DE69312118D1 - Verfahren zur Chlorierung einer Siliziumverbindung - Google Patents

Verfahren zur Chlorierung einer Siliziumverbindung

Info

Publication number
DE69312118D1
DE69312118D1 DE69312118T DE69312118T DE69312118D1 DE 69312118 D1 DE69312118 D1 DE 69312118D1 DE 69312118 T DE69312118 T DE 69312118T DE 69312118 T DE69312118 T DE 69312118T DE 69312118 D1 DE69312118 D1 DE 69312118D1
Authority
DE
Germany
Prior art keywords
chlorinating
silicon compound
silicon
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69312118T
Other languages
English (en)
Other versions
DE69312118T2 (de
Inventor
Mitsuo Ishikawa
Atsutaka Kunai
Yasushi Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE69312118D1 publication Critical patent/DE69312118D1/de
Application granted granted Critical
Publication of DE69312118T2 publication Critical patent/DE69312118T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/12Organo silicon halides
    • C07F7/121Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
    • C07F7/123Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-halogen linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0801General processes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0834Compounds having one or more O-Si linkage
    • C07F7/0838Compounds with one or more Si-O-Si sequences
    • C07F7/0872Preparation and treatment thereof
    • C07F7/0876Reactions involving the formation of bonds to a Si atom of a Si-O-Si sequence other than a bond of the Si-O-Si linkage

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
DE69312118T 1992-02-28 1993-02-05 Verfahren zur Chlorierung einer Siliziumverbindung Expired - Fee Related DE69312118T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4078711A JP2612991B2 (ja) 1992-02-28 1992-02-28 けい素化合物の塩素化方法

Publications (2)

Publication Number Publication Date
DE69312118D1 true DE69312118D1 (de) 1997-08-21
DE69312118T2 DE69312118T2 (de) 1998-02-19

Family

ID=13669456

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69312118T Expired - Fee Related DE69312118T2 (de) 1992-02-28 1993-02-05 Verfahren zur Chlorierung einer Siliziumverbindung

Country Status (4)

Country Link
US (1) US5258535A (de)
EP (1) EP0557762B1 (de)
JP (1) JP2612991B2 (de)
DE (1) DE69312118T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06157554A (ja) * 1992-11-27 1994-06-03 Toray Dow Corning Silicone Co Ltd トリオルガノクロロシランの製造方法
JP2864973B2 (ja) * 1993-11-05 1999-03-08 信越化学工業株式会社 ジメチルクロロシランとトリオルガノクロロシランの併産方法
US5523439A (en) * 1994-08-08 1996-06-04 Shin-Etsu Chemical Co., Ltd. Process for preparing silacyclohexane compounds
US5939577A (en) * 1998-07-22 1999-08-17 Sandia Corporation Method for the synthesis of chlorosilanes
US6429327B1 (en) 1999-01-21 2002-08-06 Fmc Corporation Organometallic catalysts
DE19962563C1 (de) 1999-12-23 2000-12-14 Wacker Chemie Gmbh Verfahren zur Herstellung von 1,3-Dihalogen-1,1,3,3-tetra(organyl)disiloxanen
US6918987B2 (en) * 2003-02-07 2005-07-19 Lord Corporation Surface preparation of rubber for coatings or bonding
KR100673554B1 (ko) * 2005-10-24 2007-01-24 한국과학기술연구원 트리플루오로메틸트리알킬실란의 제조방법
CN102037000A (zh) 2008-07-08 2011-04-27 株式会社钟化 α-杂取代烷基卤代氢硅烷的制造方法及其应用
EP2601245A1 (de) 2010-08-05 2013-06-12 Biofilm IP, LLC Cyclosiloxan-substituierte polysiloxanverbindungen, zusammensetzungen mit den verbindungen und verfahren zu ihrer verwendung
JP6249487B2 (ja) * 2014-07-08 2017-12-20 国立研究開発法人産業技術総合研究所 モノハロシランの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB907462A (en) * 1959-09-02 1962-10-03 Kali Chemie Ag Improvements in or relating to the manufacture of boron hydrides and boron hydrides containing organic substituent radicals
GB978621A (en) * 1960-02-03 1964-12-23 Secr Aviation Improvements in or relating to organo-silicon compounds
DE1668313A1 (de) * 1968-02-09 1971-05-13 Inst Silikon & Fluorkarbonchem Verfahren zur Herstellung von Organofluorsilanen
DE1767905B2 (de) * 1968-06-29 1975-08-28 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt Verfahren zur katalytischen Disproportionierung von mindestens eine Si-H-Bindung enthaltenden Halogensilanen der Organosilanen
DE2546919A1 (de) * 1975-10-20 1977-04-28 Consortium Elektrochem Ind Verfahren zum herstellen von methylchlorsilanen
FR2575472B1 (fr) * 1984-12-27 1987-03-20 Centre Nat Rech Scient Procede de preparation d'hydrogeno- ou d'halogenosilanes

Also Published As

Publication number Publication date
EP0557762A1 (de) 1993-09-01
JPH05239073A (ja) 1993-09-17
JP2612991B2 (ja) 1997-05-21
DE69312118T2 (de) 1998-02-19
US5258535A (en) 1993-11-02
EP0557762B1 (de) 1997-07-16

Similar Documents

Publication Publication Date Title
DE69217024D1 (de) Verfahren zur Reinigung einer Siliziummasse
DE69325252T2 (de) Verfahren zur Behandlung einer Oberfläche
DE69418367T2 (de) Verfahren zur Detektion einer Szenenänderung
DE69433582D1 (de) Verfahren zur Bildung einer Halbleiteranordnung
DE69728812D1 (de) Verfahren zur Erhöhung der Lötbarkeit einer Oberfläche
DE69413346D1 (de) Verfahren zur Beschichtung einer Abzweigeleitung
DE794839T1 (de) Verfahren zur beschichtung einer oberfläche
DE69414496T2 (de) Verfahren zur Beschichtung einer Abzweigeleitung
DE69634194D1 (de) Verfahren zur bearbeitung einer oberfläche
DE69219944D1 (de) Verfahren zur Erfassung der Bewegung einer Kamera
DE69430097D1 (de) Verfahren zum Kristallisieren einer Siliziumschicht
DE69226107T2 (de) Verfahren zur Herstellung einer gemusterten Metalloberfläche
DE69409066T2 (de) Verfahren zur Behandlung einer Oberfläche
DE69304509D1 (de) Verfahren zur Beschichtung einer Abzweigeleitung
DE69312118T2 (de) Verfahren zur Chlorierung einer Siliziumverbindung
DE59609045D1 (de) Verfahren zur Reinigung einer Rektifikationskolonne
DE69210233T2 (de) Verfahren zur reinigung einer photoprozessvorrichtung
DE69434156D1 (de) Verfahren zur Herstellung einer p-dihydroxyaromatischen Verbindung
DE69207818T2 (de) Verfahren zur Herstellung von einer Fluorverbindung
DE69223388T2 (de) Verfahren zur Aufarbeitung einer Kohlenwasserstoffbeschickung
DE69316274T2 (de) Verfahren zur Reinigung einer Hydroxylammoniumlösung
DE69307555D1 (de) Verfahren zur Verbesserung einer schonenden Oxidation
DE59206905D1 (de) Verfahren zur Strukturierung einer Polysiliziumschicht
DE69313497D1 (de) Verfahren zur Verbesserung einer paraffinischen Beschichtung
DE69810061T2 (de) Verfahren zur Reinigung einer Bromverbindung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee