DE69029300D1 - Verfahren und Vorrichtung zur Röntgenbelichtung - Google Patents

Verfahren und Vorrichtung zur Röntgenbelichtung

Info

Publication number
DE69029300D1
DE69029300D1 DE69029300T DE69029300T DE69029300D1 DE 69029300 D1 DE69029300 D1 DE 69029300D1 DE 69029300 T DE69029300 T DE 69029300T DE 69029300 T DE69029300 T DE 69029300T DE 69029300 D1 DE69029300 D1 DE 69029300D1
Authority
DE
Germany
Prior art keywords
exposure method
ray exposure
ray
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69029300T
Other languages
English (en)
Other versions
DE69029300T2 (de
Inventor
Yutaka Watanabe
Shinichiro Uno
Ryuichi Ebinuma
Nobutoshi Mizusawa
Shunichi Uzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69029300D1 publication Critical patent/DE69029300D1/de
Application granted granted Critical
Publication of DE69029300T2 publication Critical patent/DE69029300T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G03F7/2039—X-ray radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69029300T 1989-09-07 1990-08-30 Verfahren und Vorrichtung zur Röntgenbelichtung Expired - Fee Related DE69029300T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1230334A JP2731955B2 (ja) 1989-09-07 1989-09-07 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
DE69029300D1 true DE69029300D1 (de) 1997-01-16
DE69029300T2 DE69029300T2 (de) 1997-04-10

Family

ID=16906211

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69029300T Expired - Fee Related DE69029300T2 (de) 1989-09-07 1990-08-30 Verfahren und Vorrichtung zur Röntgenbelichtung

Country Status (4)

Country Link
US (1) US5125014A (de)
EP (1) EP0416811B1 (de)
JP (1) JP2731955B2 (de)
DE (1) DE69029300T2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5394451A (en) * 1991-10-08 1995-02-28 Canon Kabushiki Kaisha Optical arrangement for exposure apparatus
JP3187581B2 (ja) * 1992-02-10 2001-07-11 キヤノン株式会社 Ｘ線装置、ｘ線露光装置及び半導体デバイス製造方法
EP0588579B1 (de) * 1992-09-14 1998-12-02 Canon Kabushiki Kaisha Synchrotron-Röntgenbelichtungsverfahren
JPH0772318A (ja) * 1993-04-28 1995-03-17 Canon Inc 反射装置とこれを用いた照明装置や露光装置、並びにデバイス製造方法
US5371774A (en) * 1993-06-24 1994-12-06 Wisconsin Alumni Research Foundation X-ray lithography beamline imaging system
JP3167074B2 (ja) * 1993-06-30 2001-05-14 キヤノン株式会社 Ｓｏｒ露光システム及びこれを用いて製造されたマスク
JPH0720293A (ja) * 1993-06-30 1995-01-24 Canon Inc Ｘ線ミラー及びこれを用いたｘ線露光装置とデバイス製造方法
US5835560A (en) * 1994-05-24 1998-11-10 Canon Kabushiki Kaisha Exposure apparatus
JP3287725B2 (ja) * 1994-06-07 2002-06-04 キヤノン株式会社 露光方法とこれを用いたデバイス製造方法
EP0715215B1 (de) * 1994-11-29 2001-05-30 Canon Kabushiki Kaisha Ausrichtverfahren und Halbleiterbelichtungsverfahren
JP3278317B2 (ja) * 1995-03-24 2002-04-30 キヤノン株式会社 露光装置及びデバイス製造方法
JP3894509B2 (ja) * 1995-08-07 2007-03-22 キヤノン株式会社 光学装置、露光装置およびデバイス製造方法
TW341719B (en) * 1996-03-01 1998-10-01 Canon Kk Surface position detecting method and scanning exposure method using the same
US5930324A (en) * 1996-04-03 1999-07-27 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method using the same
JP3450622B2 (ja) * 1996-07-19 2003-09-29 キヤノン株式会社 露光装置およびこれを用いたデバイス製造方法
JP3255849B2 (ja) * 1996-07-19 2002-02-12 キヤノン株式会社 露光装置
JP3286184B2 (ja) * 1996-09-25 2002-05-27 キヤノン株式会社 走査露光装置および方法
JP3377165B2 (ja) * 1997-05-19 2003-02-17 キヤノン株式会社 半導体露光装置
US6167111A (en) * 1997-07-02 2000-12-26 Canon Kabushiki Kaisha Exposure apparatus for synchrotron radiation lithography
JP2000357644A (ja) 1999-06-14 2000-12-26 Canon Inc 露光方法及び露光装置
JP2000357643A (ja) 1999-06-14 2000-12-26 Canon Inc 露光方法及びそれを用いた露光装置
JP2002093684A (ja) 2000-09-18 2002-03-29 Canon Inc Ｘ線露光装置、ｘ線露光方法、半導体製造装置および微細構造体
JP2002245947A (ja) 2000-12-15 2002-08-30 Canon Inc 細線を有する基板及びその製造方法及び電子源基板及び画像表示装置
US6919951B2 (en) 2001-07-27 2005-07-19 Canon Kabushiki Kaisha Illumination system, projection exposure apparatus and device manufacturing method
CN102043341B (zh) * 2009-10-12 2012-10-03 上海微电子装备有限公司 用于光刻设备的对准信号采集系统与对准方法
US11333620B2 (en) 2019-08-02 2022-05-17 Cornell University High-pass x-ray filter device and methods of making thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037616B2 (ja) * 1980-01-24 1985-08-27 理学電機株式会社 Ｘ線リゾグラフイ装置
JPS5969927A (ja) * 1982-10-15 1984-04-20 Hitachi Ltd Ｘ線露光装置
JPS607722A (ja) * 1983-06-27 1985-01-16 Fujitsu Ltd エツクス線露光装置
JPS60226122A (ja) * 1984-04-25 1985-11-11 Hitachi Ltd 光反射鏡および露光装置
JPH0682601B2 (ja) * 1985-12-04 1994-10-19 株式会社日立製作所 Ｘ線露光装置用ミラ−
JPH0196600A (ja) * 1987-10-09 1989-04-14 Hitachi Ltd Ｘ線露光装置
JPH0243519A (ja) * 1988-08-03 1990-02-14 Fuji Electric Co Ltd 表示パネルの組立方法

Also Published As

Publication number Publication date
JP2731955B2 (ja) 1998-03-25
US5125014A (en) 1992-06-23
DE69029300T2 (de) 1997-04-10
EP0416811A3 (en) 1991-08-07
JPH0394417A (ja) 1991-04-19
EP0416811A2 (de) 1991-03-13
EP0416811B1 (de) 1996-12-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee