DE69217559D1 - Uv-härtung von fluorinierten monomeren - Google Patents

Uv-härtung von fluorinierten monomeren

Info

Publication number
DE69217559D1
DE69217559D1 DE69217559T DE69217559T DE69217559D1 DE 69217559 D1 DE69217559 D1 DE 69217559D1 DE 69217559 T DE69217559 T DE 69217559T DE 69217559 T DE69217559 T DE 69217559T DE 69217559 D1 DE69217559 D1 DE 69217559D1
Authority
DE
Germany
Prior art keywords
curing
fluorinated monomers
fluorinated
monomers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69217559T
Other languages
English (en)
Other versions
DE69217559T2 (de
Inventor
Chengjiu Wu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
AlliedSignal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AlliedSignal Inc filed Critical AlliedSignal Inc
Application granted granted Critical
Publication of DE69217559D1 publication Critical patent/DE69217559D1/de
Publication of DE69217559T2 publication Critical patent/DE69217559T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • C08F20/24—Esters containing halogen containing perhaloalkyl radicals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69217559T 1991-12-11 1992-12-10 Uv-härtung von fluorinierten monomeren Expired - Fee Related DE69217559T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US80515691A 1991-12-11 1991-12-11
PCT/US1992/010733 WO1993012150A1 (en) 1991-12-11 1992-12-10 Uv curing of fluorinated monomers

Publications (2)

Publication Number Publication Date
DE69217559D1 true DE69217559D1 (de) 1997-03-27
DE69217559T2 DE69217559T2 (de) 1997-06-05

Family

ID=25190809

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69217559T Expired - Fee Related DE69217559T2 (de) 1991-12-11 1992-12-10 Uv-härtung von fluorinierten monomeren

Country Status (5)

Country Link
US (1) US5391587A (de)
EP (1) EP0616617B1 (de)
JP (1) JP3204976B2 (de)
DE (1) DE69217559T2 (de)
WO (1) WO1993012150A1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0789895A (ja) * 1993-02-09 1995-04-04 Asahi Glass Co Ltd 含フッ素ベンゾフェノン誘導体およびその用途
US6306563B1 (en) 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
US6555288B1 (en) 1999-06-21 2003-04-29 Corning Incorporated Optical devices made from radiation curable fluorinated compositions
ATE429468T1 (de) * 2000-11-20 2009-05-15 Ciba Holding Inc Fluorierte photoinitiatoren in dual-cure-harzen
CN1498229A (zh) * 2000-12-13 2004-05-19 �������⻯ѧƷ�ع����޹�˾ 表面活性光引发剂
US6778753B2 (en) * 2001-07-25 2004-08-17 E. I. Du Pont De Nemours And Company Halogenated optical polymer composition
US7030209B2 (en) 2002-02-04 2006-04-18 E. I. Du Pont De Nemours And Company Halogenated optical polymer composition
WO2003066693A1 (en) * 2002-02-04 2003-08-14 Ciba Specialty Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
EP1405849A1 (de) * 2002-10-04 2004-04-07 Corning Incorporated Halogenierte Styrolverbindungen und daraus erhältliche Polymere mit geringen Absorptionsverlusten
JP4501462B2 (ja) * 2003-03-12 2010-07-14 Ｔｄｋ株式会社 複合ハードコート層付き物体及び複合ハードコート層の形成方法
US7296592B2 (en) * 2003-09-16 2007-11-20 Eksigent Technologies, Llc Composite polymer microfluidic control device
US7820369B2 (en) * 2003-12-04 2010-10-26 International Business Machines Corporation Method for patterning a low activation energy photoresist
US7193023B2 (en) * 2003-12-04 2007-03-20 International Business Machines Corporation Low activation energy photoresists
JP5071612B2 (ja) * 2005-01-27 2012-11-14 信越化学工業株式会社 含フッ素硬化性組成物
US20070258862A1 (en) * 2006-05-02 2007-11-08 Applera Corporation Variable volume dispenser and method
CN106032396B (zh) * 2015-03-12 2019-12-03 北京英力科技发展有限公司 带有光引发剂基团的氟树脂及其制备方法与应用
US10488753B2 (en) 2015-09-08 2019-11-26 Canon Kabushiki Kaisha Substrate pretreatment and etch uniformity in nanoimprint lithography
US20170066208A1 (en) 2015-09-08 2017-03-09 Canon Kabushiki Kaisha Substrate pretreatment for reducing fill time in nanoimprint lithography
US10620539B2 (en) 2016-03-31 2020-04-14 Canon Kabushiki Kaisha Curing substrate pretreatment compositions in nanoimprint lithography
US10134588B2 (en) 2016-03-31 2018-11-20 Canon Kabushiki Kaisha Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
US10095106B2 (en) 2016-03-31 2018-10-09 Canon Kabushiki Kaisha Removing substrate pretreatment compositions in nanoimprint lithography
US10509313B2 (en) * 2016-06-28 2019-12-17 Canon Kabushiki Kaisha Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography
US10317793B2 (en) 2017-03-03 2019-06-11 Canon Kabushiki Kaisha Substrate pretreatment compositions for nanoimprint lithography

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2642416A (en) * 1950-05-26 1953-06-16 Minnesota Mining & Mfg Fluorinated acrylates and polymers
US3280147A (en) * 1962-07-05 1966-10-18 Dow Chemical Co Process for preparing ketones
EP0040923B1 (de) * 1980-05-20 1985-05-02 Minnesota Mining And Manufacturing Company Stoffgemische zur Herstellung abhäsiver Schichten; Poly (fluorooxyalkylene) urethane Akrylate
US4985473A (en) * 1980-05-20 1991-01-15 Minnesota Mining And Manufacturing Company Compositions for providing abherent coatings
AU566310B2 (en) * 1983-06-27 1987-10-15 Stauffer Chemical Company Photopolymerizable composition

Also Published As

Publication number Publication date
DE69217559T2 (de) 1997-06-05
US5391587A (en) 1995-02-21
EP0616617A1 (de) 1994-09-28
WO1993012150A1 (en) 1993-06-24
EP0616617B1 (de) 1997-02-19
JP3204976B2 (ja) 2001-09-04
JPH07502066A (ja) 1995-03-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee