DE69324415D1 - Verfahren zur Abscheidung von dünnen supraleitenden Schichten und Herstellungsapparat - Google Patents

Verfahren zur Abscheidung von dünnen supraleitenden Schichten und Herstellungsapparat

Info

Publication number
DE69324415D1
DE69324415D1 DE69324415T DE69324415T DE69324415D1 DE 69324415 D1 DE69324415 D1 DE 69324415D1 DE 69324415 T DE69324415 T DE 69324415T DE 69324415 T DE69324415 T DE 69324415T DE 69324415 D1 DE69324415 D1 DE 69324415D1
Authority
DE
Germany
Prior art keywords
deposition
manufacturing apparatus
superconducting layers
thin superconducting
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69324415T
Other languages
English (en)
Other versions
DE69324415T2 (de
Inventor
Kousou Fujino
Satoshi Takano
Noriyuki Yoshida
Tsukushi Hara
Hideo Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE69324415D1 publication Critical patent/DE69324415D1/de
Publication of DE69324415T2 publication Critical patent/DE69324415T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0521—Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
DE69324415T 1992-07-30 1993-07-27 Verfahren zur Abscheidung von dünnen supraleitenden Schichten und Herstellungsapparat Expired - Fee Related DE69324415T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4203859A JP2895683B2 (ja) 1992-07-30 1992-07-30 酸化物超電導膜製造装置

Publications (2)

Publication Number Publication Date
DE69324415D1 true DE69324415D1 (de) 1999-05-20
DE69324415T2 DE69324415T2 (de) 1999-11-25

Family

ID=16480882

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69324415T Expired - Fee Related DE69324415T2 (de) 1992-07-30 1993-07-27 Verfahren zur Abscheidung von dünnen supraleitenden Schichten und Herstellungsapparat

Country Status (5)

Country Link
US (2) US5489338A (de)
EP (1) EP0584562B1 (de)
JP (1) JP2895683B2 (de)
CA (1) CA2101286C (de)
DE (1) DE69324415T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3255469B2 (ja) * 1992-11-30 2002-02-12 三菱電機株式会社 レーザ薄膜形成装置
US6376549B1 (en) * 1998-09-17 2002-04-23 Akesis Pharmaceuticals, Inc. Metforimin-containing compositions for the treatment of diabetes
JP4545902B2 (ja) * 2000-08-25 2010-09-15 キヤノン株式会社 成膜方法
GB0026868D0 (en) * 2000-11-03 2000-12-20 Isis Innovation Control of deposition and other processes
WO2007096485A2 (en) * 2006-02-23 2007-08-30 Picodeon Ltd Oy Coating on a metal substrate and a coated metal product
JP5225780B2 (ja) * 2008-08-06 2013-07-03 住友電気工業株式会社 薄膜の製造方法および薄膜製造装置
US8500994B2 (en) * 2010-01-07 2013-08-06 Fresenius Medical Care Holdings, Inc. Dialysis systems and methods
KR20140020567A (ko) * 2012-08-09 2014-02-19 삼성디스플레이 주식회사 증착 장치 및 증착 물질의 잔여량 측정 방법
DE102016117633A1 (de) * 2016-09-19 2018-03-22 Cl Schutzrechtsverwaltungs Gmbh Vorrichtung zur Herstellung dreidimensionaler Objekte
US11752558B2 (en) 2021-04-16 2023-09-12 General Electric Company Detecting optical anomalies on optical elements used in an additive manufacturing machine

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4265932A (en) * 1979-08-02 1981-05-05 Hughes Aircraft Company Mobile transparent window apparatus and method for photochemical vapor deposition
US4654226A (en) * 1986-03-03 1987-03-31 The University Of Delaware Apparatus and method for photochemical vapor deposition
US4837044A (en) * 1987-01-23 1989-06-06 Itt Research Institute Rugate optical filter systems
JPH0610356B2 (ja) * 1988-02-18 1994-02-09 松下電器産業株式会社 プラズマ処理装置およびプラズマ温度測定方法
US5017277A (en) * 1988-07-07 1991-05-21 Matsushita Electric Industrial Co., Ltd. Laser sputtering apparatus
US5097793A (en) * 1989-05-11 1992-03-24 Mitsubishi Denki Kabushiki Kaisha Thin film vacuum evaporation device

Also Published As

Publication number Publication date
EP0584562B1 (de) 1999-04-14
EP0584562A3 (en) 1994-06-22
US5489338A (en) 1996-02-06
CA2101286C (en) 1998-05-05
DE69324415T2 (de) 1999-11-25
JPH0652741A (ja) 1994-02-25
JP2895683B2 (ja) 1999-05-24
CA2101286A1 (en) 1994-01-31
US5601649A (en) 1997-02-11
EP0584562A2 (de) 1994-03-02

Similar Documents

Publication Publication Date Title
DE69222892D1 (de) Verfahren zur Herstellung dünner Schichten und mehrlagiger Schichten
DE69331659T2 (de) Verfahren zur Abscheidung von Polysiliziumschichten mit einer verbesserten Uniformität und dazugehörige Vorrichtung
DE69214825T2 (de) Verfahren und Vorrichtung zur Herstellung von gefrorenem Kuchen mit Krokantschichten
DE59403718D1 (de) Verfahren zur Herstellung von Metall- und Keramiksinterkörpern und -schichten
DE69312172T2 (de) Vorrichtung und Verfahren zum gleichzeitigen Strangpressen von dünnen Schichten
DE69431573T2 (de) Verfahren zur Herstellung von Schichten
DE69602300T2 (de) Verfahren zur Abscheidung von Kohlenstoffschichten
DE69224924T2 (de) Verfahren zur Ablagerung von Fluor-enthaltenden Silizium-Dioxid-Schichten
DE69319169T2 (de) Verfahren zur Herstellung von heteroepitaxischen dünnen Schichten und elektronischen Bauelementen
DE69231827T2 (de) Verfahren zur Herstellung von magnetischer Vielschicht-Komponenten
DE3852430D1 (de) Magnetron-Zerstäubungsgerät und Verfahren zur Anwendung desselben zur Schichtenherstellung.
DE69324511D1 (de) Mehrschichtig geformter Gegenstand und Verfahren zur dessen Herstellung
DE69324415T2 (de) Verfahren zur Abscheidung von dünnen supraleitenden Schichten und Herstellungsapparat
DE59308883D1 (de) Verfahren zur Oberflächenbeschichtung von Silbergegenständen und nach diesem Verfahren hergestellte Schutzschicht
DE69504563T2 (de) Verfahren zur Herstellung von Dünnschichten
DE69306863D1 (de) Glaskeramisches Mehrschichtsubstrat und Verfahren zur seiner Herstellung
DE69307937T2 (de) Verfahren und Vorrichtung zur Herstellung von Glasdünnschichten
DE59302244D1 (de) Verfahren und Vorrichtung zur Herstellung von ultradünnen Schichten und von Schichtelementen
DE69007757T2 (de) Verfahren zur Abscheidung einer keramischen Dünnschicht und danach hergestelltes Produkt.
DE59303845D1 (de) Verfahren zur Herstellung von oxidischen Schutzschichten
DE69318345T2 (de) Kobalt-Platin magnetischer Film und Herstellungsverfahren
DE69029234D1 (de) Verfahren zur Herstellung von Dünnschichtsupraleitern und supraleitenden Einrichtungen
DE69122177T2 (de) Verfahren und Apparat zur Herstellung supraleitender Dünnschichten
DE69408285T2 (de) Verfahren zur Herstellung von supraleitenden Josephson Hochtemperaturanordnungen
DE69315736D1 (de) Verfahren zur Herstellung von supraleitenden dünnen Schichten aus supraleitendem Oxidmaterial

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee