DE69206629D1 - Laminierung einer photopolymerisierbaren lötstopmasken-schicht auf ein löcher enthaltendes substrat unter verwendung einer zwischenschicht aus einer photopolymerisierbaren flüssigkeit. - Google Patents
Laminierung einer photopolymerisierbaren lötstopmasken-schicht auf ein löcher enthaltendes substrat unter verwendung einer zwischenschicht aus einer photopolymerisierbaren flüssigkeit.Info
- Publication number
- DE69206629D1 DE69206629D1 DE69206629T DE69206629T DE69206629D1 DE 69206629 D1 DE69206629 D1 DE 69206629D1 DE 69206629 T DE69206629 T DE 69206629T DE 69206629 T DE69206629 T DE 69206629T DE 69206629 D1 DE69206629 D1 DE 69206629D1
- Authority
- DE
- Germany
- Prior art keywords
- photopolymerizable
- laminating
- preformed
- containing substrate
- spectral region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0094—Filling or covering plated through-holes or blind plated vias, e.g. for masking or for mechanical reinforcement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/281—Applying non-metallic protective coatings by means of a preformed insulating foil
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0505—Double exposure of the same photosensitive layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0577—Double layer of resist having the same pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/06—Lamination
- H05K2203/068—Features of the lamination press or of the lamination process, e.g. using special separator sheets
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0759—Forming a polymer layer by liquid coating, e.g. a non-metallic protective coating or an organic bonding layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
- H05K2203/1377—Protective layers
- H05K2203/1394—Covering open PTHs, e.g. by dry film resist or by metal disc
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3452—Solder masks
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/811,358 US5240817A (en) | 1991-12-20 | 1991-12-20 | Lamination of a photopolymerizable solder mask layer to a substate containing holes using an intermediate photopolymerizable liquid layer |
PCT/US1992/010555 WO1993013638A1 (en) | 1991-12-20 | 1992-12-14 | Lamination of a photopolymerizable solder mask layer to a substrate containing holes using an intermediate photopolymerizable liquid layer |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69206629D1 true DE69206629D1 (de) | 1996-01-18 |
DE69206629T2 DE69206629T2 (de) | 1996-08-22 |
Family
ID=25206338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69206629T Expired - Lifetime DE69206629T2 (de) | 1991-12-20 | 1992-12-14 | Laminierung einer photopolymerisierbaren lötstopmasken-schicht auf ein löcher enthaltendes substrat unter verwendung einer zwischenschicht aus einer photopolymerisierbaren flüssigkeit. |
Country Status (5)
Country | Link |
---|---|
US (1) | US5240817A (de) |
EP (1) | EP0606402B1 (de) |
AT (1) | ATE131340T1 (de) |
DE (1) | DE69206629T2 (de) |
WO (1) | WO1993013638A1 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW267219B (de) * | 1991-12-27 | 1996-01-01 | Sumitomo Chemical Co | |
DE4310814C2 (de) * | 1993-04-02 | 1997-11-27 | Du Pont Deutschland | Verfahren zur Beschichtung von Leiterplatten |
FR2705012B1 (fr) * | 1993-04-02 | 1995-10-20 | Du Pont | Procédé pour le revêtement des cartes à circuit imprimé. |
US5863597A (en) * | 1996-01-23 | 1999-01-26 | Sundstrand Corporation | Polyurethane conformal coating process for a printed wiring board |
US5726348A (en) * | 1996-06-25 | 1998-03-10 | United Technologies Corporation | Process for precisely closing off cooling holes of an airfoil |
US6015520A (en) * | 1997-05-15 | 2000-01-18 | International Business Machines Corporation | Method for filling holes in printed wiring boards |
US6146002A (en) * | 1997-12-30 | 2000-11-14 | Pearl Paints North America | Urethane-free composition useful as an ultraviolet-(UV)-curable basecoat and reflector using the same |
US6037096A (en) * | 1998-05-26 | 2000-03-14 | International Business Machines Corporation | Film composition and method for a planar surface atop a plated through hole |
TW483940B (en) * | 1998-06-24 | 2002-04-21 | Ciba Sc Holding Ag | Method for coating printed circuit boards or similar substrates |
WO2005118212A1 (en) * | 2004-06-01 | 2005-12-15 | Original Solutions Inc. | Solder mask enhancement and method of inspecting printed circuit board assemblies |
CN1842741B (zh) * | 2004-12-03 | 2010-11-24 | 东京应化工业株式会社 | 化学放大型光致抗蚀剂组合物、光致抗蚀剂层层叠体、光致抗蚀剂组合物的制造方法、光致抗蚀图案的制造方法以及连接端子的制造方法 |
US8476000B2 (en) | 2010-06-04 | 2013-07-02 | Ryan Vest | Method of producing a relief image from a liquid photopolymer resin |
CN110719702B (zh) * | 2019-10-18 | 2022-01-25 | 中山新诺科技股份有限公司 | 一种双波长防焊设备 |
JP7414680B2 (ja) * | 2020-09-17 | 2024-01-16 | キオクシア株式会社 | インプリント方法、インプリント装置、及び膜形成装置 |
CN112351587A (zh) * | 2020-10-20 | 2021-02-09 | 江西强达电路科技有限公司 | 一种免打磨的树脂塞孔pcb板制作工艺 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3629036A (en) * | 1969-02-14 | 1971-12-21 | Shipley Co | The method coating of photoresist on circuit boards |
US4069076A (en) * | 1976-11-29 | 1978-01-17 | E. I. Du Pont De Nemours And Company | Liquid lamination process |
US4293635A (en) * | 1980-05-27 | 1981-10-06 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition with polymeric binder |
EP0141868A1 (de) * | 1982-04-01 | 1985-05-22 | Inc. M & T Chemicals | Photomaskensatz mit hohem Auflösungsvermögen für die Herstellung von Photopolymerbildern |
USRE32430E (en) * | 1982-04-01 | 1987-06-02 | Printed wiring board | |
US4631111A (en) * | 1984-11-27 | 1986-12-23 | E. I. Du Pont De Nemours And Company | Dichromic process for preparation of conductive circuit |
US4680249A (en) * | 1986-05-28 | 1987-07-14 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition containing carboxy benzotriazole |
US4698294A (en) * | 1986-09-12 | 1987-10-06 | E. I. Du Pont De Nemours And Company | Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer |
EP0259853A3 (de) * | 1986-09-12 | 1989-11-08 | E.I. Du Pont De Nemours And Company | Laminierung eines photopolymerisierbaren Films auf einem Träger mittels einer photoempfindlichen flüssigen Zwischenschicht |
-
1991
- 1991-12-20 US US07/811,358 patent/US5240817A/en not_active Expired - Lifetime
-
1992
- 1992-12-14 EP EP93900934A patent/EP0606402B1/de not_active Expired - Lifetime
- 1992-12-14 AT AT93900934T patent/ATE131340T1/de not_active IP Right Cessation
- 1992-12-14 WO PCT/US1992/010555 patent/WO1993013638A1/en active IP Right Grant
- 1992-12-14 DE DE69206629T patent/DE69206629T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5240817A (en) | 1993-08-31 |
WO1993013638A1 (en) | 1993-07-08 |
DE69206629T2 (de) | 1996-08-22 |
ATE131340T1 (de) | 1995-12-15 |
EP0606402A1 (de) | 1994-07-20 |
EP0606402B1 (de) | 1995-12-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
R071 | Expiry of right |
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