DE69017317T2 - Mikroskopisches Verfahren und "Nahfeld"-Reflexionsmikroskop. - Google Patents
Mikroskopisches Verfahren und "Nahfeld"-Reflexionsmikroskop.Info
- Publication number
- DE69017317T2 DE69017317T2 DE69017317T DE69017317T DE69017317T2 DE 69017317 T2 DE69017317 T2 DE 69017317T2 DE 69017317 T DE69017317 T DE 69017317T DE 69017317 T DE69017317 T DE 69017317T DE 69017317 T2 DE69017317 T2 DE 69017317T2
- Authority
- DE
- Germany
- Prior art keywords
- waveguide
- fiber
- optical
- wave
- propagation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 24
- 230000003287 optical effect Effects 0.000 claims abstract description 31
- 239000000523 sample Substances 0.000 claims abstract description 25
- 230000008878 coupling Effects 0.000 claims abstract description 14
- 238000010168 coupling process Methods 0.000 claims abstract description 14
- 238000005859 coupling reaction Methods 0.000 claims abstract description 14
- 238000000386 microscopy Methods 0.000 claims abstract description 14
- 230000005684 electric field Effects 0.000 claims abstract description 9
- 238000013459 approach Methods 0.000 claims abstract description 4
- 230000001427 coherent effect Effects 0.000 claims abstract description 4
- 239000000835 fiber Substances 0.000 claims description 70
- 239000013307 optical fiber Substances 0.000 claims description 48
- 238000005259 measurement Methods 0.000 claims description 17
- 230000005540 biological transmission Effects 0.000 claims description 15
- 238000006073 displacement reaction Methods 0.000 claims description 4
- 230000001105 regulatory effect Effects 0.000 claims description 4
- 230000001419 dependent effect Effects 0.000 claims description 2
- 230000002457 bidirectional effect Effects 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 5
- 238000001393 microlithography Methods 0.000 abstract 1
- 230000007423 decrease Effects 0.000 description 11
- 238000005253 cladding Methods 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 239000010410 layer Substances 0.000 description 6
- 238000012876 topography Methods 0.000 description 6
- 238000001465 metallisation Methods 0.000 description 4
- 230000001902 propagating effect Effects 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000005641 tunneling Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000399 optical microscopy Methods 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000306 recurrent effect Effects 0.000 description 1
- 238000004621 scanning probe microscopy Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000013598 vector Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
- G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/862—Near-field probe
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Microscoopes, Condenser (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Glass Compositions (AREA)
- Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
- Pyrrole Compounds (AREA)
- Optical Radar Systems And Details Thereof (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Pyrane Compounds (AREA)
- Waveguide Aerials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8911297A FR2651332B1 (fr) | 1989-08-28 | 1989-08-28 | Microscope en champ proche en reflexion utilisant un guide d'ondes comme sonde de ce champ. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69017317D1 DE69017317D1 (de) | 1995-04-06 |
| DE69017317T2 true DE69017317T2 (de) | 1995-11-09 |
Family
ID=9384942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69017317T Expired - Fee Related DE69017317T2 (de) | 1989-08-28 | 1990-08-27 | Mikroskopisches Verfahren und "Nahfeld"-Reflexionsmikroskop. |
Country Status (18)
| Country | Link |
|---|---|
| US (1) | US5340981A (zh) |
| EP (1) | EP0415838B1 (zh) |
| JP (1) | JPH05503586A (zh) |
| KR (1) | KR920704173A (zh) |
| CN (1) | CN1050266A (zh) |
| AT (1) | ATE119296T1 (zh) |
| AU (1) | AU6400390A (zh) |
| BR (1) | BR9007631A (zh) |
| CA (1) | CA2065263A1 (zh) |
| DD (1) | DD297521A5 (zh) |
| DE (1) | DE69017317T2 (zh) |
| ES (1) | ES2075178T3 (zh) |
| FI (1) | FI920905A0 (zh) |
| FR (1) | FR2651332B1 (zh) |
| IL (1) | IL95487A0 (zh) |
| OA (1) | OA09600A (zh) |
| WO (1) | WO1991003757A1 (zh) |
| ZA (1) | ZA906786B (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19741122A1 (de) * | 1997-09-12 | 1999-03-18 | Forschungsverbund Berlin Ev | Anordnung zur Vermessung und Strukturierung (Nahfeldanordnung) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0529125B1 (en) * | 1991-08-27 | 1996-07-31 | International Business Machines Corporation | Method and apparatus for generating high resolution optical images |
| FR2685127B1 (fr) * | 1991-12-13 | 1994-02-04 | Christian Licoppe | Photonanographe a gaz pour la fabrication et l'analyse optique de motifs a l'echelle nanometrique. |
| US5410151A (en) * | 1993-07-15 | 1995-04-25 | Sumitomo Electric Lightwave Corp. | Fiber optic probe and method of making same |
| WO1996037797A1 (en) * | 1995-05-26 | 1996-11-28 | General Scanning, Inc. | Wide field of view microscope and scanning system useful in the microscope |
| US5623339A (en) * | 1995-08-04 | 1997-04-22 | International Business Machines Corporation | Interferometric measuring method based on multi-pole sensing |
| US5646731A (en) * | 1995-08-04 | 1997-07-08 | International Business Machines Corporation | Interferometric detecting/imaging method based on multi-pole sensing |
| US5623338A (en) * | 1995-08-04 | 1997-04-22 | International Business Machines Corporation | Interferometric near-field apparatus based on multi-pole sensing |
| US5874726A (en) * | 1995-10-10 | 1999-02-23 | Iowa State University Research Foundation | Probe-type near-field confocal having feedback for adjusting probe distance |
| KR100797562B1 (ko) * | 2006-08-24 | 2008-01-24 | 조성구 | 반사식 초소형 현미경 모듈 |
| CN100590437C (zh) * | 2007-04-16 | 2010-02-17 | 中国科学院物理研究所 | 结合磁镊观测生物大分子的全反射近场显微镜 |
| KR101198910B1 (ko) | 2009-05-27 | 2012-11-08 | 광주과학기술원 | 레이저 간섭계 및 광신호 정렬 장치를 결합한 레이저 간섭계 |
| CN109374928B (zh) * | 2018-09-12 | 2020-10-27 | 东南大学 | 一种基于等离聚焦的近场扫描探针 |
| FR3097980B1 (fr) * | 2019-06-28 | 2022-08-19 | Laurent Galinier | Lentille multifocale à aberration de coma |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3276917D1 (en) * | 1982-12-27 | 1987-09-10 | Ibm | Light waveguide with a submicron aperture, method for manufacturing the waveguide and application of the waveguide in an optical memory |
| DE3276138D1 (en) * | 1982-12-27 | 1987-05-27 | Ibm | Optical near-field scanning microscope |
| EP0185782B1 (en) * | 1984-12-28 | 1989-03-15 | International Business Machines Corporation | Waveguide for an optical near-field microscope |
| EP0283256A3 (en) * | 1987-03-18 | 1990-02-07 | Tektronix Inc. | Scanning optical microscope |
| US4917462A (en) * | 1988-06-15 | 1990-04-17 | Cornell Research Foundation, Inc. | Near field scanning optical microscopy |
| US5105305A (en) * | 1991-01-10 | 1992-04-14 | At&T Bell Laboratories | Near-field scanning optical microscope using a fluorescent probe |
-
1989
- 1989-08-28 FR FR8911297A patent/FR2651332B1/fr not_active Expired - Fee Related
-
1990
- 1990-08-24 IL IL95487A patent/IL95487A0/xx unknown
- 1990-08-27 US US07/835,980 patent/US5340981A/en not_active Expired - Fee Related
- 1990-08-27 WO PCT/FR1990/000632 patent/WO1991003757A1/fr active Application Filing
- 1990-08-27 AU AU64003/90A patent/AU6400390A/en not_active Abandoned
- 1990-08-27 KR KR1019920700450A patent/KR920704173A/ko not_active Application Discontinuation
- 1990-08-27 CA CA002065263A patent/CA2065263A1/fr not_active Abandoned
- 1990-08-27 AT AT90402370T patent/ATE119296T1/de active
- 1990-08-27 ZA ZA906786A patent/ZA906786B/xx unknown
- 1990-08-27 DD DD90343656A patent/DD297521A5/de not_active IP Right Cessation
- 1990-08-27 ES ES90402370T patent/ES2075178T3/es not_active Expired - Lifetime
- 1990-08-27 DE DE69017317T patent/DE69017317T2/de not_active Expired - Fee Related
- 1990-08-27 JP JP2512873A patent/JPH05503586A/ja active Pending
- 1990-08-27 BR BR909007631A patent/BR9007631A/pt unknown
- 1990-08-27 EP EP90402370A patent/EP0415838B1/fr not_active Expired - Lifetime
- 1990-08-28 CN CN90107312A patent/CN1050266A/zh active Pending
-
1992
- 1992-02-28 FI FI920905A patent/FI920905A0/fi not_active Application Discontinuation
- 1992-02-28 OA OA60157A patent/OA09600A/fr unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19741122A1 (de) * | 1997-09-12 | 1999-03-18 | Forschungsverbund Berlin Ev | Anordnung zur Vermessung und Strukturierung (Nahfeldanordnung) |
| DE19741122C2 (de) * | 1997-09-12 | 2003-09-25 | Forschungsverbund Berlin Ev | Anordnung zur Vermessung und Strukturierung (Nahfeldanordnung) |
Also Published As
| Publication number | Publication date |
|---|---|
| IL95487A0 (en) | 1991-06-30 |
| DE69017317D1 (de) | 1995-04-06 |
| ZA906786B (en) | 1991-06-26 |
| AU6400390A (en) | 1991-04-08 |
| DD297521A5 (de) | 1992-01-09 |
| FI920905A0 (fi) | 1992-02-28 |
| EP0415838B1 (fr) | 1995-03-01 |
| JPH05503586A (ja) | 1993-06-10 |
| BR9007631A (pt) | 1992-07-07 |
| FR2651332B1 (fr) | 1994-05-06 |
| US5340981A (en) | 1994-08-23 |
| OA09600A (fr) | 1993-04-30 |
| EP0415838A1 (fr) | 1991-03-06 |
| FR2651332A1 (fr) | 1991-03-01 |
| ATE119296T1 (de) | 1995-03-15 |
| CA2065263A1 (fr) | 1991-03-01 |
| WO1991003757A1 (fr) | 1991-03-21 |
| ES2075178T3 (es) | 1995-10-01 |
| CN1050266A (zh) | 1991-03-27 |
| KR920704173A (ko) | 1992-12-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |