DE69128143D1 - Photoempfindliche harzzusammensetzung und photoempfindliche elementstruktur - Google Patents

Photoempfindliche harzzusammensetzung und photoempfindliche elementstruktur

Info

Publication number
DE69128143D1
DE69128143D1 DE69128143T DE69128143T DE69128143D1 DE 69128143 D1 DE69128143 D1 DE 69128143D1 DE 69128143 T DE69128143 T DE 69128143T DE 69128143 T DE69128143 T DE 69128143T DE 69128143 D1 DE69128143 D1 DE 69128143D1
Authority
DE
Germany
Prior art keywords
photo
sensitive
resin composition
element structure
sensitive element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69128143T
Other languages
English (en)
Other versions
DE69128143T2 (de
Inventor
Katsuhiro Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Application granted granted Critical
Publication of DE69128143D1 publication Critical patent/DE69128143D1/de
Publication of DE69128143T2 publication Critical patent/DE69128143T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE69128143T 1990-11-19 1991-11-19 Photoempfindliche harzzusammensetzung und photoempfindliche elementstruktur Expired - Lifetime DE69128143T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2311581A JP2977265B2 (ja) 1990-11-19 1990-11-19 感光性エラストマー構成体
PCT/JP1991/001588 WO1992009011A1 (en) 1990-11-19 1991-11-19 Photosensitive resin composition and photosensitive element structure

Publications (2)

Publication Number Publication Date
DE69128143D1 true DE69128143D1 (de) 1997-12-11
DE69128143T2 DE69128143T2 (de) 1998-06-18

Family

ID=18018964

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69128143T Expired - Lifetime DE69128143T2 (de) 1990-11-19 1991-11-19 Photoempfindliche harzzusammensetzung und photoempfindliche elementstruktur

Country Status (6)

Country Link
US (1) US6030749A (de)
EP (1) EP0511403B1 (de)
JP (1) JP2977265B2 (de)
AU (1) AU653373B2 (de)
DE (1) DE69128143T2 (de)
WO (1) WO1992009011A1 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1107063B1 (de) * 1999-12-07 2010-03-10 E.I. Du Pont De Nemours And Company Photoentfärbbare Verbindungen enthaltende, photopolymerisierbare Zusammensetzungen und ihre Verwendung in flexographischen Druckplatten
US6479217B1 (en) * 2001-02-22 2002-11-12 Spectra Group Limited, Inc. Method for producing selectively colorable printing plates
US20030087178A1 (en) * 2001-04-20 2003-05-08 Adrian Lungu Photopolymerizable element for use as a flexographic printing plate and a process for preparing the plate from the element
JP4617031B2 (ja) * 2001-08-24 2011-01-19 大日本印刷株式会社 光分解性染料を用いたｅｌ素子
BR0309947B1 (pt) * 2002-05-16 2013-11-26 Processo e dispositivo para produção de camadas de polímero sobre um suporte transparente, sua utilização e processo para produção de um sensor
US7055429B2 (en) 2004-04-23 2006-06-06 Timothy Gotsick Edge cure prevention process
US7390617B2 (en) 2004-06-30 2008-06-24 Eastman Kodak Company Selective light absorption shifting layer and process
US8053168B2 (en) * 2006-12-19 2011-11-08 Palo Alto Research Center Incorporated Printing plate and system using heat-decomposable polymers
EP2116527A4 (de) 2007-01-23 2011-09-14 Fujifilm Corp Oximverbindung, photosensible zusammensetzung, farbfilter, verfahren zur herstellung des farbfilters und flüssigkristallanzeigeelement
WO2008138724A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
CN101679394B (zh) 2007-05-11 2013-10-16 巴斯夫欧洲公司 肟酯光引发剂
JP5588621B2 (ja) * 2009-04-13 2014-09-10 株式会社棚澤八光社 表面に凸模様を有するシート及びその凸模様を形成する方法
US8771925B2 (en) 2009-08-25 2014-07-08 Eastman Kodak Company Flexographic processing solution and method of use
US8632961B2 (en) 2010-01-28 2014-01-21 Eastman Kodak Company Flexographic processing solution and use
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
CN103153952B (zh) 2010-10-05 2016-07-13 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途
KR102006041B1 (ko) 2011-12-07 2019-07-31 바스프 에스이 옥심 에스테르 광개시제
EP3354641B1 (de) 2012-05-09 2019-07-17 Basf Se Oximester-fotoinitiatoren
WO2015004565A1 (en) 2013-07-08 2015-01-15 Basf Se Oxime ester photoinitiators
EP3044208B1 (de) 2013-09-10 2021-12-22 Basf Se Oximester-photoinitiatoren
US10025183B2 (en) * 2014-01-22 2018-07-17 Macdermid Graphics Solutions, Llc Photosensitive resin composition
EP3542221B1 (de) 2016-11-16 2021-03-17 Miraclon Corporation Flexografische entwickler und verfahren zur verwendung
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
CN115210219A (zh) 2020-03-04 2022-10-18 巴斯夫欧洲公司 肟酯光引发剂

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3954468A (en) * 1974-08-27 1976-05-04 Horizons Incorporated Radiation process for producing colored photopolymer systems
SU681405A1 (ru) * 1977-03-11 1979-08-25 Предприятие П/Я А-1120 Светофильтр органический зеленый
JPS542720A (en) * 1977-06-08 1979-01-10 Konishiroku Photo Ind Co Ltd Forming method of photopolymerized image
US4460675A (en) * 1982-01-21 1984-07-17 E. I. Du Pont De Nemours And Company Process for preparing an overcoated photopolymer printing plate
US4427759A (en) * 1982-01-21 1984-01-24 E. I. Du Pont De Nemours And Company Process for preparing an overcoated photopolymer printing plate
DE3365773D1 (en) * 1982-02-26 1986-10-09 Ciba Geigy Ag Coloured photo-hardenable composition
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS59204837A (ja) * 1983-05-09 1984-11-20 Asahi Chem Ind Co Ltd 光重合性積層体及びそれを用いたレジスト像形成方法
DE3420425A1 (de) * 1984-06-01 1985-12-05 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch, das als photoinitiator ein 1,3,10-triazaanthracen-4-on- enthaelt
JPS61188534A (ja) * 1985-02-18 1986-08-22 Sekisui Chem Co Ltd 感光性樹脂組成物
JPS62229127A (ja) * 1985-12-09 1987-10-07 Nippon Paint Co Ltd 感光性樹脂版材
DE3609320A1 (de) * 1986-03-20 1987-09-24 Basf Ag Fotochromes system, damit hergestellte schichten und deren verwendung
JPS62287234A (ja) * 1986-06-06 1987-12-14 Nippon Paint Co Ltd 感光性樹脂版材
GB8700599D0 (en) * 1987-01-12 1987-02-18 Vickers Plc Printing plate precursors
JPS63174037A (ja) * 1987-01-14 1988-07-18 Mitsubishi Kasei Corp 感光性組成物
JPS63180942A (ja) * 1987-01-22 1988-07-26 Canon Inc 記録媒体
DE3717037A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3736980A1 (de) * 1987-10-31 1989-05-18 Basf Ag Mehrschichtiges, flaechenfoermiges, lichtempfindliches aufzeichnungsmaterial
JP2753241B2 (ja) * 1988-01-20 1998-05-18 ディーエスエム ナムローゼ フェンノートシャップ 液状光硬化性樹脂組成物
CA1314752C (en) * 1988-04-13 1993-03-23 Hisao Satoh Photosensitive resin plate for flexography
EP0492830B1 (de) * 1990-12-28 1996-07-17 Dow Corning Corporation Verfahren zur Sichtbarmachung der Härtung einer UV-härtbaren Zusammensetzung durch ein Farbänderung

Also Published As

Publication number Publication date
EP0511403A4 (en) 1993-04-21
DE69128143T2 (de) 1998-06-18
JPH04182648A (ja) 1992-06-30
US6030749A (en) 2000-02-29
AU653373B2 (en) 1994-09-29
JP2977265B2 (ja) 1999-11-15
AU8923991A (en) 1992-06-11
EP0511403B1 (de) 1997-11-05
EP0511403A1 (de) 1992-11-04
WO1992009011A1 (en) 1992-05-29

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