DE69310893D1 - Methode und vorrichtung zur reflektionsfreien ellipsometrie an kleinen probenzellen - Google Patents

Methode und vorrichtung zur reflektionsfreien ellipsometrie an kleinen probenzellen

Info

Publication number
DE69310893D1
DE69310893D1 DE69310893T DE69310893T DE69310893D1 DE 69310893 D1 DE69310893 D1 DE 69310893D1 DE 69310893 T DE69310893 T DE 69310893T DE 69310893 T DE69310893 T DE 69310893T DE 69310893 D1 DE69310893 D1 DE 69310893D1
Authority
DE
Germany
Prior art keywords
ellipsometry
reflection
free
small sample
sample cells
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69310893T
Other languages
English (en)
Other versions
DE69310893T2 (de
Inventor
David Rhiger
Gerald Garwood
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Santa Barbara Research Center
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Santa Barbara Research Center filed Critical Santa Barbara Research Center
Publication of DE69310893D1 publication Critical patent/DE69310893D1/de
Application granted granted Critical
Publication of DE69310893T2 publication Critical patent/DE69310893T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0018Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for preventing ghost images
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69310893T 1992-11-12 1993-11-09 Methode und vorrichtung zur reflektionsfreien ellipsometrie an kleinen probenzellen Expired - Fee Related DE69310893T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/975,304 US5402237A (en) 1992-11-12 1992-11-12 Reflection-free ellipsometry measurement apparatus and method for small sample cells
PCT/US1993/010766 WO1994011722A1 (en) 1992-11-12 1993-11-09 Reflection-free ellipsometry measurement apparatus and method for small sample cells

Publications (2)

Publication Number Publication Date
DE69310893D1 true DE69310893D1 (de) 1997-06-26
DE69310893T2 DE69310893T2 (de) 1997-12-18

Family

ID=25522891

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69310893T Expired - Fee Related DE69310893T2 (de) 1992-11-12 1993-11-09 Methode und vorrichtung zur reflektionsfreien ellipsometrie an kleinen probenzellen

Country Status (6)

Country Link
US (1) US5402237A (de)
EP (1) EP0620914B1 (de)
JP (1) JP2703407B2 (de)
KR (1) KR100189596B1 (de)
DE (1) DE69310893T2 (de)
WO (1) WO1994011722A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000081371A (ja) * 1998-09-07 2000-03-21 Nec Corp 薄膜分子配向評価方法、評価装置及び記録媒体
FR2809491B1 (fr) * 2000-05-26 2008-07-04 Production Rech S Appliquees Procede et appareil de metrologie ellipsometrique pour echantillon contenu dans une chambre ou analogue
US7006221B2 (en) * 2001-07-13 2006-02-28 Rudolph Technologies, Inc. Metrology system with spectroscopic ellipsometer and photoacoustic measurements
WO2004070363A1 (en) * 2003-02-03 2004-08-19 Beaglehole Instruments Ltd Sample container
KR101105328B1 (ko) * 2009-11-23 2012-01-16 한국표준과학연구원 분자 흡착 및 해리 동특성 측정장치 및 측정방법
US9134223B2 (en) 2010-03-12 2015-09-15 Board Of Regents Of The University Of Texas System Modification of a flow cell to measure adsorption kinetics under stagnation point flow and development of a setup correction procedure for obtaining adsorption kinetics at the stagnation point
FR2987907B1 (fr) 2012-03-08 2014-02-21 Saint Gobain Valve optique et son procede de fabrication
CN106291788B (zh) * 2016-09-30 2018-10-23 东北大学 自由曲面棱镜及其形状的确定方法及其光学成像方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4565446A (en) * 1982-09-29 1986-01-21 The Research Foundation Of State University Of New York Scattering cells
US4582431A (en) * 1983-10-11 1986-04-15 Honeywell Inc. Optical monitor for direct thickness control of transparent films
JPS61284642A (ja) * 1985-06-12 1986-12-15 Mitsubishi Metal Corp 分光測定用試料冷却装置
US4927766A (en) * 1986-05-27 1990-05-22 The Boc Group, Inc. Gas constituent measurement and recording
US4795262A (en) * 1987-07-29 1989-01-03 The Regents Of The Univerity Of Michigan Liquid chromatography absorbance detector
JPH05889A (ja) * 1990-11-05 1993-01-08 Ulvac Japan Ltd 気相合成方法およびそれを実施するための装置
US5156461A (en) * 1991-05-17 1992-10-20 Texas Instruments Incorporated Multi-point pyrometry with real-time surface emissivity compensation

Also Published As

Publication number Publication date
JP2703407B2 (ja) 1998-01-26
KR100189596B1 (ko) 1999-06-01
EP0620914B1 (de) 1997-05-21
US5402237A (en) 1995-03-28
DE69310893T2 (de) 1997-12-18
KR940704000A (ko) 1994-12-12
WO1994011722A1 (en) 1994-05-26
JPH07502344A (ja) 1995-03-09
EP0620914A1 (de) 1994-10-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee