DE69320241D1 - Chemisch amplifizierte Resistzusammensetzung - Google Patents
Chemisch amplifizierte ResistzusammensetzungInfo
- Publication number
- DE69320241D1 DE69320241D1 DE69320241T DE69320241T DE69320241D1 DE 69320241 D1 DE69320241 D1 DE 69320241D1 DE 69320241 T DE69320241 T DE 69320241T DE 69320241 T DE69320241 T DE 69320241T DE 69320241 D1 DE69320241 D1 DE 69320241D1
- Authority
- DE
- Germany
- Prior art keywords
- resist composition
- chemically amplified
- amplified resist
- chemically
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11360492 | 1992-05-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69320241D1 true DE69320241D1 (de) | 1998-09-17 |
DE69320241T2 DE69320241T2 (de) | 1999-04-29 |
Family
ID=14616431
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69320241T Expired - Fee Related DE69320241T2 (de) | 1992-05-06 | 1993-05-05 | Chemisch amplifizierte Resistzusammensetzung |
Country Status (3)
Country | Link |
---|---|
US (1) | US5527659A (de) |
EP (1) | EP0568993B1 (de) |
DE (1) | DE69320241T2 (de) |
Families Citing this family (64)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69329130T2 (de) * | 1992-04-24 | 2001-03-29 | Kyowa Hakko Kogyo Co., Ltd. | Squaryliumverbindungen und diese benutzende optische Informationsaufzeichnungsmittel |
US5756258A (en) * | 1992-07-13 | 1998-05-26 | Kyowa Hakko Co., Ltd. | Photopolymerizable composition containing an addition polymerizable compound, a radical-producing agent and a squarylium compound |
CA2118604C (en) * | 1992-07-13 | 2004-07-06 | Tsuguo Yamaoka | Photopolymerizable composition comprising a squarylium compound |
US6007965A (en) * | 1992-07-13 | 1999-12-28 | Yamaoka; Tsuguo | Photopolymerizable compositions including squarylium compounds |
US6391512B1 (en) * | 1995-10-20 | 2002-05-21 | Konica Corporation | Image forming material and image forming method |
US5814431A (en) * | 1996-01-10 | 1998-09-29 | Mitsubishi Chemical Corporation | Photosensitive composition and lithographic printing plate |
EP0795789B1 (de) * | 1996-03-11 | 2000-02-09 | Fuji Photo Film Co., Ltd. | Negativarbeitendes Bildaufzeichnungsmaterial |
US5691098A (en) * | 1996-04-03 | 1997-11-25 | Minnesota Mining And Manufacturing Company | Laser-Induced mass transfer imaging materials utilizing diazo compounds |
US5747217A (en) * | 1996-04-03 | 1998-05-05 | Minnesota Mining And Manufacturing Company | Laser-induced mass transfer imaging materials and methods utilizing colorless sublimable compounds |
US5725989A (en) | 1996-04-15 | 1998-03-10 | Chang; Jeffrey C. | Laser addressable thermal transfer imaging element with an interlayer |
US7534543B2 (en) | 1996-04-15 | 2009-05-19 | 3M Innovative Properties Company | Texture control of thin film layers prepared via laser induced thermal imaging |
US5763134A (en) * | 1996-05-13 | 1998-06-09 | Imation Corp | Composition comprising photochemical acid progenitor and specific squarylium dye |
US6489065B1 (en) * | 1996-05-17 | 2002-12-03 | Polaroid Corporation | Holographic medium and process for use thereof |
US5710097A (en) * | 1996-06-27 | 1998-01-20 | Minnesota Mining And Manufacturing Company | Process and materials for imagewise placement of uniform spacers in flat panel displays |
US6140022A (en) * | 1996-07-19 | 2000-10-31 | Agfa-Gevaert, N.V. | Radiation sensitive imaging element and a method for producing lithographic plates therewith |
US5998085A (en) * | 1996-07-23 | 1999-12-07 | 3M Innovative Properties | Process for preparing high resolution emissive arrays and corresponding articles |
US6060222A (en) * | 1996-11-19 | 2000-05-09 | Kodak Polcyhrome Graphics Llc | 1Postitve-working imaging composition and element and method of forming positive image with a laser |
US6077641A (en) * | 1997-01-17 | 2000-06-20 | Kodak Polychrome Graphics Llc | Lithographic plates |
US6165674A (en) * | 1998-01-15 | 2000-12-26 | Shipley Company, L.L.C. | Polymers and photoresist compositions for short wavelength imaging |
US5865115A (en) * | 1998-06-03 | 1999-02-02 | Eastman Kodak Company | Using electro-osmosis for re-inking a moveable belt |
US6195112B1 (en) | 1998-07-16 | 2001-02-27 | Eastman Kodak Company | Steering apparatus for re-inkable belt |
EP1145607B1 (de) * | 1998-12-22 | 2011-10-12 | Huntsman Advanced Materials (Switzerland) GmbH | Herstellung von photoresistbeschichtungen |
DE60035078T2 (de) | 1999-01-15 | 2008-01-31 | 3M Innovative Properties Co., St. Paul | Herstellungsverfahren eines Donorelements für Übertragung durch Wärme |
US6114088A (en) | 1999-01-15 | 2000-09-05 | 3M Innovative Properties Company | Thermal transfer element for forming multilayer devices |
SG78412A1 (en) | 1999-03-31 | 2001-02-20 | Ciba Sc Holding Ag | Oxime derivatives and the use thereof as latent acids |
US6461775B1 (en) | 1999-05-14 | 2002-10-08 | 3M Innovative Properties Company | Thermal transfer of a black matrix containing carbon black |
US6228543B1 (en) | 1999-09-09 | 2001-05-08 | 3M Innovative Properties Company | Thermal transfer with a plasticizer-containing transfer layer |
US6521324B1 (en) | 1999-11-30 | 2003-02-18 | 3M Innovative Properties Company | Thermal transfer of microstructured layers |
US6451502B1 (en) | 2000-10-10 | 2002-09-17 | Kodak Polychrome Graphics Llc | manufacture of electronic parts |
US20030008229A1 (en) * | 2001-06-25 | 2003-01-09 | Prakash Seth | Thermally sensitive coating compositions useful for lithographic elements |
JP2003326691A (ja) | 2002-05-09 | 2003-11-19 | Konica Minolta Holdings Inc | 画像記録方法、エネルギー線硬化インク及び画像記録装置 |
US7309122B2 (en) | 2003-06-24 | 2007-12-18 | Konica Minolta Medical & Graphic, Inc. | Method for storing cationic polymerizable composition and container for using thereof |
US7678526B2 (en) | 2005-10-07 | 2010-03-16 | 3M Innovative Properties Company | Radiation curable thermal transfer elements |
US7396631B2 (en) | 2005-10-07 | 2008-07-08 | 3M Innovative Properties Company | Radiation curable thermal transfer elements |
JP5171005B2 (ja) | 2006-03-17 | 2013-03-27 | 富士フイルム株式会社 | 高分子化合物およびその製造方法、並びに顔料分散剤 |
US7223515B1 (en) | 2006-05-30 | 2007-05-29 | 3M Innovative Properties Company | Thermal mass transfer substrate films, donor elements, and methods of making and using same |
US7670450B2 (en) | 2006-07-31 | 2010-03-02 | 3M Innovative Properties Company | Patterning and treatment methods for organic light emitting diode devices |
EP1975702B1 (de) | 2007-03-29 | 2013-07-24 | FUJIFILM Corporation | Farbige lichthärtbare Zusammensetzung für eine Festkörperbildaufnahmevorrichtung, Farbfilter und Verfahren zur Herstellung davon, sowie Festkörperbildaufnahmevorrichtung |
JP5030638B2 (ja) | 2007-03-29 | 2012-09-19 | 富士フイルム株式会社 | カラーフィルタ及びその製造方法 |
JP5213375B2 (ja) | 2007-07-13 | 2013-06-19 | 富士フイルム株式会社 | 顔料分散液、硬化性組成物、それを用いるカラーフィルタ及び固体撮像素子 |
US7927454B2 (en) | 2007-07-17 | 2011-04-19 | Samsung Mobile Display Co., Ltd. | Method of patterning a substrate |
JP5371449B2 (ja) | 2008-01-31 | 2013-12-18 | 富士フイルム株式会社 | 樹脂、顔料分散液、着色硬化性組成物、これを用いたカラーフィルタ及びその製造方法 |
JP5448352B2 (ja) | 2008-03-10 | 2014-03-19 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子 |
JP5334624B2 (ja) | 2008-03-17 | 2013-11-06 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法 |
JP5535444B2 (ja) | 2008-03-28 | 2014-07-02 | 富士フイルム株式会社 | 固体撮像素子用緑色硬化性組成物、固体撮像素子用カラーフィルタ及びその製造方法 |
WO2009157262A1 (ja) | 2008-06-23 | 2009-12-30 | コニカミノルタホールディングス株式会社 | インクジェット記録装置及びインクジェット記録方法 |
JP5106285B2 (ja) | 2008-07-16 | 2012-12-26 | 富士フイルム株式会社 | 光硬化性組成物、インク組成物、及び該インク組成物を用いたインクジェット記録方法 |
JP5079653B2 (ja) | 2008-09-29 | 2012-11-21 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 |
JP5171514B2 (ja) | 2008-09-29 | 2013-03-27 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法 |
JP5127651B2 (ja) | 2008-09-30 | 2013-01-23 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 |
JP5374403B2 (ja) | 2009-02-13 | 2013-12-25 | 三菱製紙株式会社 | 感光性平版印刷版材料 |
CN102472837B (zh) | 2009-08-13 | 2015-02-25 | 富士胶片株式会社 | 晶片级透镜、晶片级透镜的制备方法和成像单元 |
JP2012003225A (ja) | 2010-01-27 | 2012-01-05 | Fujifilm Corp | ソルダーレジスト用重合性組成物及びソルダーレジストパターンの形成方法 |
EP2539316B1 (de) | 2010-02-24 | 2019-10-23 | Basf Se | Latente säuren und ihre verwendung |
WO2011122473A1 (ja) | 2010-03-29 | 2011-10-06 | 三菱製紙株式会社 | 感光性組成物及び感光性平版印刷版材料 |
JP5544239B2 (ja) | 2010-07-29 | 2014-07-09 | 富士フイルム株式会社 | 重合性組成物 |
JP5417364B2 (ja) | 2011-03-08 | 2014-02-12 | 富士フイルム株式会社 | 固体撮像素子用硬化性組成物、並びに、これを用いた感光層、永久パターン、ウエハレベルレンズ、固体撮像素子、及び、パターン形成方法 |
JP5934682B2 (ja) | 2012-08-31 | 2016-06-15 | 富士フイルム株式会社 | マイクロレンズ形成用又はカラーフィルターの下塗り膜形成用硬化性組成物、透明膜、マイクロレンズ、固体撮像素子、及び、硬化性組成物の製造方法 |
KR20150072428A (ko) | 2012-11-30 | 2015-06-29 | 후지필름 가부시키가이샤 | 경화성 수지 조성물, 이것을 사용한 이미지 센서칩의 제조 방법 및 이미지 센서칩 |
JP6140593B2 (ja) | 2012-11-30 | 2017-05-31 | 富士フイルム株式会社 | 硬化性樹脂組成物、これを用いたイメージセンサチップの製造方法及びイメージセンサチップ |
CN104812571B (zh) | 2013-08-01 | 2016-10-19 | Lg化学株式会社 | 具有三维结构的金属图形的制造方法 |
EP3253735B1 (de) | 2015-02-02 | 2021-03-31 | Basf Se | Latente säuren und ihre verwendung |
KR20220041863A (ko) | 2019-08-29 | 2022-04-01 | 후지필름 가부시키가이샤 | 조성물, 막, 근적외선 차단 필터, 패턴 형성 방법, 적층체, 고체 촬상 소자, 적외선 센서, 화상 표시 장치, 카메라 모듈, 및, 화합물 |
EP4024096A4 (de) | 2019-08-30 | 2022-12-14 | FUJIFILM Corporation | Zusammensetzung, film, optischer filter und verfahren zu dessen herstellung, festkörperabbildungselement, infrarotsensor und sensormodul |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4554238A (en) * | 1984-03-20 | 1985-11-19 | Minnesota Mining And Manufacturing Company | Spectrally-sensitized imaging system |
US4743530A (en) * | 1986-11-21 | 1988-05-10 | Eastman Kodak Company | Negative working photoresists responsive to longer wavelengths and novel coated articles |
US4743528A (en) * | 1986-11-21 | 1988-05-10 | Eastman Kodak Company | Enhanced imaging composition containing an azinium activator |
US4743531A (en) * | 1986-11-21 | 1988-05-10 | Eastman Kodak Company | Dye sensitized photographic imaging system |
JPH0820734B2 (ja) * | 1988-08-11 | 1996-03-04 | 富士写真フイルム株式会社 | 感光性組成物及びそれを用いた光重合性組成物 |
EP0379200A3 (de) * | 1989-01-19 | 1991-11-13 | Mitsubishi Kasei Corporation | Photopolymerisierbare Zusammensetzung |
EP0452263B1 (de) * | 1990-04-10 | 1995-07-19 | Ciba-Geigy Ag | Epoxidharz-Stoffgemische enthaltend Eisen-Aren-Komplexe und bestimmte Amine |
JP2897375B2 (ja) * | 1990-08-27 | 1999-05-31 | 三菱化学株式会社 | 光重合性組成物 |
-
1993
- 1993-05-05 DE DE69320241T patent/DE69320241T2/de not_active Expired - Fee Related
- 1993-05-05 EP EP93107288A patent/EP0568993B1/de not_active Expired - Lifetime
-
1994
- 1994-10-28 US US08/331,147 patent/US5527659A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69320241T2 (de) | 1999-04-29 |
EP0568993A2 (de) | 1993-11-10 |
EP0568993B1 (de) | 1998-08-12 |
US5527659A (en) | 1996-06-18 |
EP0568993A3 (de) | 1994-12-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |