DE69029503D1 - Aperturenmuster-Flachdruckplatte zur Herstellung einer Schattenmaske und Verfahren zur Herstellung dieser Maske - Google Patents

Aperturenmuster-Flachdruckplatte zur Herstellung einer Schattenmaske und Verfahren zur Herstellung dieser Maske

Info

Publication number
DE69029503D1
DE69029503D1 DE69029503T DE69029503T DE69029503D1 DE 69029503 D1 DE69029503 D1 DE 69029503D1 DE 69029503 T DE69029503 T DE 69029503T DE 69029503 T DE69029503 T DE 69029503T DE 69029503 D1 DE69029503 D1 DE 69029503D1
Authority
DE
Germany
Prior art keywords
producing
mask
printing plate
planographic printing
aperture pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69029503T
Other languages
English (en)
Other versions
DE69029503T2 (de
Inventor
Yasuhisa Ohtake
Yasushi Magaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP26771789A external-priority patent/JP2831736B2/ja
Priority claimed from JP26771889A external-priority patent/JP2831737B2/ja
Priority claimed from JP26771689A external-priority patent/JP2831735B2/ja
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE69029503D1 publication Critical patent/DE69029503D1/de
Publication of DE69029503T2 publication Critical patent/DE69029503T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/06—Screens for shielding; Masks interposed in the electron stream
    • H01J29/07—Shadow masks for colour television tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C11/00—Auxiliary processes in photography
    • G03C11/08—Varnishing, e.g. application of protective layers on finished photographic prints
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/901—Printed circuit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE69029503T 1989-10-13 1990-10-10 Aperturenmuster-Flachdruckplatte zur Herstellung einer Schattenmaske und Verfahren zur Herstellung dieser Maske Expired - Fee Related DE69029503T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP26771789A JP2831736B2 (ja) 1989-10-13 1989-10-13 シャドウマスク用パターン焼付け版及びその製造方法
JP26771889A JP2831737B2 (ja) 1989-10-13 1989-10-13 シャドウマスク用パターン焼付け版及びその製造方法
JP26771689A JP2831735B2 (ja) 1989-10-13 1989-10-13 シャドウマスク用パターン焼付け版及びその製造方法

Publications (2)

Publication Number Publication Date
DE69029503D1 true DE69029503D1 (de) 1997-02-06
DE69029503T2 DE69029503T2 (de) 1997-05-22

Family

ID=27335583

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69029503T Expired - Fee Related DE69029503T2 (de) 1989-10-13 1990-10-10 Aperturenmuster-Flachdruckplatte zur Herstellung einer Schattenmaske und Verfahren zur Herstellung dieser Maske

Country Status (4)

Country Link
US (1) US5134015A (de)
EP (1) EP0422614B1 (de)
KR (1) KR930000789B1 (de)
DE (1) DE69029503T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5348825A (en) * 1991-07-02 1994-09-20 Dai Nippon Printing Co., Ltd. Method for manufacturing shadow mask and shadow mask manufactured by said method
US5438461A (en) * 1991-07-19 1995-08-01 Canon Kabushiki Kaisha Magnetic reproduction apparatus for a camera
US5679483A (en) * 1994-12-20 1997-10-21 Siemens Aktiengesellschaft Embedded phase shifting photomasks and method for manufacturing same
KR100526527B1 (ko) * 2002-11-29 2005-11-08 삼성전자주식회사 포토마스크와 그를 이용한 마스크 패턴 형성 방법
US11589464B2 (en) * 2020-12-22 2023-02-21 Hamilton Sundstrand Corporation Protective coating for electrical components and method of making the protective coating

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3897251A (en) * 1972-02-03 1975-07-29 Gte Sylvania Inc Process for utilizing a photoprinting article and method for making said article
JPS5231660A (en) * 1975-09-05 1977-03-10 Hitachi Ltd Exposing machine for shadow mask
US4176605A (en) * 1976-09-13 1979-12-04 Toyo Ink Manufacturing Co., Ltd. Lithographic printing process
JPS5950444A (ja) * 1982-09-16 1984-03-23 Tokyo Ohka Kogyo Co Ltd 微細加工用ホトマスク
US4656107A (en) * 1983-06-24 1987-04-07 Rca Corporation Photographic printing plate for use in a vacuum printing frame
US4588676A (en) * 1983-06-24 1986-05-13 Rca Corporation Photoexposing a photoresist-coated sheet in a vacuum printing frame
JPS6087327A (ja) * 1983-10-19 1985-05-17 Akai Electric Co Ltd クロムマスクの製造方法
JPS6169067A (ja) * 1985-09-13 1986-04-09 Hitachi Ltd レテイクル
JPS6285251A (ja) * 1985-10-09 1987-04-18 Nec Corp ホトマスクの保護膜形成方法
US4669871A (en) * 1986-08-01 1987-06-02 Rca Corporation Photographic printing plate and method of exposing a coated sheet using same
CN1033345C (zh) * 1989-03-02 1996-11-20 东芝株式会社 荫罩的图形印相版

Also Published As

Publication number Publication date
KR930000789B1 (en) 1993-02-04
EP0422614B1 (de) 1996-12-27
KR910008775A (ko) 1991-05-31
EP0422614A2 (de) 1991-04-17
US5134015A (en) 1992-07-28
DE69029503T2 (de) 1997-05-22
EP0422614A3 (en) 1991-11-06

Similar Documents

Publication Publication Date Title
DE69033996D1 (de) Maske, Verfahren zur Herstellung der Maske und Verfahren zur Musterherstellung mit einer Maske
DE69131704D1 (de) Verfahren zur Herstellung von einer Flexodruckplatte
DE69435070D1 (de) Verfahren zur Herstellung einer photolithographischen Maske
DE69418910D1 (de) Verfahren zur Herstellung einer positiven lithographischen Druckplatte
DE69132527T2 (de) Negativplatte zur Herstellung einer Schattenmaske und Verfahren zur Herstellung der Negativplatte
DE69324000D1 (de) Lithographischer Träger und Verfahren zur Herstellung einer lithographischen Druckform
DE69323997T2 (de) Lithographischer Träger und Verfahren zur Herstellung einer lithographischen Druckform
DE69325893D1 (de) Lithographischer Träger und Verfahren zur Herstellung einer lithographischen Druckform
DE68922495D1 (de) Verfahren zur Herstellung einer Flachdruckplatte.
DE69313797T2 (de) Verfahren zur Herstellung von integrierten Schaltkreisen unter Einsatz einer Maske
DE69021773D1 (de) Lithographische Röntgenmaske und Verfahren zum Herstellen einer solchen Maske.
DE69115999D1 (de) Verfahren zur Herstellung eines Maskenmusters
DE4243750C8 (de) Verfahren zur Herstellung einer Druckform für den Tiefdruck, Siebdruck, Flexodruck oder Offsetdruck
DE69029503D1 (de) Aperturenmuster-Flachdruckplatte zur Herstellung einer Schattenmaske und Verfahren zur Herstellung dieser Maske
DE69131175D1 (de) Verfahren zur Herstellung einer lithographischen Druckplatte
DE69202888D1 (de) Verfahren zur Herstellung einer lithographischen Druckplatte.
DE69130003D1 (de) Negative lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Photolackmusters
DE69426662D1 (de) Vorrichtung und Verfahren zur Herstellung einer Druckplatte
DE69021284D1 (de) Verfahren zur Herstellung und Verwendung einer Hochauflösungs-Lithographie-Maske.
DE69502466D1 (de) Verfahren und Vorrichtung zur Herstellung einer Schablonendruckplatte
DE69010353D1 (de) Aperturmusterdruckplatte für eine Schattenmaske und Herstellungsverfahren dafür.
DE59010547D1 (de) Verfahren zur Herstellung einer negativ arbeitenden lichtempfindlichen Druckform
DE69411433T2 (de) Flachdruckplatte und Verfahren zur Herstellung eines Trägers dafür
DE69409494T2 (de) Verfahren zur Herstellung einer lithographischen Druckplatte
DE69402795D1 (de) Verfahren zur Herstellung einer lithographischen Druckplatte

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee