DE69012178D1 - Verfahren zur Herstellung von Diamant und Apparat für diese Herstellung. - Google Patents

Verfahren zur Herstellung von Diamant und Apparat für diese Herstellung.

Info

Publication number
DE69012178D1
DE69012178D1 DE69012178T DE69012178T DE69012178D1 DE 69012178 D1 DE69012178 D1 DE 69012178D1 DE 69012178 T DE69012178 T DE 69012178T DE 69012178 T DE69012178 T DE 69012178T DE 69012178 D1 DE69012178 D1 DE 69012178D1
Authority
DE
Germany
Prior art keywords
production
diamond
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69012178T
Other languages
English (en)
Other versions
DE69012178T2 (de
Inventor
Masanori Yoshikawa
Haruo Tateno
Hiroshi Obana
Tsutomu Itoh
Hiroshi Saitoh
Masayuki Kitoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiheiyo Cement Corp
Original Assignee
Onoda Cement Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Onoda Cement Co Ltd filed Critical Onoda Cement Co Ltd
Publication of DE69012178D1 publication Critical patent/DE69012178D1/de
Application granted granted Critical
Publication of DE69012178T2 publication Critical patent/DE69012178T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/277—Diamond only using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/25—Diamond
    • C01B32/26—Preparation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/276—Diamond only using plasma jets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE69012178T 1989-03-20 1990-03-19 Verfahren zur Herstellung von Diamant und Apparat für diese Herstellung. Expired - Fee Related DE69012178T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1067999A JPH02248397A (ja) 1989-03-20 1989-03-20 ダイヤモンドの製造装置および製造方法

Publications (2)

Publication Number Publication Date
DE69012178D1 true DE69012178D1 (de) 1994-10-13
DE69012178T2 DE69012178T2 (de) 1995-04-20

Family

ID=13361162

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69012178T Expired - Fee Related DE69012178T2 (de) 1989-03-20 1990-03-19 Verfahren zur Herstellung von Diamant und Apparat für diese Herstellung.

Country Status (4)

Country Link
US (1) US5070274A (de)
EP (1) EP0388861B1 (de)
JP (1) JPH02248397A (de)
DE (1) DE69012178T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5704976A (en) * 1990-07-06 1998-01-06 The United States Of America As Represented By The Secretary Of The Navy High temperature, high rate, epitaxial synthesis of diamond in a laminar plasma
JP2938552B2 (ja) * 1990-10-17 1999-08-23 富士通株式会社 コーティング膜の製造方法およびコーティング膜の製造装置
CA2054050C (en) * 1990-11-16 1998-07-07 Louis K. Bigelow Method and apparatus for making grit and abrasive media
JPH05891A (ja) * 1991-06-21 1993-01-08 Canon Inc ダイヤモンド−金属接合体
JP3203754B2 (ja) * 1992-03-30 2001-08-27 住友電気工業株式会社 ダイヤモンドの製造法および製造装置
US5565249A (en) * 1992-05-07 1996-10-15 Fujitsu Limited Method for producing diamond by a DC plasma jet
US5560779A (en) * 1993-07-12 1996-10-01 Olin Corporation Apparatus for synthesizing diamond films utilizing an arc plasma
CN1040277C (zh) * 1993-08-21 1998-10-14 河北省科学激光研究所 一种等离子炬
US5505158A (en) * 1994-11-04 1996-04-09 The United States Of America As Represented By The Secretary Of The Navy Apparatus and method for achieving growth-etch deposition of diamond using a chopped oxygen-acetylene flame
US5961772A (en) * 1997-01-23 1999-10-05 The Regents Of The University Of California Atmospheric-pressure plasma jet
AU2716797A (en) * 1997-04-16 1998-11-11 RAKHIMOV, Aleksandr Tursunovich Process for obtaining diamond layers by gaseous-phase synthesis
US8555921B2 (en) 2002-12-18 2013-10-15 Vapor Technologies Inc. Faucet component with coating
US7866343B2 (en) 2002-12-18 2011-01-11 Masco Corporation Of Indiana Faucet
US7866342B2 (en) 2002-12-18 2011-01-11 Vapor Technologies, Inc. Valve component for faucet
US8220489B2 (en) 2002-12-18 2012-07-17 Vapor Technologies Inc. Faucet with wear-resistant valve component
KR101268272B1 (ko) * 2004-05-27 2013-05-31 도쿠리츠교세이호징 붓시쯔 자이료 겐큐키코 나노 크리스탈 다이아몬드막, 그 제조 방법, 및 나노크리스탈 다이아몬드막을 이용한 장치
US20070026205A1 (en) 2005-08-01 2007-02-01 Vapor Technologies Inc. Article having patterned decorative coating
BRPI0710139A2 (pt) * 2006-04-14 2011-08-23 Silica Tech Llc Aparelho para deposição de plasma para fazer células solares, e, método para formar uma camada de células solares
JP2011219285A (ja) * 2010-04-06 2011-11-04 Kobe Steel Ltd ダイヤモンドフレークの製造方法およびダイヤモンドフレークを含有した伝熱性強化材
JP5985338B2 (ja) * 2012-09-28 2016-09-06 小島プレス工業株式会社 プラズマｃｖｄ装置
WO2018187177A1 (en) 2017-04-05 2018-10-11 Sang In Lee Depositing of material by spraying precursor using supercritical fluid
US11117161B2 (en) * 2017-04-05 2021-09-14 Nova Engineering Films, Inc. Producing thin films of nanoscale thickness by spraying precursor and supercritical fluid
CN107731711A (zh) * 2017-09-20 2018-02-23 南方科技大学 一种等离子减薄装置与方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3248513A (en) * 1961-10-06 1966-04-26 Soudure Electr Autogene Equipment for forming high temperature plasmas
US3644782A (en) * 1969-12-24 1972-02-22 Sheet Korman Associates Inc Method of energy transfer utilizing a fluid convection cathode plasma jet
JPS53142949A (en) * 1977-05-20 1978-12-13 Origin Electric Co Ltd Active gas plasma arc torch and its manipulation method
JPS6177697A (ja) * 1984-09-25 1986-04-21 Nec Corp ダイヤモンドの気相合成法とその装置
DE3606959A1 (de) * 1986-03-04 1987-09-10 Leybold Heraeus Gmbh & Co Kg Vorrichtung zur plasmabehandlung von substraten in einer durch hochfrequenz angeregten plasmaentladung
JPS62244574A (ja) * 1986-04-18 1987-10-24 Koike Sanso Kogyo Co Ltd プラズマ加工方法及びその装置
JPS63107898A (ja) * 1986-10-23 1988-05-12 Natl Inst For Res In Inorg Mater プラズマを用いるダイヤモンドの合成法
JPS63210099A (ja) * 1987-02-26 1988-08-31 Nissin Electric Co Ltd ダイヤモンド膜の作製方法
JPS6428297A (en) * 1987-04-03 1989-01-30 Fujitsu Ltd Vapor phase synthesis of diamond
JPH01100092A (ja) * 1987-10-13 1989-04-18 Fujitsu Ltd ダイヤモンドの気相合成方法及び装置
JPH01179789A (ja) * 1988-01-12 1989-07-17 Fujitsu Ltd ダイヤモンドの気相成長方法と熱プラズマ堆積方法およびプラズマ噴射装置
US4830702A (en) * 1987-07-02 1989-05-16 General Electric Company Hollow cathode plasma assisted apparatus and method of diamond synthesis
JPH02141494A (ja) * 1988-07-30 1990-05-30 Kobe Steel Ltd ダイヤモンド気相合成装置
JPH0255295A (ja) * 1988-08-18 1990-02-23 Fujitsu Ltd ダイヤモンドの気相合成装置およびダイヤモンドの気相合成方法
JPH0264097A (ja) * 1988-08-29 1990-03-05 Fujitsu Ltd 熱プラズマ発生装置およびダイヤモンドの気相合成方法
US4961958A (en) * 1989-06-30 1990-10-09 The Regents Of The Univ. Of Calif. Process for making diamond, and doped diamond films at low temperature

Also Published As

Publication number Publication date
EP0388861A3 (de) 1992-02-12
EP0388861B1 (de) 1994-09-07
DE69012178T2 (de) 1995-04-20
EP0388861A2 (de) 1990-09-26
JPH02248397A (ja) 1990-10-04
US5070274A (en) 1991-12-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee