DE69204629D1 - Herstellungsverfahren einer Feldemissionsvorrichtung mit integraler elektrostatischer Linsenanordnung. - Google Patents

Herstellungsverfahren einer Feldemissionsvorrichtung mit integraler elektrostatischer Linsenanordnung.

Info

Publication number
DE69204629D1
DE69204629D1 DE69204629T DE69204629T DE69204629D1 DE 69204629 D1 DE69204629 D1 DE 69204629D1 DE 69204629 T DE69204629 T DE 69204629T DE 69204629 T DE69204629 T DE 69204629T DE 69204629 D1 DE69204629 D1 DE 69204629D1
Authority
DE
Germany
Prior art keywords
manufacturing
field emission
emission device
lens arrangement
electrostatic lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69204629T
Other languages
English (en)
Other versions
DE69204629T2 (de
Inventor
Robert C Kane
Norman W Parker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of DE69204629D1 publication Critical patent/DE69204629D1/de
Application granted granted Critical
Publication of DE69204629T2 publication Critical patent/DE69204629T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
    • H01J3/022—Electron guns using a field emission, photo emission, or secondary emission electron source with microengineered cathode, e.g. Spindt-type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Cold Cathode And The Manufacture (AREA)
DE69204629T 1991-11-29 1992-11-25 Herstellungsverfahren einer Feldemissionsvorrichtung mit integraler elektrostatischer Linsenanordnung. Expired - Fee Related DE69204629T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US80081091A 1991-11-29 1991-11-29

Publications (2)

Publication Number Publication Date
DE69204629D1 true DE69204629D1 (de) 1995-10-12
DE69204629T2 DE69204629T2 (de) 1996-04-18

Family

ID=25179426

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69204629T Expired - Fee Related DE69204629T2 (de) 1991-11-29 1992-11-25 Herstellungsverfahren einer Feldemissionsvorrichtung mit integraler elektrostatischer Linsenanordnung.

Country Status (4)

Country Link
US (1) US5430347A (de)
EP (1) EP0545621B1 (de)
JP (1) JPH05242794A (de)
DE (1) DE69204629T2 (de)

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US5686791A (en) 1992-03-16 1997-11-11 Microelectronics And Computer Technology Corp. Amorphic diamond film flat field emission cathode
US6127773A (en) 1992-03-16 2000-10-03 Si Diamond Technology, Inc. Amorphic diamond film flat field emission cathode
US5675216A (en) 1992-03-16 1997-10-07 Microelectronics And Computer Technololgy Corp. Amorphic diamond film flat field emission cathode
JP2653008B2 (ja) * 1993-01-25 1997-09-10 日本電気株式会社 冷陰極素子およびその製造方法
US7025892B1 (en) 1993-09-08 2006-04-11 Candescent Technologies Corporation Method for creating gated filament structures for field emission displays
US5564959A (en) 1993-09-08 1996-10-15 Silicon Video Corporation Use of charged-particle tracks in fabricating gated electron-emitting devices
KR0148615B1 (ko) * 1993-10-20 1998-10-15 가네꼬 히사시 음극선관용 냉음극 전자총구체
GB2285168B (en) * 1993-12-22 1997-07-16 Marconi Gec Ltd Electron field emission devices
US5731228A (en) * 1994-03-11 1998-03-24 Fujitsu Limited Method for making micro electron beam source
JPH08315721A (ja) * 1995-05-19 1996-11-29 Nec Kansai Ltd 電界放出冷陰極
JP2910837B2 (ja) * 1996-04-16 1999-06-23 日本電気株式会社 電界放出型電子銃
JP2907113B2 (ja) * 1996-05-08 1999-06-21 日本電気株式会社 電子ビーム装置
JPH09306332A (ja) * 1996-05-09 1997-11-28 Nec Corp 電界放出型電子銃
JP3171121B2 (ja) * 1996-08-29 2001-05-28 双葉電子工業株式会社 電界放出型表示装置
JP3745844B2 (ja) * 1996-10-14 2006-02-15 浜松ホトニクス株式会社 電子管
FR2756417A1 (fr) * 1996-11-22 1998-05-29 Pixtech Sa Ecran plat de visualisation a grilles focalisatrices
FR2757999B1 (fr) * 1996-12-30 1999-01-29 Commissariat Energie Atomique Procede d'auto-alignement utilisable en micro-electronique et application a la realisation d'une grille de focalisation pour ecran plat a micropointes
JPH10289650A (ja) * 1997-04-11 1998-10-27 Sony Corp 電界電子放出素子及びその製造方法並びに電界電子放出型ディスプレイ装置
GB2339961B (en) * 1998-07-23 2001-08-29 Sony Corp Processes for the production of cold cathode field emission devices and cold cathode field emission displays
US6297587B1 (en) 1998-07-23 2001-10-02 Sony Corporation Color cathode field emission device, cold cathode field emission display, and process for the production thereof
GB2349271B (en) * 1998-07-23 2001-08-29 Sony Corp Cold cathode field emission device and cold cathode field emission display
US6373176B1 (en) 1998-08-21 2002-04-16 Pixtech, Inc. Display device with improved grid structure
US6204597B1 (en) 1999-02-05 2001-03-20 Motorola, Inc. Field emission device having dielectric focusing layers
DE19907164C2 (de) * 1999-02-19 2002-10-24 Micronas Gmbh Meßeinrichtung sowie Verfahren zu deren Herstellung
US6255768B1 (en) 1999-07-19 2001-07-03 Extreme Devices, Inc. Compact field emission electron gun and focus lens
US6429596B1 (en) 1999-12-31 2002-08-06 Extreme Devices, Inc. Segmented gate drive for dynamic beam shape correction in field emission cathodes
US6815875B2 (en) * 2001-02-27 2004-11-09 Hewlett-Packard Development Company, L.P. Electron source having planar emission region and focusing structure
US6683414B2 (en) * 2001-10-25 2004-01-27 Northrop Grumman Corporation Ion-shielded focusing method for high-density electron beams generated by planar cold cathode electron emitters
US7446601B2 (en) * 2003-06-23 2008-11-04 Astronix Research, Llc Electron beam RF amplifier and emitter
JP2007518223A (ja) * 2003-12-30 2007-07-05 コミツサリア タ レネルジー アトミーク 発散制御機能を有したハイブリッド型マルチビーム電子放出デバイス
EP1760762B1 (de) * 2005-09-06 2012-02-01 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Vorrichtung und Verfahren zur Auswahl einer Emissionsfläche einer Emissionsstruktur
KR20070083112A (ko) * 2006-02-20 2007-08-23 삼성에스디아이 주식회사 전자 방출 디바이스와 이를 이용한 전자 방출 표시디바이스
US20110057164A1 (en) * 2007-06-18 2011-03-10 California Institute Of Technology Carbon nanotube field emission device with overhanging gate
JP5062761B2 (ja) * 2008-08-28 2012-10-31 独立行政法人産業技術総合研究所 集束電極一体型電界放出素子及びその作製方法
WO2010037085A1 (en) 2008-09-29 2010-04-01 The Board Of Trustees Of The University Of Illinois Dna sequencing and amplification systems using nanoscale field effect sensor arrays
JP2012195096A (ja) * 2011-03-15 2012-10-11 Canon Inc 荷電粒子線レンズおよびそれを用いた露光装置
US10658144B2 (en) 2017-07-22 2020-05-19 Modern Electron, LLC Shadowed grid structures for electrodes in vacuum electronics
US10811212B2 (en) 2017-07-22 2020-10-20 Modern Electron, LLC Suspended grid structures for electrodes in vacuum electronics
US10424455B2 (en) 2017-07-22 2019-09-24 Modern Electron, LLC Suspended grid structures for electrodes in vacuum electronics
CN111696847A (zh) * 2020-06-29 2020-09-22 北京卫星环境工程研究所 适用于星载大气原位探测的电子源

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4857799A (en) * 1986-07-30 1989-08-15 Sri International Matrix-addressed flat panel display
GB8720792D0 (en) * 1987-09-04 1987-10-14 Gen Electric Co Plc Vacuum devices
FR2623013A1 (fr) * 1987-11-06 1989-05-12 Commissariat Energie Atomique Source d'electrons a cathodes emissives a micropointes et dispositif de visualisation par cathodoluminescence excitee par emission de champ,utilisant cette source
FR2633763B1 (fr) * 1988-06-29 1991-02-15 Commissariat Energie Atomique Ecran fluorescent trichrome a micropointes
US5012153A (en) * 1989-12-22 1991-04-30 Atkinson Gary M Split collector vacuum field effect transistor
FR2669465B1 (fr) * 1990-11-16 1996-07-12 Thomson Rech Source d'electrons et procede de realisation.

Also Published As

Publication number Publication date
JPH05242794A (ja) 1993-09-21
US5430347A (en) 1995-07-04
EP0545621A1 (de) 1993-06-09
EP0545621B1 (de) 1995-09-06
DE69204629T2 (de) 1996-04-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee