DE69231134T2 - Vorrichtung zur kontinuierlichen Behandlung von Aluminiumgegenständen - Google Patents
Vorrichtung zur kontinuierlichen Behandlung von AluminiumgegenständenInfo
- Publication number
- DE69231134T2 DE69231134T2 DE69231134T DE69231134T DE69231134T2 DE 69231134 T2 DE69231134 T2 DE 69231134T2 DE 69231134 T DE69231134 T DE 69231134T DE 69231134 T DE69231134 T DE 69231134T DE 69231134 T2 DE69231134 T2 DE 69231134T2
- Authority
- DE
- Germany
- Prior art keywords
- continuous treatment
- aluminum objects
- aluminum
- objects
- continuous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/005—Apparatus specially adapted for electrolytic conversion coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating Methods And Accessories (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3041929A JP2646042B2 (ja) | 1991-03-07 | 1991-03-07 | アルミニウム製品の連続電解処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69231134D1 DE69231134D1 (de) | 2000-07-13 |
DE69231134T2 true DE69231134T2 (de) | 2000-10-19 |
Family
ID=12621931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69231134T Expired - Fee Related DE69231134T2 (de) | 1991-03-07 | 1992-03-06 | Vorrichtung zur kontinuierlichen Behandlung von Aluminiumgegenständen |
Country Status (4)
Country | Link |
---|---|
US (1) | US5207881A (de) |
EP (1) | EP0502537B1 (de) |
JP (1) | JP2646042B2 (de) |
DE (1) | DE69231134T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3705457B2 (ja) * | 1996-07-02 | 2005-10-12 | 富士写真フイルム株式会社 | アルミニウム材の陽極酸化処理方法 |
JP4410714B2 (ja) | 2004-08-13 | 2010-02-03 | 富士フイルム株式会社 | 平版印刷版用支持体の製造方法 |
JP2006055952A (ja) * | 2004-08-20 | 2006-03-02 | Asahi Diamond Industrial Co Ltd | 超長尺工具の製造装置および製造方法 |
EP1712368B1 (de) | 2005-04-13 | 2008-05-14 | FUJIFILM Corporation | Verfahren zur Herstellung eines Flachdruckplattenträgers |
JP2009208140A (ja) | 2008-03-06 | 2009-09-17 | Fujifilm Corp | 平版印刷版用アルミニウム合金板の製造方法、ならびに該製造方法により得られる平版印刷版用アルミニウム合金板および平版印刷版用支持体 |
US20120091495A1 (en) | 2009-06-26 | 2012-04-19 | Fujifilm Corporation | Light reflecting substrate and process for manufacture thereof |
US8883401B2 (en) | 2009-09-24 | 2014-11-11 | Fujifilm Corporation | Lithographic printing original plate |
US20120256224A1 (en) | 2009-12-25 | 2012-10-11 | Fujifilm Corporation | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
JP2012033853A (ja) | 2010-04-28 | 2012-02-16 | Fujifilm Corp | 絶縁性光反射基板 |
KR20120022628A (ko) | 2010-08-16 | 2012-03-12 | 후지필름 가부시키가이샤 | Led 용 방열 반사판 |
JP2013033956A (ja) | 2011-07-04 | 2013-02-14 | Fujifilm Corp | 絶縁反射基板およびその製造方法 |
CN103085523B (zh) | 2011-10-28 | 2016-12-21 | 富士胶片株式会社 | 用于平版印刷版的载体的制备方法和制备装置 |
IT201700080501A1 (it) * | 2017-07-17 | 2019-01-17 | Tramec S R L | Riduttore. |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS526697B2 (de) * | 1971-08-11 | 1977-02-24 | ||
JPS5652116B2 (de) * | 1973-03-09 | 1981-12-10 | ||
US3989605A (en) * | 1973-03-09 | 1976-11-02 | Sumitomo Chemical Company, Limited | Method for continuous electrolytic coloring of aluminum articles |
US3865700A (en) * | 1973-05-18 | 1975-02-11 | Fromson H A | Process and apparatus for continuously anodizing aluminum |
JPS5824517B2 (ja) * | 1980-04-02 | 1983-05-21 | 勝川工業株式会社 | 直流電解による連続コイルアルマイトの片面専用処理装置 |
DE3270988D1 (en) * | 1981-07-20 | 1986-06-12 | Upjohn Co | Use of ibuprofen or flurbiprofen for the manufacture of a medicament for treating respiratory disorders |
US4865699A (en) * | 1988-06-24 | 1989-09-12 | Fromson H A | Process and apparatus for anodizing aluminum |
-
1991
- 1991-03-07 JP JP3041929A patent/JP2646042B2/ja not_active Expired - Fee Related
-
1992
- 1992-03-06 EP EP92103865A patent/EP0502537B1/de not_active Expired - Lifetime
- 1992-03-06 DE DE69231134T patent/DE69231134T2/de not_active Expired - Fee Related
- 1992-03-09 US US07/848,526 patent/US5207881A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69231134D1 (de) | 2000-07-13 |
EP0502537A1 (de) | 1992-09-09 |
EP0502537B1 (de) | 2000-06-07 |
US5207881A (en) | 1993-05-04 |
JP2646042B2 (ja) | 1997-08-25 |
JPH04280997A (ja) | 1992-10-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |
|
8339 | Ceased/non-payment of the annual fee |