DE69121972D1 - Röntgenstrahlenmikroskop - Google Patents

Röntgenstrahlenmikroskop

Info

Publication number
DE69121972D1
DE69121972D1 DE69121972T DE69121972T DE69121972D1 DE 69121972 D1 DE69121972 D1 DE 69121972D1 DE 69121972 T DE69121972 T DE 69121972T DE 69121972 T DE69121972 T DE 69121972T DE 69121972 D1 DE69121972 D1 DE 69121972D1
Authority
DE
Germany
Prior art keywords
ray microscope
microscope
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69121972T
Other languages
English (en)
Other versions
DE69121972T2 (de
Inventor
Masami Hayashida
Yutaka Watanabe
Masahito Niibe
Takashi Iizuka
Yasuaki Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69121972D1 publication Critical patent/DE69121972D1/de
Application granted granted Critical
Publication of DE69121972T2 publication Critical patent/DE69121972T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
DE1991621972 1990-06-01 1991-05-31 Röntgenstrahlenmikroskop Expired - Fee Related DE69121972T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2143870A JP2921038B2 (ja) 1990-06-01 1990-06-01 Ｘ線を用いた観察装置

Publications (2)

Publication Number Publication Date
DE69121972D1 true DE69121972D1 (de) 1996-10-17
DE69121972T2 DE69121972T2 (de) 1997-02-13

Family

ID=15348914

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1991621972 Expired - Fee Related DE69121972T2 (de) 1990-06-01 1991-05-31 Röntgenstrahlenmikroskop

Country Status (3)

Country Link
EP (1) EP0459833B1 (de)
JP (1) JP2921038B2 (de)
DE (1) DE69121972T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4027285A1 (de) * 1990-08-29 1992-03-05 Zeiss Carl Fa Roentgenmikroskop
JPH04353800A (ja) * 1991-05-31 1992-12-08 Olympus Optical Co Ltd 軟ｘ線顕微鏡
DE4432811B4 (de) * 1993-09-15 2006-04-13 Carl Zeiss Phasenkontrast-Röntgenmikroskop
JP3624207B2 (ja) * 1997-08-06 2005-03-02 理学電機工業株式会社 点集束型ｘ線分光装置
JPH11132754A (ja) * 1997-10-30 1999-05-21 Nippon Telegr & Teleph Corp <Ntt> Ｘ線すきま測定方法及び装置
US6041099A (en) * 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
DE19956782C2 (de) * 1999-11-25 2001-11-15 Lutz Kipp Optisches Fokussierelement, Meßsystem und Apparatur mit einem solchen optischen Element und Verwendung desselben
JP2002195963A (ja) * 2000-12-25 2002-07-10 Ours Tex Kk Ｘ線分光装置およびｘ線分析装置
DE10162093A1 (de) * 2001-12-18 2003-07-10 Bruker Axs Gmbh Röntgen-optisches System mit Blende im Fokus einer Röntgen-Spiegels
JP4639352B2 (ja) 2002-05-10 2011-02-23 カール・ツァイス・エスエムティー・ゲーエムベーハー 波長≦１００ｎｍで物体を検査する検査系
US7245696B2 (en) 2002-05-29 2007-07-17 Xradia, Inc. Element-specific X-ray fluorescence microscope and method of operation
JP3715955B2 (ja) * 2002-07-25 2005-11-16 独立行政法人科学技術振興機構 軟ｘ線干渉計
DE10242431A1 (de) * 2002-09-11 2004-03-25 Lutz Dr. Kipp Element zur Fokussierung von elektromagnetischen Strahlen oder Strahlen von Elementarteilchen
DE10319269A1 (de) 2003-04-25 2004-11-25 Carl Zeiss Sms Gmbh Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop
JP5392982B2 (ja) 2003-06-13 2014-01-22 オスミック、インコーポレイテッド ビーム調整システム
US7280634B2 (en) 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
JP2006126045A (ja) * 2004-10-29 2006-05-18 Rigaku Industrial Co ポリキャピラリ
WO2007016484A2 (en) * 2005-08-01 2007-02-08 The Research Foundation Of State University Of New York X-ray imaging systems employing point-focusing, curved monochromating optics
US8249220B2 (en) 2009-10-14 2012-08-21 Rigaku Innovative Technologies, Inc. Multiconfiguration X-ray optical system
EP3603516A1 (de) * 2018-08-02 2020-02-05 Siemens Healthcare GmbH Röntgenvorrichtung und verfahren zum betrieb der röntgenvorrichtung
DE102019124919B4 (de) 2019-09-17 2021-08-26 Ri Research Instruments Gmbh Mikroskopisches System zur Prüfung von Strukturen und Defekten auf EUV-Lithographie-Photomasken

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6221223A (ja) * 1985-07-19 1987-01-29 Shimadzu Corp 軟ｘ線用投影結像装置
JPH01119800A (ja) * 1987-11-02 1989-05-11 Fujitsu Ltd Ｘ線光源
JP2844703B2 (ja) * 1989-08-09 1999-01-06 株式会社ニコン 結像型軟ｘ線顕微鏡装置

Also Published As

Publication number Publication date
EP0459833B1 (de) 1996-09-11
JPH0438500A (ja) 1992-02-07
EP0459833A3 (en) 1991-12-27
EP0459833A2 (de) 1991-12-04
DE69121972T2 (de) 1997-02-13
JP2921038B2 (ja) 1999-07-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee