DE69118286T2 - Quelle zur Erzeugung eines schnellen Atomstrahls - Google Patents

Quelle zur Erzeugung eines schnellen Atomstrahls

Info

Publication number
DE69118286T2
DE69118286T2 DE69118286T DE69118286T DE69118286T2 DE 69118286 T2 DE69118286 T2 DE 69118286T2 DE 69118286 T DE69118286 T DE 69118286T DE 69118286 T DE69118286 T DE 69118286T DE 69118286 T2 DE69118286 T2 DE 69118286T2
Authority
DE
Germany
Prior art keywords
source
speed
ion
fast atom
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69118286T
Other languages
English (en)
Other versions
DE69118286D1 (de
Inventor
Kazutoshi Nagai
Kanichi Itoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of DE69118286D1 publication Critical patent/DE69118286D1/de
Application granted granted Critical
Publication of DE69118286T2 publication Critical patent/DE69118286T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
    • H05H3/02—Molecular or atomic beam generation

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Stabilization Of Oscillater, Synchronisation, Frequency Synthesizers (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Particle Accelerators (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
DE69118286T 1990-08-30 1991-08-28 Quelle zur Erzeugung eines schnellen Atomstrahls Expired - Fee Related DE69118286T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2226486A JPH0799720B2 (ja) 1990-08-30 1990-08-30 高速原子線源

Publications (2)

Publication Number Publication Date
DE69118286D1 DE69118286D1 (de) 1996-05-02
DE69118286T2 true DE69118286T2 (de) 1996-08-29

Family

ID=16845858

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69118286T Expired - Fee Related DE69118286T2 (de) 1990-08-30 1991-08-28 Quelle zur Erzeugung eines schnellen Atomstrahls

Country Status (5)

Country Link
US (1) US5221841A (de)
EP (1) EP0475199B1 (de)
JP (1) JPH0799720B2 (de)
AT (1) ATE136192T1 (de)
DE (1) DE69118286T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05251408A (ja) * 1992-03-06 1993-09-28 Ebara Corp 半導体ウェーハのエッチング装置
FR2706087B1 (fr) * 1993-06-04 1995-08-04 Framatome Connectors France Ensemble de connexion présentant des éléments de connexion superposés.
US5519213A (en) * 1993-08-20 1996-05-21 Ebara Corporation Fast atom beam source
US5589685A (en) * 1995-05-26 1996-12-31 Jen Wu; Kuang Matrix enhanced SIMS
GB9714576D0 (en) * 1997-07-10 1997-09-17 Applied Materials Inc Method and apparatus for neutralising space charge in an ion beam
US6835317B2 (en) * 1997-11-04 2004-12-28 Ebara Corporation Method of making substrate with micro-protrusions or micro-cavities
US6671034B1 (en) * 1998-04-30 2003-12-30 Ebara Corporation Microfabrication of pattern imprinting
US6359286B1 (en) 1998-07-10 2002-03-19 Applied Materials, Inc. Method and apparatus for neutralizing space charge in an ion beam
JP3530942B2 (ja) * 2002-03-05 2004-05-24 独立行政法人通信総合研究所 分子ビーム発生方法及び装置
KR100917010B1 (ko) * 2002-11-27 2009-09-10 삼성전자주식회사 배향막 형성 방법 및 장치
GB2619948A (en) * 2022-06-22 2023-12-27 Fusion Reactors Ltd Neutral beam injection apparatus and method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3846636A (en) * 1971-08-31 1974-11-05 Reactor Accelerator Dev Int In Method and means for utilizing accelerated neutral particles
US4916311A (en) * 1987-03-12 1990-04-10 Mitsubishi Denki Kabushiki Kaisha Ion beaming irradiating apparatus including ion neutralizer
US4818872A (en) * 1987-05-11 1989-04-04 Microbeam Inc. Integrated charge neutralization and imaging system
JPH02100299A (ja) * 1988-10-06 1990-04-12 Nec Corp 高速原子源

Also Published As

Publication number Publication date
EP0475199A2 (de) 1992-03-18
US5221841A (en) 1993-06-22
ATE136192T1 (de) 1996-04-15
EP0475199A3 (en) 1992-07-08
DE69118286D1 (de) 1996-05-02
JPH0799720B2 (ja) 1995-10-25
EP0475199B1 (de) 1996-03-27
JPH04109598A (ja) 1992-04-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee