DE68929356D1 - Verfahren und Vorrichtung zur Belichtung - Google Patents

Verfahren und Vorrichtung zur Belichtung

Info

Publication number
DE68929356D1
DE68929356D1 DE68929356T DE68929356T DE68929356D1 DE 68929356 D1 DE68929356 D1 DE 68929356D1 DE 68929356 T DE68929356 T DE 68929356T DE 68929356 T DE68929356 T DE 68929356T DE 68929356 D1 DE68929356 D1 DE 68929356D1
Authority
DE
Germany
Prior art keywords
exposure method
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68929356T
Other languages
English (en)
Other versions
DE68929356T2 (de
Inventor
Shigeru Terashima
Mitsuaki Amemiya
Isamu Shimoda
Shunichi Uzawa
Takao Kariya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63135616A external-priority patent/JP2649543B2/ja
Priority claimed from JP63228389A external-priority patent/JPH0821536B2/ja
Priority claimed from JP13068289A external-priority patent/JP2675859B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE68929356D1 publication Critical patent/DE68929356D1/de
Publication of DE68929356T2 publication Critical patent/DE68929356T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE68929356T 1988-06-03 1989-06-05 Verfahren und Vorrichtung zur Belichtung Expired - Fee Related DE68929356T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63135616A JP2649543B2 (ja) 1988-06-03 1988-06-03 露光装置
JP63228389A JPH0821536B2 (ja) 1988-09-14 1988-09-14 露光強度測定方法
JP13068289A JP2675859B2 (ja) 1989-05-23 1989-05-23 Ｘ線マスクおよびこれを用いたｘ線露光方法

Publications (2)

Publication Number Publication Date
DE68929356D1 true DE68929356D1 (de) 2002-01-24
DE68929356T2 DE68929356T2 (de) 2002-05-23

Family

ID=27316169

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68929356T Expired - Fee Related DE68929356T2 (de) 1988-06-03 1989-06-05 Verfahren und Vorrichtung zur Belichtung

Country Status (3)

Country Link
US (1) US5131022A (de)
EP (1) EP0345097B1 (de)
DE (1) DE68929356T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5222112A (en) * 1990-12-27 1993-06-22 Hitachi, Ltd. X-ray pattern masking by a reflective reduction projection optical system
JP3168018B2 (ja) * 1991-03-22 2001-05-21 キヤノン株式会社 基板吸着保持方法
DE69322345T2 (de) * 1992-09-14 1999-05-20 Canon Kk Synchrotron-Röntgenbelichtungsverfahren
JP3049680B2 (ja) * 1993-06-14 2000-06-05 キヤノン株式会社 ビーム位置検出装置及びこれを用いたシステム
JP3291408B2 (ja) * 1994-04-04 2002-06-10 キヤノン株式会社 露光装置および集積回路の製造方法
JP3287725B2 (ja) * 1994-06-07 2002-06-04 キヤノン株式会社 露光方法とこれを用いたデバイス製造方法
EP1091256A1 (de) * 1994-11-29 2001-04-11 Canon Kabushiki Kaisha Ausrichtungsverfahren und Halbleiterbelichtungsverfahren
JP3666951B2 (ja) 1995-10-06 2005-06-29 キヤノン株式会社 マーク検出方法、これを用いた位置合わせ方法、露光方法及び装置、ならびにデバイス生産方法
JP3634487B2 (ja) * 1996-02-09 2005-03-30 キヤノン株式会社 位置合せ方法、位置合せ装置、および露光装置
US5920398A (en) * 1996-03-01 1999-07-06 Canon Kabushiki Kaisha Surface position detecting method and scanning exposure method using the same
JP3862347B2 (ja) * 1996-04-11 2006-12-27 キヤノン株式会社 Ｘ線縮小露光装置およびこれを利用したデバイス製造方法
JP3284045B2 (ja) * 1996-04-30 2002-05-20 キヤノン株式会社 Ｘ線光学装置およびデバイス製造方法
JP3337921B2 (ja) 1996-08-23 2002-10-28 キヤノン株式会社 投影露光装置および位置合せ方法
JP2000311933A (ja) 1999-04-27 2000-11-07 Canon Inc 基板保持装置、基板搬送システム、露光装置、塗布装置およびデバイス製造方法ならびに基板保持部クリーニング方法
JP2002093684A (ja) 2000-09-18 2002-03-29 Canon Inc Ｘ線露光装置、ｘ線露光方法、半導体製造装置および微細構造体
JP2003163155A (ja) * 2001-11-28 2003-06-06 Mitsubishi Electric Corp Ｘ線露光方法、ｘ線露光装置、微細構造および半導体装置
JP5759186B2 (ja) * 2011-01-19 2015-08-05 キヤノン株式会社 荷電粒子線描画装置及びデバイス製造方法
ITMI20120652A1 (it) * 2012-04-19 2013-10-20 Caria Riccardo De Metodo ed apparato per la fotopolimerizzazione ed il lavaggio in serie di lastre di stampa digitali per flessografia
US9991014B1 (en) * 2014-09-23 2018-06-05 Daniel Gelbart Fast positionable X-ray filter

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2050707A1 (en) * 1970-10-15 1972-05-31 Siemens Ag Control of exposure state - in light sensitive materials using a grating projected onto the material
US4319830A (en) * 1979-08-06 1982-03-16 Terence Roach Multispectral light detection system
JPS59203947A (ja) * 1983-05-06 1984-11-19 Nippon Kokan Kk <Nkk> 放射線透過試験用露出測定装置
JPS6197918A (ja) * 1984-10-19 1986-05-16 Hitachi Ltd Ｘ線露光装置
US4707124A (en) * 1985-09-03 1987-11-17 CH2 M Hill, Inc. Apparatus for exposing photosensitive media
DE3712049A1 (de) * 1986-04-10 1987-11-12 Canon Kk Roentgenbelichtungsgeraet

Also Published As

Publication number Publication date
DE68929356T2 (de) 2002-05-23
EP0345097A2 (de) 1989-12-06
US5131022A (en) 1992-07-14
EP0345097B1 (de) 2001-12-12
EP0345097A3 (de) 1990-07-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee