslet array illumination |
WO2005083352A1 (en) * | 2004-02-11 | 2005-09-09 | Filmetrics, Inc. | Method and apparatus for high-speed thickness mapping of patterned thin films |
US7910822B1 (en) * | 2005-10-17 | 2011-03-22 | Solaria Corporation | Fabrication process for photovoltaic cell |
US8227688B1 (en) | 2005-10-17 | 2012-07-24 | Solaria Corporation | Method and resulting structure for assembling photovoltaic regions onto lead frame members for integration on concentrating elements for solar cells |
US7444198B2 (en) | 2006-12-15 | 2008-10-28 | Applied Materials, Inc. | Determining physical property of substrate |
US7952708B2 (en) | 2007-04-02 | 2011-05-31 | Applied Materials, Inc. | High throughput measurement system |
US7910392B2 (en) | 2007-04-02 | 2011-03-22 | Solaria Corporation | Method and system for assembling a solar cell package |
US20090056806A1 (en) * | 2007-09-05 | 2009-03-05 | Solaria Corporation | Solar cell structure including a plurality of concentrator elements with a notch design and predetermined radii and method |
US8119902B2 (en) | 2007-05-21 | 2012-02-21 | Solaria Corporation | Concentrating module and method of manufacture for photovoltaic strips |
US7910035B2 (en) | 2007-12-12 | 2011-03-22 | Solaria Corporation | Method and system for manufacturing integrated molded concentrator photovoltaic device |
KR101151274B1 (ko) * | 2010-01-07 | 2012-06-14 | 주식회사 쓰리비 시스템 | 결점 검사장치 |
CN101825760B (zh) * | 2010-03-24 | 2011-12-14 | 苏州大学 | 一种大口径球面主镜 |
JP5365581B2 (ja) * | 2010-05-28 | 2013-12-11 | 信越半導体株式会社 | 薄膜付ウェーハの評価方法 |
USD699176S1 (en) | 2011-06-02 | 2014-02-11 | Solaria Corporation | Fastener for solar modules |
CN103673884B (zh) * | 2013-12-26 | 2016-09-14 | 北京信息科技大学 | 双三角光学测头的光路系统 |
US9891048B2 (en) * | 2014-01-29 | 2018-02-13 | Advanced Semiconductor Engineering, Inc. | Measurement equipment |
CN105937885B (zh) * | 2016-04-29 | 2018-08-14 | 浙江大学 | 一种自由曲面子孔径拼接干涉检测中被测面定位匹配方法 |
DE102016115827A1 (de) * | 2016-08-25 | 2018-03-01 | Nanofocus Ag | Verfahren und Vorrichtung zur optischen Oberflächenmessung mit Hilfe eines chromatisch konfokalen Sensors |
US20180172425A1 (en) * | 2016-12-21 | 2018-06-21 | The Penn State Research Foundation | High definition optical coherence tomography imaging for non-invasive examination of heritage works |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2046432B (en) * | 1979-04-09 | 1983-05-11 | Infrared Eng Ltd | Apparatus for determining the thickness moisture content or other parameter of a film or coating |
JPS57167651A (en) * | 1981-04-07 | 1982-10-15 | Mitsubishi Electric Corp | Inspecting device for surface of semiconductor wafer |
US4845373A (en) * | 1984-02-22 | 1989-07-04 | Kla Instruments Corporation | Automatic alignment apparatus having low and high resolution optics for coarse and fine adjusting |
JPS6157805U (de) * | 1984-09-20 | 1986-04-18 | ||
US4659220A (en) * | 1984-10-22 | 1987-04-21 | International Business Machines Corporation | Optical inspection system for semiconductor wafers |
JPS61155804A (ja) * | 1984-12-28 | 1986-07-15 | Toshiba Electron Syst Kk | 光学式水膜厚計 |
US4651200A (en) * | 1985-02-04 | 1987-03-17 | National Biomedical Research Foundation | Split-image, multi-power microscopic image display system and method |
JPH01110243A (ja) * | 1987-10-23 | 1989-04-26 | Hitachi Vlsi Eng Corp | 外観検査装置 |
SU1755244A1 (ru) * | 1990-07-23 | 1992-08-15 | Ленинградский Институт Точной Механики И Оптики | Препаравальна лупа |
CA2033130C (en) * | 1990-12-24 | 1996-12-31 | Brian William Petelka | Waterproof side rolling tarp system |
US5293214A (en) * | 1991-12-06 | 1994-03-08 | Hughes Aircraft Company | Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser |
US5291269A (en) * | 1991-12-06 | 1994-03-01 | Hughes Aircraft Company | Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations |
-
1993
- 1993-10-12 US US08/134,729 patent/US5436725A/en not_active Expired - Lifetime
-
1994
- 1994-10-10 EP EP94307402A patent/EP0647828B1/de not_active Expired - Lifetime
- 1994-10-10 DE DE69424246T patent/DE69424246T2/de not_active Expired - Lifetime
- 1994-10-10 IL IL11121894A patent/IL111218A/en not_active IP Right Cessation
- 1994-10-11 NO NO943839A patent/NO943839L/no unknown
- 1994-10-12 JP JP6246337A patent/JP2515090B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
IL111218A0 (en) | 1994-12-29 |
IL111218A (en) | 1996-11-14 |
DE69424246D1 (de) | 2000-06-08 |
US5436725A (en) | 1995-07-25 |
JP2515090B2 (ja) | 1996-07-10 |
EP0647828A2 (de) | 1995-04-12 |
NO943839L (no) | 1995-04-18 |
JPH07181019A (ja) | 1995-07-18 |
EP0647828A3 (de) | 1996-11-13 |
EP0647828B1 (de) | 2000-05-03 |
NO943839D0 (no) | 1994-10-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69424246T2 (de) | Optisches Konfokalsystem für Dickenmessungen an einer Halbleiterscheibe mit einem Muster | |
DE69112503T2 (de) | Oberflächenbehandlungsmittel für ein Substrat mit Aluminium-Linienmuster. | |
ATA50197A (de) | Beschichtetes substrat für eine transparente anordnung mit hoher selektivität | |
DE69418395T2 (de) | Chipträger mit einer Schutzschicht für die Schaltungsoberfläche | |
DE69322180T2 (de) | Halbleiteranordnung mit einer Leiterschicht | |
DE69634711D1 (de) | VBB-Referenz für spannungsgepümptes Substrat | |
DE69626851D1 (de) | Beleuchtungssystem zum optischen lesen von merkmalen auf einem substrat | |
DE69104800D1 (de) | Verfahren zur Fixierung einer sphärischen Linse auf einem Substrat. | |
DE69334324D1 (de) | Herstellungsverfahren für Halbleitersubstrat | |
DE69428387D1 (de) | Herstellungsverfahren für eine kristallisierte Halbleiterschicht | |
ATE375004T1 (de) | Eine integrierte schaltung auf einem ultrabiegsamen substrat und ein verfahren für eine drahtverbindung zwischen einer integrierten schaltung und einem ultrabiegsamen substrat | |
DE69217637T2 (de) | Optisches Aufzeichnungselement mit einer die Gebrauchsdauer steigernden Schicht | |
DE69214133D1 (de) | Grenzflächenplasmaprofil für photovoltaische beschichtungsvorrichtung | |
DE69610459T2 (de) | Vorrichtung mit einer Halbleiterwellenleiterstruktur | |
DE745109T1 (de) | Basisschicht für einen beschichtungsystem | |
DE68915440T2 (de) | Anordnung für ein durchsichtiges bedeckungselement mit einer elektrochromatischen schicht. | |
DE69414960D1 (de) | Halbleiterspeichergerät zur Ausführung einer Speicherprüfung | |
DE69420620D1 (de) | Halbleiteranordnung mit einer Durchgangsleitung | |
DE59802382D1 (de) | Verfahren zur Herstellung einer einseitig beschichteten und mit einem Finish versehenen Halbleiterscheibe | |
ID16181A (id) | Alat semi konduktor dengan permukaan terbelah | |
DE69609921D1 (de) | Herstellungsverfahren einer halbleiteranordnung geeignet zur oberflächenmontage | |
ITMI930071A0 (it) | Procedimento per fissare corpi semiconduttori su un substrato | |
DE69428221T2 (de) | Herstellungsverfahren einer Antireflektionsschicht für eine Anzeigevorrichtung | |
DE69025499D1 (de) | Fotolack-Beschichtung für Halbleiterplättchen | |
DE69717375T2 (de) | Bildgebendes Element mit schützender Deckbeschichtung für antistische Schicht t |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |