KR920003101A - 화상형성 수지 조성물 - Google Patents

화상형성 수지 조성물 Download PDF

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Publication number
KR920003101A
KR920003101A KR1019910012848A KR910012848A KR920003101A KR 920003101 A KR920003101 A KR 920003101A KR 1019910012848 A KR1019910012848 A KR 1019910012848A KR 910012848 A KR910012848 A KR 910012848A KR 920003101 A KR920003101 A KR 920003101A
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KR
South Korea
Prior art keywords
resin composition
image forming
fluorescence
forming resin
weight
Prior art date
Application number
KR1019910012848A
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English (en)
Other versions
KR0177165B1 (ko
Inventor
겐지 쿠시
겐이치 이뉴카이
다까유기 이세키
시이야 고야나끼
야스유기 후지모도
Original Assignee
나가이 야따로
미쓰비시 레이욘 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 나가이 야따로, 미쓰비시 레이욘 가부시끼가이샤 filed Critical 나가이 야따로
Publication of KR920003101A publication Critical patent/KR920003101A/ko
Application granted granted Critical
Publication of KR0177165B1 publication Critical patent/KR0177165B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0266—Marks, test patterns or identification means
    • H05K1/0269—Marks, test patterns or identification means for visual or optical inspection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/16—Inspection; Monitoring; Aligning
    • H05K2203/161—Using chemical substances, e.g. colored or fluorescent, for facilitating optical or visual inspection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452—Solder masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

내용 없음

Description

화상형성 수지 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (12)

  1. 400-650㎜ 범위의 파장을 지닌 빛에 노출되었을때 형광을 방출하는 화합물이 함유되어 있고, 형광 현미경에 의한 건조 또는 경화상태의 사진 형성시 요구되는 노출시간이 8초 미만으로 되는 형광의 강도를 기진 화상형성수지 조성물.
  2. 1항에 있어서 노출시간이 6초 미만인 화상 형성수지 조성물.
  3. 1항에 있어서 형광방출 화합물로서 C.I.Disperse Yellow 82가 0.0005무게% 이상 함유되어 있는 화상 형성수지 조성물.
  4. 1항에 있어서 형광방출 화합물로서 C.I.Solvent Yellow 104가 0.003무게% 이상 함유되어 있는 화상 형성수지 조성물.
  5. 1항에 있어서 형광방출 화합물로서 C.I.Solvent Yellow 116가 0.001무게% 이상 함유되어 있는 화상 형성수지 조성물.
  6. 1항에 있어서 형광방출 화합물로서 C.I.Solvent Yellow 44가 0.001무게% 이상 함유되어 있는 화상 형성수지 조성물.
  7. 400-650㎜ 범위의 파장을 지닌 빛에 노출되었을때 형광을 방출하는 화합물이 함유되어 있고, 형광 현미경에 의한 건조 또는 경화상태의 사진 형성시 요구되는 노출시간이 8초 미만으로 되는 형광의 강도를 기진 화상형성수지 조성물과 포멧된 화상을 이용한 형광 검출수단을 이용하는 자동 광학검사법.
  8. 7항에 있어서 노출시간이 6초 미만인 형광검출 수단에 의한 자동광학 검사법.
  9. 7항에서 수지 조성물에 형광방출 화합물로서 C.I.Solvent Yellow 82가 0.0005무게% 이상 함유되어 있는 화상 형성수지 조성물.
  10. 7항에서 수지 조성물에 형광방출 화합물로서 C.I.Solvent Yellow 104가 0.003무게% 이상 함유되어 있는 화상 형성수지 조성물.
  11. 7항에서 수지 조성물에 형광방출 화합물로서 C.I.Solvent Yellow 116가 0.001무게% 이상 함유되어 있는 화상 형성수지 조성물.
  12. 7항에서 수지 조성물에 형광방출 화합물로서 C.I.Solvent Yellow 44가 0.001무게% 이상 함유되어 있는 화상 형성수지 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910012848A 1990-07-25 1991-07-25 화상 형성 수지 조성물 KR0177165B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2196508A JPH0481473A (ja) 1990-07-25 1990-07-25 画像形成用樹脂組成物および蛍光検出方式自動外観検査方法
JP02-196508 1990-07-25

Publications (2)

Publication Number Publication Date
KR920003101A true KR920003101A (ko) 1992-02-29
KR0177165B1 KR0177165B1 (ko) 1999-04-01

Family

ID=16358922

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910012848A KR0177165B1 (ko) 1990-07-25 1991-07-25 화상 형성 수지 조성물

Country Status (6)

Country Link
EP (1) EP0469957B1 (ko)
JP (1) JPH0481473A (ko)
KR (1) KR0177165B1 (ko)
CA (1) CA2047621C (ko)
DE (1) DE69123658T2 (ko)
TW (1) TW211024B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6190759B1 (en) 1998-02-18 2001-02-20 International Business Machines Corporation High optical contrast resin composition and electronic package utilizing same
FR2812300B1 (fr) * 2000-07-28 2003-01-10 Cypher Science Encre liquide securisee revelable optiquement et procede de marquage de produits par une telle encre
AT10237U1 (de) * 2007-10-12 2008-11-15 Austria Tech & System Tech Verfahren und vorrichtung zum positionieren und ausrichten eines gegenstand relativ zu bzw. mit einem untergrund sowie verwendung hiefür
DE102011018725A1 (de) * 2011-04-20 2012-10-25 Carl Zeiss Jena Gmbh Optische Anordnung zur Erfassung der Lumineszenz von Proben

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2004262C3 (de) * 1970-01-30 1975-01-09 Philips Patentverwaltung Gmbh, 2000 Hamburg Projektionsschirm für granulationsfreie Laserstrahlprojektion

Also Published As

Publication number Publication date
KR0177165B1 (ko) 1999-04-01
JPH0481473A (ja) 1992-03-16
CA2047621A1 (en) 1992-01-26
EP0469957B1 (en) 1996-12-18
EP0469957A1 (en) 1992-02-05
DE69123658D1 (de) 1997-01-30
DE69123658T2 (de) 1997-07-03
CA2047621C (en) 1996-07-02
TW211024B (ko) 1993-08-11

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