DE69411258D1 - Feinpartikel aus Verbindung filmformender Zusammensetzungen - Google Patents

Feinpartikel aus Verbindung filmformender Zusammensetzungen

Info

Publication number
DE69411258D1
DE69411258D1 DE69411258T DE69411258T DE69411258D1 DE 69411258 D1 DE69411258 D1 DE 69411258D1 DE 69411258 T DE69411258 T DE 69411258T DE 69411258 T DE69411258 T DE 69411258T DE 69411258 D1 DE69411258 D1 DE 69411258D1
Authority
DE
Germany
Prior art keywords
film
combination
fine particles
forming compositions
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69411258T
Other languages
English (en)
Other versions
DE69411258T2 (de
Inventor
Daijo Tomihisa
Shigefumi Kuramoto
Satoshi Ishida
Tadahiro Yoneda
Masaya Yoshida
Ichiro Namura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Shokubai Co Ltd
Original Assignee
Nippon Shokubai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP33649893A external-priority patent/JP2994937B2/ja
Application filed by Nippon Shokubai Co Ltd filed Critical Nippon Shokubai Co Ltd
Publication of DE69411258D1 publication Critical patent/DE69411258D1/de
Application granted granted Critical
Publication of DE69411258T2 publication Critical patent/DE69411258T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G83/00—Macromolecular compounds not provided for in groups C08G2/00 - C08G81/00
    • C08G83/001—Macromolecular compounds containing organic and inorganic sequences, e.g. organic polymers grafted onto silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C08F290/148—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F292/00—Macromolecular compounds obtained by polymerising monomers on to inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/12—Hydrolysis
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/42—Introducing metal atoms or metal-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
DE69411258T 1993-11-09 1994-11-09 Feinpartikel aus Verbindung filmformender Zusammensetzungen Expired - Lifetime DE69411258T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP27991593 1993-11-09
JP33649893A JP2994937B2 (ja) 1993-11-09 1993-12-28 有機ポリマー複合無機微粒子の製造方法

Publications (2)

Publication Number Publication Date
DE69411258D1 true DE69411258D1 (de) 1998-07-30
DE69411258T2 DE69411258T2 (de) 1999-04-01

Family

ID=26553541

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69411258T Expired - Lifetime DE69411258T2 (de) 1993-11-09 1994-11-09 Feinpartikel aus Verbindung filmformender Zusammensetzungen

Country Status (3)

Country Link
US (1) US5683501A (de)
EP (1) EP0661311B1 (de)
DE (1) DE69411258T2 (de)

Families Citing this family (43)

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US5888290A (en) * 1996-05-24 1999-03-30 Minnesota Mining And Manufacturing Company Composition and process for imparting durable repellency to substrates
FR2746003B1 (fr) * 1996-03-13 1998-04-30 Composition cosmetique a appliquer sur un support keratinique et utilisation
ATE271918T1 (de) * 1996-10-08 2004-08-15 Nippon Soda Co Photokatalytische überzugszusammensetzung und photokatalysator enthaltendes system
JP3145053B2 (ja) * 1997-05-12 2001-03-12 岩崎通信機株式会社 光導電体塗料とそれを用いた電子写真感光体
DE19720269A1 (de) * 1997-05-14 1998-11-19 Inst Neue Mat Gemein Gmbh Nanokomposit für thermische Isolierzwecke
DE19821665A1 (de) * 1997-05-28 1998-12-03 Basf Ag Compositpigmente auf Basis von polyalkylenpolyaminmodifizierten nanopartikulären Metalloxiden und anionischen Farbstoffen
US6599631B2 (en) * 2001-01-26 2003-07-29 Nanogram Corporation Polymer-inorganic particle composites
US7226966B2 (en) 2001-08-03 2007-06-05 Nanogram Corporation Structures incorporating polymer-inorganic particle blends
JP3876946B2 (ja) * 1998-01-20 2007-02-07 信越化学工業株式会社 帯電付与部材用コーティング剤及びそれを用いた電子写真用キャリア
US6210790B1 (en) * 1998-07-15 2001-04-03 Rensselaer Polytechnic Institute Glass-like composites comprising a surface-modified colloidal silica and method of making thereof
KR100447551B1 (ko) 1999-01-18 2004-09-08 가부시끼가이샤 도시바 복합 입자 및 그의 제조 방법, 수계 분산체, 화학 기계연마용 수계 분산체 조성물 및 반도체 장치의 제조 방법
JP4214203B2 (ja) * 1999-05-18 2009-01-28 オリヱント化学工業株式会社 有機−無機複合材料およびその製造方法
US6440560B1 (en) * 1999-07-26 2002-08-27 International Business Machines Corporation Nanoparticles formed with rigid connector compounds
CA2283890C (en) 1999-09-27 2007-09-18 Advanced Glazings Ltd. Honeycomb transparent insulation with improved insulating ability
KR100444239B1 (ko) * 1999-11-22 2004-08-11 제이에스알 가부시끼가이샤 복합화 입자의 제조 방법, 이 방법에 의해 제조되는복합화 입자 및 이 복합화 입자를 함유하는 화학 기계연마용 수계 분산체, 및 화학 기계 연마용 수계 분산체의제조 방법
US6743395B2 (en) * 2000-03-22 2004-06-01 Ebara Corporation Composite metallic ultrafine particles and process for producing the same
US6883908B2 (en) 2001-01-08 2005-04-26 3M Innovative Properties Company Methods and compositions for ink jet printing of pressure sensitive adhesive patterns or films on a wide range of substrates
TW569195B (en) * 2001-01-24 2004-01-01 Matsushita Electric Ind Co Ltd Micro-particle arranged body, its manufacturing method, and device using the same
EP1302514B1 (de) * 2001-10-09 2009-07-15 Mitsubishi Chemical Corporation Strahlungshärtbare Beschichtungszusammensetzung
US7072115B2 (en) * 2002-03-26 2006-07-04 Keiwa Inc. Light diffusion sheet and backlight unit using the same
JP2004093848A (ja) * 2002-08-30 2004-03-25 Toppan Printing Co Ltd 光拡散性スクリーンおよびこのスクリーンを用いた表示装置
KR100629684B1 (ko) * 2003-01-23 2006-09-29 전남대학교산학협력단 둥지 실리카를 포함하는 고무조성물
JP4283026B2 (ja) * 2003-04-07 2009-06-24 株式会社日本触媒 光学樹脂用添加剤とその製造方法および光学樹脂組成物
DE10326538A1 (de) * 2003-06-12 2005-01-05 Institut für Neue Materialien Gemeinnützige GmbH Abriebfeste optische Schichten und Formkörper
JP2005107068A (ja) * 2003-09-30 2005-04-21 Nippon Shokubai Co Ltd 光学シート用組成物
JP4357379B2 (ja) * 2003-11-10 2009-11-04 三菱製紙株式会社 インクジェット記録媒体の製造方法
DE102004006068A1 (de) * 2004-01-30 2005-08-18 Ami-Agrolinz Melamine International Gmbh Flammfest ausgerüstetes Aminoplastharzsystem
JP2006016538A (ja) * 2004-07-02 2006-01-19 Nissan Motor Co Ltd 樹脂組成物、樹脂組成物の製造方法及び樹脂組成物中間体
US20060009536A1 (en) * 2004-07-12 2006-01-12 Guang-Way Jang Functionalized sol-gel material, sol-gel film derived therefrom, and method for preparing the same
DE602005003475T2 (de) * 2004-07-16 2008-09-25 Dow Corning Corp., Midland Strahlungsempfindliche silikonharzzusammensetzung
TWI408104B (zh) * 2005-03-18 2013-09-11 Sumitomo Chemical Co 微細α-氧化鋁粒子之製造方法
NZ565663A (en) * 2005-08-09 2011-03-31 Univ Sunderland The use of hydrophobic silica particles in detecting and identifying fingerprints
US7972691B2 (en) * 2006-12-22 2011-07-05 Nanogram Corporation Composites of polymers and metal/metalloid oxide nanoparticles and methods for forming these composites
US8632702B2 (en) * 2007-01-03 2014-01-21 Nanogram Corporation Silicon/germanium particle inks, doped particles, printing and processes for semiconductor applications
WO2008090191A2 (de) * 2007-01-26 2008-07-31 Basf Se Partikel, verfahren zu ihrer herstellung und ihre verwendung
US8119233B2 (en) * 2007-02-17 2012-02-21 Nanogram Corporation Functional composites, functional inks and applications thereof
MX2011003669A (es) * 2008-10-15 2011-04-28 Basf Se Proceso para producir dispersiones de poliol que contienen silice y su uso para producir materiales de poliuretano.
CN102272218B (zh) 2009-01-08 2014-07-16 纳克公司 聚硅氧烷聚合物与无机纳米颗粒的复合物
GB0912201D0 (en) 2009-07-14 2009-08-26 Imerys Minerals Ltd Coating compositions
EP2990433B1 (de) * 2013-04-24 2022-03-09 DIC Corporation Anorganischer feinpartikelverbundkörper, verfahren zur herstellung davon, zusammensetzung und gehärtetes produkt
JP6901968B2 (ja) * 2015-06-04 2021-07-14 株式会社日本触媒 有機重合体微粒子
KR101749174B1 (ko) * 2016-01-18 2017-06-21 영창케미칼 주식회사 반사방지 코팅액 조성물 및 이를 이용한 반사방지 코팅막
KR102388720B1 (ko) * 2017-06-02 2022-04-21 삼성디스플레이 주식회사 나노 복합체, 이의 제조 방법 및 이를 이용한 나노 복합 필름

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DE3273474D1 (en) * 1981-10-16 1986-10-30 Ciba Geigy Ag Synergistic mixture of low and high molecular weight polyalkyl piperidines
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JPS6377940A (ja) * 1986-09-19 1988-04-08 Toshiba Silicone Co Ltd 真球状ポリメチルシルセスキオキサン粉末およびその製造方法
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Also Published As

Publication number Publication date
EP0661311B1 (de) 1998-06-24
EP0661311A2 (de) 1995-07-05
US5683501A (en) 1997-11-04
DE69411258T2 (de) 1999-04-01
EP0661311A3 (de) 1995-11-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition