DE68928396T2 - CMOS-integrierte Schaltung mit modifizierter Isolation - Google Patents

CMOS-integrierte Schaltung mit modifizierter Isolation

Info

Publication number
DE68928396T2
DE68928396T2 DE68928396T DE68928396T DE68928396T2 DE 68928396 T2 DE68928396 T2 DE 68928396T2 DE 68928396 T DE68928396 T DE 68928396T DE 68928396 T DE68928396 T DE 68928396T DE 68928396 T2 DE68928396 T2 DE 68928396T2
Authority
DE
Germany
Prior art keywords
integrated circuit
cmos integrated
modified isolation
isolation
modified
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68928396T
Other languages
English (en)
Other versions
DE68928396D1 (de
Inventor
Min-Liang Chen
William T Cochran
Chung Wai Leung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Corp filed Critical AT&T Corp
Application granted granted Critical
Publication of DE68928396D1 publication Critical patent/DE68928396D1/de
Publication of DE68928396T2 publication Critical patent/DE68928396T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8232—Field-effect technology
    • H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
    • H01L21/8238—Complementary field-effect transistors, e.g. CMOS
    • H01L21/823878—Complementary field-effect transistors, e.g. CMOS isolation region manufacturing related aspects, e.g. to avoid interaction of isolation region with adjacent structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
    • H01L21/76213—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose
    • H01L21/76216—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose introducing electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers
    • H01L21/76218—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose introducing electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers introducing both types of electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers, e.g. for isolation of complementary doped regions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • H01L27/0928—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors comprising both N- and P- wells in the substrate, e.g. twin-tub

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Element Separation (AREA)
DE68928396T 1988-08-30 1989-08-24 CMOS-integrierte Schaltung mit modifizierter Isolation Expired - Fee Related DE68928396T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/238,362 US5045898A (en) 1988-08-30 1988-08-30 CMOS integrated circuit having improved isolation

Publications (2)

Publication Number Publication Date
DE68928396D1 DE68928396D1 (de) 1997-11-27
DE68928396T2 true DE68928396T2 (de) 1998-02-19

Family

ID=22897539

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68928396T Expired - Fee Related DE68928396T2 (de) 1988-08-30 1989-08-24 CMOS-integrierte Schaltung mit modifizierter Isolation

Country Status (7)

Country Link
US (1) US5045898A (de)
EP (1) EP0357346B1 (de)
JP (1) JPH02112273A (de)
CA (1) CA1315419C (de)
DE (1) DE68928396T2 (de)
ES (1) ES2109222T3 (de)
HK (1) HK1004351A1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9401274B2 (en) 2013-08-09 2016-07-26 Taiwan Semiconductor Manufacturing Company Limited Methods and systems for dopant activation using microwave radiation
DE102015106397A1 (de) * 2015-04-16 2016-10-20 Taiwan Semiconductor Manufacturing Company, Ltd. Verfahren und Systeme zur Dotierstoffaktivierung mithilfe von Mikrowellenbestrahlung

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2924395B2 (ja) * 1992-01-09 1999-07-26 日本電気株式会社 半導体装置の製造方法
US5344787A (en) * 1993-09-24 1994-09-06 Vlsi Technology, Inc. Latid implants for increasing the effective width of transistor elements in a semiconductor device
US5409848A (en) * 1994-03-31 1995-04-25 Vlsi Technology, Inc. Angled lateral pocket implants on p-type semiconductor devices
US7348227B1 (en) * 1995-03-23 2008-03-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US5650350A (en) * 1995-08-11 1997-07-22 Micron Technology, Inc. Semiconductor processing method of forming a static random access memory cell and static random access memory cell
US5748547A (en) * 1996-05-24 1998-05-05 Shau; Jeng-Jye High performance semiconductor memory devices having multiple dimension bit lines
US20050036363A1 (en) * 1996-05-24 2005-02-17 Jeng-Jye Shau High performance embedded semiconductor memory devices with multiple dimension first-level bit-lines
US7064376B2 (en) * 1996-05-24 2006-06-20 Jeng-Jye Shau High performance embedded semiconductor memory devices with multiple dimension first-level bit-lines
US5804497A (en) * 1996-08-07 1998-09-08 Advanced Micro Devices, Inc. Selectively doped channel region for increased IDsat and method for making same
US6083795A (en) * 1998-02-09 2000-07-04 Taiwan Semiconductor Manufacturing Company Large angle channel threshold implant for improving reverse narrow width effect
US6188106B1 (en) 1998-09-03 2001-02-13 Advanced Micro Devices, Inc. MOSFET having a highly doped channel liner and a dopant seal to provide enhanced device properties
US6362510B1 (en) 1998-12-07 2002-03-26 Advanced Micro Devices, Inc. Semiconductor topography having improved active device isolation and reduced dopant migration
US6144076A (en) * 1998-12-08 2000-11-07 Lsi Logic Corporation Well formation For CMOS devices integrated circuit structures
FR2794898B1 (fr) 1999-06-11 2001-09-14 France Telecom Dispositif semi-conducteur a tension de seuil compensee et procede de fabrication
US6812521B1 (en) 1999-11-16 2004-11-02 Advanced Micro Devices, Inc. Method and apparatus for improved performance of flash memory cell devices
FI127168B (en) * 2014-05-20 2017-12-29 Murata Manufacturing Co Process for preparing a MEMS structure and using the method

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5379474A (en) * 1976-12-24 1978-07-13 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
US4354307A (en) * 1979-12-03 1982-10-19 Burroughs Corporation Method for mass producing miniature field effect transistors in high density LSI/VLSI chips
JPS5965481A (ja) * 1982-10-06 1984-04-13 Nec Corp 半導体装置
DE3467953D1 (en) * 1983-04-21 1988-01-14 Toshiba Kk Semiconductor device having an element isolation layer and method of manufacturing the same
DE3314450A1 (de) 1983-04-21 1984-10-25 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von hochintegrierten komplementaeren mos-feldeffekttransistorschaltungen
US4471523A (en) 1983-05-02 1984-09-18 International Business Machines Corporation Self-aligned field implant for oxide-isolated CMOS FET
JPS5925242A (ja) * 1983-07-11 1984-02-09 Hitachi Ltd 半導体装置
US4554726A (en) * 1984-04-17 1985-11-26 At&T Bell Laboratories CMOS Integrated circuit technology utilizing dual implantation of slow and fast diffusing donor ions to form the n-well
JPS61159766A (ja) * 1984-12-31 1986-07-19 Sony Corp 半導体装置の製造方法
EP0260271A1 (de) * 1986-03-04 1988-03-23 Motorola, Inc. Hoch/niedrig dopierungsprofil für ein verfahren mit doppelbohrloch
US4889825A (en) * 1986-03-04 1989-12-26 Motorola, Inc. High/low doping profile for twin well process
US4903107A (en) * 1986-12-29 1990-02-20 General Electric Company Buried oxide field isolation structure with composite dielectric
WO1997005443A1 (en) 1995-07-26 1997-02-13 Laser Products Corporation Hand weapon holstering systems

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9401274B2 (en) 2013-08-09 2016-07-26 Taiwan Semiconductor Manufacturing Company Limited Methods and systems for dopant activation using microwave radiation
US9627212B2 (en) 2013-08-09 2017-04-18 Taiwan Semiconductor Manufacturing Company Limited Methods and systems for dopant activation using microwave radiation
US10522356B2 (en) 2013-08-09 2019-12-31 Taiwan Semiconductor Manufacturing Company, Ltd. Methods and systems for dopant activation using microwave radiation
DE102015106397A1 (de) * 2015-04-16 2016-10-20 Taiwan Semiconductor Manufacturing Company, Ltd. Verfahren und Systeme zur Dotierstoffaktivierung mithilfe von Mikrowellenbestrahlung
DE102015106397B4 (de) * 2015-04-16 2019-08-22 Taiwan Semiconductor Manufacturing Company, Ltd. Verfahren und Systeme zur Dotierstoffaktivierung mithilfe von Mikrowellenbestrahlung

Also Published As

Publication number Publication date
EP0357346B1 (de) 1997-10-22
JPH02112273A (ja) 1990-04-24
CA1315419C (en) 1993-03-30
HK1004351A1 (en) 1998-11-20
US5045898A (en) 1991-09-03
ES2109222T3 (es) 1998-01-16
EP0357346A2 (de) 1990-03-07
EP0357346A3 (de) 1991-09-25
DE68928396D1 (de) 1997-11-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee