DE69110514T2 - Vorrichtung für Mikrowellen-Plasma-CVD. - Google Patents

Vorrichtung für Mikrowellen-Plasma-CVD.

Info

Publication number
DE69110514T2
DE69110514T2 DE69110514T DE69110514T DE69110514T2 DE 69110514 T2 DE69110514 T2 DE 69110514T2 DE 69110514 T DE69110514 T DE 69110514T DE 69110514 T DE69110514 T DE 69110514T DE 69110514 T2 DE69110514 T2 DE 69110514T2
Authority
DE
Germany
Prior art keywords
plasma cvd
microwave plasma
microwave
cvd
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69110514T
Other languages
English (en)
Other versions
DE69110514D1 (de
Inventor
Fumio Takamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Japan Radio Co Ltd
Original Assignee
New Japan Radio Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by New Japan Radio Co Ltd filed Critical New Japan Radio Co Ltd
Publication of DE69110514D1 publication Critical patent/DE69110514D1/de
Application granted granted Critical
Publication of DE69110514T2 publication Critical patent/DE69110514T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32266—Means for controlling power transmitted to the plasma
DE69110514T 1990-03-30 1991-03-19 Vorrichtung für Mikrowellen-Plasma-CVD. Expired - Fee Related DE69110514T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2080838A JP2966029B2 (ja) 1990-03-30 1990-03-30 マイクロ波プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
DE69110514D1 DE69110514D1 (de) 1995-07-27
DE69110514T2 true DE69110514T2 (de) 1995-11-30

Family

ID=13729517

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69110514T Expired - Fee Related DE69110514T2 (de) 1990-03-30 1991-03-19 Vorrichtung für Mikrowellen-Plasma-CVD.

Country Status (4)

Country Link
US (1) US5178683A (de)
EP (1) EP0449081B1 (de)
JP (1) JP2966029B2 (de)
DE (1) DE69110514T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3173190B2 (ja) * 1992-10-20 2001-06-04 ソニー株式会社 パウダービーム加工機
US6039834A (en) * 1997-03-05 2000-03-21 Applied Materials, Inc. Apparatus and methods for upgraded substrate processing system with microwave plasma source
US6955725B2 (en) * 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US7581511B2 (en) * 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US8133554B2 (en) * 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
DE102004060068B4 (de) * 2004-12-06 2009-04-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Mikrowellenplasmaquelle
US20060165873A1 (en) * 2005-01-25 2006-07-27 Micron Technology, Inc. Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes
JP4849829B2 (ja) * 2005-05-15 2012-01-11 株式会社ソニー・コンピュータエンタテインメント センタ装置
DE102008062619B8 (de) * 2008-12-10 2012-03-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Mikrowellenplasmaquelle und Verfahren zur Bildung eines linear langgestreckten Plasmas beiAtmosphärendruckbedingungen
US10348239B2 (en) 2013-05-02 2019-07-09 3M Innovative Properties Company Multi-layered solar cell device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2456787A1 (fr) * 1979-05-18 1980-12-12 Thomson Csf Dispositif hyperfrequence pour le depot de films minces sur des solides
FR2575151B1 (fr) * 1984-12-21 1991-08-30 France Etat Procede et dispositif de fabrication de preformes pour fibres optiques, et preformes obtenues par ce procede
DE3712971A1 (de) * 1987-04-16 1988-11-03 Plasonic Oberflaechentechnik G Verfahren und vorrichtung zum erzeugen eines plasmas
JP2552140B2 (ja) * 1987-07-03 1996-11-06 新日本無線株式会社 プラズマ発生反応装置
JPS6424094A (en) * 1987-07-21 1989-01-26 Nat Inst Res Inorganic Mat Synthesizing apparatus for diamond
JPH01198478A (ja) * 1988-02-01 1989-08-10 Canon Inc マイクロ波プラズマｃｖｄ装置

Also Published As

Publication number Publication date
JP2966029B2 (ja) 1999-10-25
EP0449081A3 (en) 1992-03-18
JPH03283425A (ja) 1991-12-13
US5178683A (en) 1993-01-12
EP0449081A2 (de) 1991-10-02
DE69110514D1 (de) 1995-07-27
EP0449081B1 (de) 1995-06-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee