DE69123658T2 - Harzzusammensetzung zur Bildherstellung - Google Patents

Harzzusammensetzung zur Bildherstellung

Info

Publication number
DE69123658T2
DE69123658T2 DE69123658T DE69123658T DE69123658T2 DE 69123658 T2 DE69123658 T2 DE 69123658T2 DE 69123658 T DE69123658 T DE 69123658T DE 69123658 T DE69123658 T DE 69123658T DE 69123658 T2 DE69123658 T2 DE 69123658T2
Authority
DE
Germany
Prior art keywords
resin composition
image formation
meth
solvent yellow
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69123658T
Other languages
German (de)
English (en)
Other versions
DE69123658D1 (de
Inventor
Yasuyuki Fujimoto
Ken-Ichi Inukai
Takayuki Iseki
Seiya Koyanagi
Kenji Kushi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Publication of DE69123658D1 publication Critical patent/DE69123658D1/de
Application granted granted Critical
Publication of DE69123658T2 publication Critical patent/DE69123658T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0266—Marks, test patterns or identification means
    • H05K1/0269—Marks, test patterns or identification means for visual or optical inspection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/16—Inspection; Monitoring; Aligning
    • H05K2203/161—Using chemical substances, e.g. colored or fluorescent, for facilitating optical or visual inspection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452—Solder masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69123658T 1990-07-25 1991-07-22 Harzzusammensetzung zur Bildherstellung Expired - Fee Related DE69123658T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2196508A JPH0481473A (ja) 1990-07-25 1990-07-25 画像形成用樹脂組成物および蛍光検出方式自動外観検査方法

Publications (2)

Publication Number Publication Date
DE69123658D1 DE69123658D1 (de) 1997-01-30
DE69123658T2 true DE69123658T2 (de) 1997-07-03

Family

ID=16358922

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69123658T Expired - Fee Related DE69123658T2 (de) 1990-07-25 1991-07-22 Harzzusammensetzung zur Bildherstellung

Country Status (6)

Country Link
EP (1) EP0469957B1 (https=)
JP (1) JPH0481473A (https=)
KR (1) KR0177165B1 (https=)
CA (1) CA2047621C (https=)
DE (1) DE69123658T2 (https=)
TW (1) TW211024B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011018725A1 (de) * 2011-04-20 2012-10-25 Carl Zeiss Jena Gmbh Optische Anordnung zur Erfassung der Lumineszenz von Proben

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6190759B1 (en) 1998-02-18 2001-02-20 International Business Machines Corporation High optical contrast resin composition and electronic package utilizing same
FR2812300B1 (fr) * 2000-07-28 2003-01-10 Cypher Science Encre liquide securisee revelable optiquement et procede de marquage de produits par une telle encre
AT10237U1 (de) * 2007-10-12 2008-11-15 Austria Tech & System Tech Verfahren und vorrichtung zum positionieren und ausrichten eines gegenstand relativ zu bzw. mit einem untergrund sowie verwendung hiefür

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2004262C3 (de) * 1970-01-30 1975-01-09 Philips Patentverwaltung Gmbh, 2000 Hamburg Projektionsschirm für granulationsfreie Laserstrahlprojektion

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011018725A1 (de) * 2011-04-20 2012-10-25 Carl Zeiss Jena Gmbh Optische Anordnung zur Erfassung der Lumineszenz von Proben

Also Published As

Publication number Publication date
KR0177165B1 (ko) 1999-04-01
JPH0481473A (ja) 1992-03-16
CA2047621C (en) 1996-07-02
CA2047621A1 (en) 1992-01-26
TW211024B (https=) 1993-08-11
EP0469957A1 (en) 1992-02-05
EP0469957B1 (en) 1996-12-18
KR920003101A (ko) 1992-02-29
DE69123658D1 (de) 1997-01-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee