DE69406701D1 - Chemisches Vergoldungsbad - Google Patents
Chemisches VergoldungsbadInfo
- Publication number
- DE69406701D1 DE69406701D1 DE69406701T DE69406701T DE69406701D1 DE 69406701 D1 DE69406701 D1 DE 69406701D1 DE 69406701 T DE69406701 T DE 69406701T DE 69406701 T DE69406701 T DE 69406701T DE 69406701 D1 DE69406701 D1 DE 69406701D1
- Authority
- DE
- Germany
- Prior art keywords
- chemical gilding
- gilding bath
- bath
- chemical
- gilding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9220393 | 1993-03-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69406701D1 true DE69406701D1 (de) | 1997-12-18 |
DE69406701T2 DE69406701T2 (de) | 1998-04-02 |
Family
ID=14047895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69406701T Expired - Fee Related DE69406701T2 (de) | 1993-03-26 | 1994-03-25 | Chemisches Vergoldungsbad |
Country Status (3)
Country | Link |
---|---|
US (1) | US5364460A (de) |
EP (1) | EP0618307B1 (de) |
DE (1) | DE69406701T2 (de) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE630991T1 (de) * | 1992-11-25 | 1995-07-13 | Kanto Kagaku | Stromloses goldbeschichtungsbad. |
US6197214B1 (en) * | 1996-06-26 | 2001-03-06 | Henkel Corporation | Ammonium thiosulfate complex of gold or silver and an amine |
US5750018A (en) * | 1997-03-18 | 1998-05-12 | Learonal, Inc. | Cyanide-free monovalent copper electroplating solutions |
DE19745601C2 (de) * | 1997-10-08 | 2001-07-12 | Fraunhofer Ges Forschung | Lösung und Verfahren zum stromlosen Abscheiden von Goldschichten sowie Verwendung der Lösung |
DE19745602C1 (de) | 1997-10-08 | 1999-07-15 | Atotech Deutschland Gmbh | Verfahren und Lösung zur Herstellung von Goldschichten |
US5935306A (en) * | 1998-02-10 | 1999-08-10 | Technic Inc. | Electroless gold plating bath |
JP4116718B2 (ja) * | 1998-11-05 | 2008-07-09 | 日本リーロナール有限会社 | 無電解金めっき方法及びそれに使用する無電解金めっき液 |
US6383269B1 (en) * | 1999-01-27 | 2002-05-07 | Shipley Company, L.L.C. | Electroless gold plating solution and process |
DE10018025A1 (de) | 2000-04-04 | 2001-10-18 | Atotech Deutschland Gmbh | Verfahren zum Erzeugen von lötfähigen Oberflächen und funktionellen Oberflächen auf Schaltungsträgern |
WO2002022909A1 (fr) * | 2000-09-18 | 2002-03-21 | Hitachi Chemical Co., Ltd. | Solution pour dorure autocatalytique et procede correspondant |
JP3482402B2 (ja) * | 2001-06-29 | 2003-12-22 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 置換金メッキ液 |
JP4932094B2 (ja) * | 2001-07-02 | 2012-05-16 | 日本リーロナール有限会社 | 無電解金めっき液および無電解金めっき方法 |
JP4375702B2 (ja) * | 2001-10-25 | 2009-12-02 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | めっき組成物 |
CN100405881C (zh) * | 2003-03-18 | 2008-07-23 | 日本特殊陶业株式会社 | 接线板 |
WO2004111299A2 (en) * | 2003-06-15 | 2004-12-23 | Unifine Works, Ltd. | Solution and method for ultra thin, non-porous and highly adhesive gold coating |
US7460872B2 (en) * | 2004-07-06 | 2008-12-02 | International Business Machines Corporation | Method and application for automatic tracking of mobile devices for computer network processor systems |
CN1981347A (zh) * | 2004-07-15 | 2007-06-13 | 积水化学工业株式会社 | 导电性微粒、导电性微粒的制造方法、和各向异性导电材料 |
SE0403042D0 (sv) * | 2004-12-14 | 2004-12-14 | Polymer Kompositer I Goeteborg | Improved stabilization and performance of autocatalytic electroless process |
US7410899B2 (en) * | 2005-09-20 | 2008-08-12 | Enthone, Inc. | Defectivity and process control of electroless deposition in microelectronics applications |
US20070175358A1 (en) * | 2006-02-01 | 2007-08-02 | Kilnam Hwang | Electroless gold plating solution |
US20070175359A1 (en) * | 2006-02-01 | 2007-08-02 | Kilnam Hwang | Electroless gold plating solution and method |
US7883738B2 (en) * | 2007-04-18 | 2011-02-08 | Enthone Inc. | Metallic surface enhancement |
US10017863B2 (en) * | 2007-06-21 | 2018-07-10 | Joseph A. Abys | Corrosion protection of bronzes |
TWI453301B (zh) * | 2007-11-08 | 2014-09-21 | Enthone | 浸鍍銀塗層上的自組分子 |
US7972655B2 (en) * | 2007-11-21 | 2011-07-05 | Enthone Inc. | Anti-tarnish coatings |
JP4758470B2 (ja) * | 2008-12-18 | 2011-08-31 | シャープ株式会社 | 突起電極の形成方法及び置換金めっき液 |
JP4831710B1 (ja) * | 2010-07-20 | 2011-12-07 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 無電解金めっき液及び無電解金めっき方法 |
KR101444687B1 (ko) * | 2014-08-06 | 2014-09-26 | (주)엠케이켐앤텍 | 무전해 금도금액 |
CN105745355B (zh) * | 2014-08-25 | 2018-03-30 | 小岛化学药品株式会社 | 还原型化学镀金液及使用该镀金液的化学镀金方法 |
JP2023058312A (ja) * | 2021-10-13 | 2023-04-25 | 上村工業株式会社 | 無電解金めっき浴 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1144304A (en) * | 1978-10-23 | 1983-04-12 | Glenn O. Mallory, Jr. | Electroless deposition of copper |
USH325H (en) * | 1980-07-30 | 1987-09-01 | Richardson Chemical Company | Electroless deposition of transition metals |
DE3640028C1 (de) * | 1986-11-24 | 1987-10-01 | Heraeus Gmbh W C | Saures Bad fuer das stromlose Abscheiden von Goldschichten |
US5232492A (en) * | 1992-01-23 | 1993-08-03 | Applied Electroless Concepts Inc. | Electroless gold plating composition |
-
1994
- 1994-03-25 DE DE69406701T patent/DE69406701T2/de not_active Expired - Fee Related
- 1994-03-25 US US08/217,717 patent/US5364460A/en not_active Expired - Fee Related
- 1994-03-25 EP EP94302158A patent/EP0618307B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0618307A1 (de) | 1994-10-05 |
US5364460A (en) | 1994-11-15 |
EP0618307B1 (de) | 1997-11-12 |
DE69406701T2 (de) | 1998-04-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |