DE69008082T2 - Verfahren zur Herstellung einer Anzeigetafel mit aktiver Matrix und invertierter Struktur. - Google Patents

Verfahren zur Herstellung einer Anzeigetafel mit aktiver Matrix und invertierter Struktur.

Info

Publication number
DE69008082T2
DE69008082T2 DE69008082T DE69008082T DE69008082T2 DE 69008082 T2 DE69008082 T2 DE 69008082T2 DE 69008082 T DE69008082 T DE 69008082T DE 69008082 T DE69008082 T DE 69008082T DE 69008082 T2 DE69008082 T2 DE 69008082T2
Authority
DE
Germany
Prior art keywords
producing
display panel
active matrix
inverted structure
inverted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69008082T
Other languages
English (en)
Other versions
DE69008082D1 (de
Inventor
Bruno Vinouze
Yannick Chouan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orange SA
Original Assignee
France Telecom SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by France Telecom SA filed Critical France Telecom SA
Publication of DE69008082D1 publication Critical patent/DE69008082D1/de
Application granted granted Critical
Publication of DE69008082T2 publication Critical patent/DE69008082T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78651—Silicon transistors
    • H01L29/7866—Non-monocrystalline silicon transistors
    • H01L29/78663—Amorphous silicon transistors
    • H01L29/78669—Amorphous silicon transistors with inverted-type structure, e.g. with bottom gate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/949—Energy beam treating radiation resist on semiconductor
DE69008082T 1989-08-29 1990-08-28 Verfahren zur Herstellung einer Anzeigetafel mit aktiver Matrix und invertierter Struktur. Expired - Fee Related DE69008082T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8911331A FR2651371B1 (fr) 1989-08-29 1989-08-29 Procede de realisation d'un ecran d'affichage a matrice active et a structure inversee.

Publications (2)

Publication Number Publication Date
DE69008082D1 DE69008082D1 (de) 1994-05-19
DE69008082T2 true DE69008082T2 (de) 1994-10-20

Family

ID=9384964

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69008082T Expired - Fee Related DE69008082T2 (de) 1989-08-29 1990-08-28 Verfahren zur Herstellung einer Anzeigetafel mit aktiver Matrix und invertierter Struktur.

Country Status (5)

Country Link
US (1) US5015597A (de)
EP (1) EP0415842B1 (de)
JP (1) JPH03119320A (de)
DE (1) DE69008082T2 (de)
FR (1) FR2651371B1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0464810B1 (de) * 1990-07-06 1995-05-10 Seiko Epson Corporation Verfahren zur Herstellung eines Substrates für eine Flüssigkristall-Anzeigevorrichtung
US5247194A (en) * 1991-05-24 1993-09-21 Samsung Electronics Co., Ltd. Thin film transistor with an increased switching rate
US5468064A (en) * 1993-09-29 1995-11-21 Honeywell Inc. Night vision compatible color correction system
KR0139346B1 (ko) * 1994-03-03 1998-06-15 김광호 박막 트랜지스터 액정표시장치의 제조방법
US5894136A (en) 1996-01-15 1999-04-13 Lg Electronics Inc. Liquid crystal display having a bottom gate TFT switch having a wider active semiconductor layer than a conductive layer on same
TW334582B (en) * 1996-06-18 1998-06-21 Handotai Energy Kenkyusho Kk Semiconductor device and method of fabtricating same
JP3607016B2 (ja) 1996-10-02 2005-01-05 株式会社半導体エネルギー研究所 半導体装置およびその作製方法、並びに携帯型の情報処理端末、ヘッドマウントディスプレイ、ナビゲーションシステム、携帯電話、カメラおよびプロジェクター
TW415109B (en) * 1999-04-01 2000-12-11 Hannstar Display Corp Structure and fabrication of thin-film transistor (TFT) array
JP3617458B2 (ja) * 2000-02-18 2005-02-02 セイコーエプソン株式会社 表示装置用基板、液晶装置及び電子機器
CN1949080B (zh) * 2005-10-13 2010-05-12 群康科技(深圳)有限公司 薄膜晶体管的制造装置和制造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4389481A (en) * 1980-06-02 1983-06-21 Xerox Corporation Method of making planar thin film transistors, transistor arrays
JPS6188578A (ja) * 1984-10-08 1986-05-06 Nec Corp 非線形素子
JPS61139069A (ja) * 1984-12-10 1986-06-26 Fuji Xerox Co Ltd 薄膜トランジスタおよびその製造方法
DE3604368A1 (de) * 1985-02-13 1986-08-14 Sharp K.K., Osaka Verfahren zur herstellung eines duennfilm-transistors
FR2579806B1 (fr) * 1985-03-26 1987-05-07 Morin Francois Procede de fabrication d'un ecran d'affichage a cristaux liquides et a reseau de diodes
US4904056A (en) * 1985-07-19 1990-02-27 General Electric Company Light blocking and cell spacing for liquid crystal matrix displays
JPS62109085A (ja) * 1985-11-08 1987-05-20 富士電機株式会社 アクテイブ・マトリクス
JPS62112127A (ja) * 1985-11-11 1987-05-23 Sharp Corp 液晶表示素子の電極間絶縁層の形成方法
FR2593631B1 (fr) * 1986-01-27 1989-02-17 Maurice Francois Ecran d'affichage a matrice active a resistance de grille et procedes de fabrication de cet ecran
FR2593630B1 (fr) * 1986-01-27 1988-03-18 Maurice Francois Ecran d'affichage a matrice active a resistance de drain et procedes de fabrication de cet ecran
JPH0622245B2 (ja) * 1986-05-02 1994-03-23 富士ゼロックス株式会社 薄膜トランジスタの製造方法
US4918504A (en) * 1987-07-31 1990-04-17 Nippon Telegraph And Telephone Corporation Active matrix cell
US4948706A (en) * 1987-12-30 1990-08-14 Hoya Corporation Process for producing transparent substrate having thereon transparent conductive pattern elements separated by light-shielding insulating film, and process for producing surface-colored material
JPH0239524A (ja) * 1988-07-29 1990-02-08 Ricoh Co Ltd 多結晶シリコン薄膜トランジスタの製造方法

Also Published As

Publication number Publication date
DE69008082D1 (de) 1994-05-19
EP0415842B1 (de) 1994-04-13
EP0415842A1 (de) 1991-03-06
FR2651371B1 (fr) 1991-10-18
JPH03119320A (ja) 1991-05-21
FR2651371A1 (fr) 1991-03-01
US5015597A (en) 1991-05-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee