DE68929348D1 - Profilierung eines Strahlungsbündels für Stereolithographie - Google Patents

Profilierung eines Strahlungsbündels für Stereolithographie

Info

Publication number
DE68929348D1
DE68929348D1 DE68929348T DE68929348T DE68929348D1 DE 68929348 D1 DE68929348 D1 DE 68929348D1 DE 68929348 T DE68929348 T DE 68929348T DE 68929348 T DE68929348 T DE 68929348T DE 68929348 D1 DE68929348 D1 DE 68929348D1
Authority
DE
Germany
Prior art keywords
stereolithography
intensity
pinhole
profiling
scanning mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE68929348T
Other languages
English (en)
Other versions
DE68929348T2 (de
Inventor
Stuart Thomas Spence
Thomas Almquist
Harry L Tarnoff
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3D Systems Inc
Original Assignee
3D Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/182,830 external-priority patent/US5059359A/en
Application filed by 3D Systems Inc filed Critical 3D Systems Inc
Publication of DE68929348D1 publication Critical patent/DE68929348D1/de
Application granted granted Critical
Publication of DE68929348T2 publication Critical patent/DE68929348T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T17/00—Three dimensional [3D] modelling, e.g. data description of 3D objects
    • G06T17/20—Finite element generation, e.g. wire-frame surface description, tesselation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/40—Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70416—2.5D lithography
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T17/00—Three dimensional [3D] modelling, e.g. data description of 3D objects
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T17/00—Three dimensional [3D] modelling, e.g. data description of 3D objects
    • G06T17/10—Constructive solid geometry [CSG] using solid primitives, e.g. cylinders, cubes
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/49—Nc machine tool, till multiple
    • G05B2219/49013—Deposit layers, cured by scanning laser, stereo lithography SLA, prototyping

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Computer Graphics (AREA)
  • Software Systems (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Laser Beam Processing (AREA)
  • Powder Metallurgy (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE68929348T 1988-04-18 1989-04-17 Profilierung eines Strahlungsbündels für Stereolithographie Expired - Lifetime DE68929348T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US07/182,830 US5059359A (en) 1988-04-18 1988-04-18 Methods and apparatus for production of three-dimensional objects by stereolithography
US26980188A 1988-11-08 1988-11-08
US07/268,907 US5059021A (en) 1988-04-18 1988-11-08 Apparatus and method for correcting for drift in production of objects by stereolithography
US07/268,816 US5058988A (en) 1988-04-18 1988-11-08 Apparatus and method for profiling a beam
US07/268,837 US5123734A (en) 1988-04-18 1988-11-08 Apparatus and method for calibrating and normalizing a stereolithographic apparatus

Publications (2)

Publication Number Publication Date
DE68929348D1 true DE68929348D1 (de) 2001-12-20
DE68929348T2 DE68929348T2 (de) 2002-09-26

Family

ID=27539082

Family Applications (4)

Application Number Title Priority Date Filing Date
DE68929348T Expired - Lifetime DE68929348T2 (de) 1988-04-18 1989-04-17 Profilierung eines Strahlungsbündels für Stereolithographie
DE0375097T Pending DE375097T1 (de) 1988-04-18 1989-04-17 Profilierung eines Strahlungsbündels für Stereolithographie.
DE68928485T Expired - Lifetime DE68928485T2 (de) 1988-04-18 1989-04-17 Profilierung eines Strahlungsbündels für Stereolithographie
DE68929541T Expired - Lifetime DE68929541T2 (de) 1988-04-18 1989-04-17 Profilierung eines Strahlungsbündels für Stereolithographie

Family Applications After (3)

Application Number Title Priority Date Filing Date
DE0375097T Pending DE375097T1 (de) 1988-04-18 1989-04-17 Profilierung eines Strahlungsbündels für Stereolithographie.
DE68928485T Expired - Lifetime DE68928485T2 (de) 1988-04-18 1989-04-17 Profilierung eines Strahlungsbündels für Stereolithographie
DE68929541T Expired - Lifetime DE68929541T2 (de) 1988-04-18 1989-04-17 Profilierung eines Strahlungsbündels für Stereolithographie

Country Status (7)

Country Link
EP (1) EP0375097B1 (de)
AT (3) ATE308414T1 (de)
CA (2) CA1341214C (de)
DE (4) DE68929348T2 (de)
HK (1) HK1003490A1 (de)
IL (1) IL89976A0 (de)
WO (1) WO1989011085A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0758952B1 (de) * 1994-05-13 1998-04-08 EOS GmbH ELECTRO OPTICAL SYSTEMS Verfahren und vorrichtung zum herstellen dreidimensionaler objekte
DE4416988A1 (de) * 1994-05-13 1995-11-16 Eos Electro Optical Syst Vorrichtung und Verfahren zum Herstellen eines dreidimensionalen Objekts
DE19918613A1 (de) 1999-04-23 2000-11-30 Eos Electro Optical Syst Verfahren zur Kalibrierung einer Vorrichtung zum Herstellen eines dreidimensionalen Objektes, Kalibrierungsvorrichtung und Verfahren und Vorrichtung zur Herstellung eines dreidimensionalen Objektes
US20120098164A1 (en) * 2007-07-20 2012-04-26 Shyi-Herng Kan Two-photon stereolithography using photocurable compositions
FR2966266B1 (fr) * 2010-10-15 2016-01-22 Phidias Technologies Procede et dispositif de prototypage rapide.
BE1024052B1 (nl) * 2013-12-03 2017-11-08 Layerwise N.V. Werkwijze en inrichting voor het kalibreren van meerdere energiestralen voor het additief vervaardigen van een object
JP7354590B2 (ja) 2019-05-29 2023-10-03 セイコーエプソン株式会社 三次元造形物の製造方法および三次元造形装置
JP7306065B2 (ja) 2019-05-30 2023-07-11 セイコーエプソン株式会社 三次元造形物の製造方法および三次元造形装置
CN114184131B (zh) * 2021-12-09 2024-01-30 安徽华烨特种材料有限公司 浸胶增强材料接头识别设备
CN115415747B (zh) * 2022-09-19 2024-01-26 四川精控阀门制造有限公司 强制密封球阀堆焊球体的加工方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5226242A (en) * 1975-08-22 1977-02-26 Nippon Telegr & Teleph Corp <Ntt> Unit for analysing the distribution of a light mode
JPS5670429A (en) * 1979-11-14 1981-06-12 Nec Corp Measuring device for laser beam
US4320462A (en) * 1980-03-31 1982-03-16 Hughes Aircraft Company High speed laser pulse analyzer
SE440415B (sv) * 1983-11-17 1985-07-29 Mydata Ab Forfarande och anordning for kalibrering av ett positioneringssystem
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
JPS62163933A (ja) 1986-01-14 1987-07-20 Nippon Kogaku Kk <Nikon> レ−ザビ−ム断面光強度分布測定装置

Also Published As

Publication number Publication date
EP0375097A2 (de) 1990-06-27
DE68928485D1 (de) 1998-01-22
EP0375097A3 (de) 1991-09-25
ATE160968T1 (de) 1997-12-15
HK1003490A1 (en) 1998-10-30
IL89976A0 (en) 1989-12-15
WO1989011085A1 (en) 1989-11-16
DE375097T1 (de) 1996-02-29
CA1334052C (en) 1995-01-24
DE68928485T2 (de) 1998-07-02
DE68929348T2 (de) 2002-09-26
ATE208702T1 (de) 2001-11-15
EP0375097B1 (de) 1997-12-10
ATE308414T1 (de) 2005-11-15
DE68929541D1 (de) 2005-12-08
CA1341214C (en) 2001-04-10
DE68929541T2 (de) 2006-08-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: 3D SYSTEMS, INC., ROCK HILL, S.C., US