DE69403462D1 - Dünne filmmaske für rötngenstrahllithographie und herstellungsverfahren - Google Patents

Dünne filmmaske für rötngenstrahllithographie und herstellungsverfahren

Info

Publication number
DE69403462D1
DE69403462D1 DE69403462T DE69403462T DE69403462D1 DE 69403462 D1 DE69403462 D1 DE 69403462D1 DE 69403462 T DE69403462 T DE 69403462T DE 69403462 T DE69403462 T DE 69403462T DE 69403462 D1 DE69403462 D1 DE 69403462D1
Authority
DE
Germany
Prior art keywords
ray
thin film
production method
film mask
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69403462T
Other languages
English (en)
Other versions
DE69403462T2 (de
Inventor
Rakesh Sethi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Semiconductor Corp
Original Assignee
National Semiconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Semiconductor Corp filed Critical National Semiconductor Corp
Application granted granted Critical
Publication of DE69403462D1 publication Critical patent/DE69403462D1/de
Publication of DE69403462T2 publication Critical patent/DE69403462T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69403462T 1993-03-19 1994-03-14 Dünne filmmaske für rötngenstrahllithographie und herstellungsverfahren Expired - Fee Related DE69403462T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/034,554 US5314768A (en) 1993-03-19 1993-03-19 Thin film mask for use in an x-ray lithographic process and its method of manufacture by forming opaque pattern of ions in a diamond layer
PCT/US1994/002734 WO1994022056A1 (en) 1993-03-19 1994-03-14 A thin film mask for use in an x-ray lithographic process and its method of manufacture

Publications (2)

Publication Number Publication Date
DE69403462D1 true DE69403462D1 (de) 1997-07-03
DE69403462T2 DE69403462T2 (de) 1997-11-06

Family

ID=21877152

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69403462T Expired - Fee Related DE69403462T2 (de) 1993-03-19 1994-03-14 Dünne filmmaske für rötngenstrahllithographie und herstellungsverfahren

Country Status (6)

Country Link
US (1) US5314768A (de)
EP (1) EP0689686B1 (de)
JP (1) JP3306067B2 (de)
KR (1) KR100289818B1 (de)
DE (1) DE69403462T2 (de)
WO (1) WO1994022056A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2298556A (en) * 1995-03-01 1996-09-04 St George's Healthcare Nhs Trust X-ray beam attenuator
US5778042A (en) * 1996-07-18 1998-07-07 University Of Hawaii Method of soft x-ray imaging
US7666579B1 (en) * 2001-09-17 2010-02-23 Serenity Technologies, Inc. Method and apparatus for high density storage of analog data in a durable medium

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT382040B (de) * 1983-03-01 1986-12-29 Guenther Stangl Verfahren zur herstellung von optisch strukturierten filtern fuer elektromagnetische strahlung und optisch strukturierter filter
JP2823276B2 (ja) * 1989-03-18 1998-11-11 株式会社東芝 Ｘ線マスクの製造方法および薄膜の内部応力制御装置
JPH03273611A (ja) * 1990-03-23 1991-12-04 Nec Corp Ｘ線リソグラフィ用マスクおよびその製造方法
JP3171590B2 (ja) * 1990-08-28 2001-05-28 住友電気工業株式会社 Ｘ線マスクとその製造方法
US5221411A (en) * 1991-04-08 1993-06-22 North Carolina State University Method for synthesis and processing of continuous monocrystalline diamond thin films
US5146481A (en) * 1991-06-25 1992-09-08 Diwakar Garg Diamond membranes for X-ray lithography

Also Published As

Publication number Publication date
KR960071388A (ko) 1996-02-24
EP0689686B1 (de) 1997-05-28
JPH08507907A (ja) 1996-08-20
WO1994022056A1 (en) 1994-09-29
KR100289818B1 (ko) 2001-09-17
DE69403462T2 (de) 1997-11-06
JP3306067B2 (ja) 2002-07-24
EP0689686A1 (de) 1996-01-03
US5314768A (en) 1994-05-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee