DE68921052T2 - Lichtempfindliche Kunststoffzusammensetzung und lichtempfindliches Element unter Verwendung dieser Zusammensetzung. - Google Patents

Lichtempfindliche Kunststoffzusammensetzung und lichtempfindliches Element unter Verwendung dieser Zusammensetzung.

Info

Publication number
DE68921052T2
DE68921052T2 DE1989621052 DE68921052T DE68921052T2 DE 68921052 T2 DE68921052 T2 DE 68921052T2 DE 1989621052 DE1989621052 DE 1989621052 DE 68921052 T DE68921052 T DE 68921052T DE 68921052 T2 DE68921052 T2 DE 68921052T2
Authority
DE
Germany
Prior art keywords
composition
photosensitive
plastic
photosensitive member
plastic photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1989621052
Other languages
English (en)
Other versions
DE68921052D1 (de
Inventor
Kuniaki Satoh
Yasunori Kojima
Shigeo Tachiki
Tohru Kikuchi
Toshiaki Ishimaru
Nobuyuki Hayashi
Mitsumasa Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP31881488A external-priority patent/JPH02163743A/ja
Priority claimed from JP31881388A external-priority patent/JPH02163742A/ja
Priority claimed from JP9916889A external-priority patent/JPH02277062A/ja
Priority claimed from JP1134383A external-priority patent/JP2880523B2/ja
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Application granted granted Critical
Publication of DE68921052D1 publication Critical patent/DE68921052D1/de
Publication of DE68921052T2 publication Critical patent/DE68921052T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/54—Nitrogen-containing linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/42—Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/106—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
DE1989621052 1988-12-16 1989-12-15 Lichtempfindliche Kunststoffzusammensetzung und lichtempfindliches Element unter Verwendung dieser Zusammensetzung. Expired - Fee Related DE68921052T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP31881488A JPH02163743A (ja) 1988-12-16 1988-12-16 感光性樹脂組成物およびこれを用いた感光性エレメント
JP31881388A JPH02163742A (ja) 1988-12-16 1988-12-16 感光性樹脂組成物およびこれを用いた感光性エレメント
JP9916889A JPH02277062A (ja) 1989-04-19 1989-04-19 感光性樹脂組成物及びこれを用いた感光性エレメント
JP1134383A JP2880523B2 (ja) 1989-05-26 1989-05-26 感光性樹脂組成物及びこれを用いた感光性エレメント

Publications (2)

Publication Number Publication Date
DE68921052D1 DE68921052D1 (de) 1995-03-23
DE68921052T2 true DE68921052T2 (de) 1995-06-01

Family

ID=27468708

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989621052 Expired - Fee Related DE68921052T2 (de) 1988-12-16 1989-12-15 Lichtempfindliche Kunststoffzusammensetzung und lichtempfindliches Element unter Verwendung dieser Zusammensetzung.

Country Status (2)

Country Link
EP (1) EP0373952B1 (de)
DE (1) DE68921052T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200512543A (en) * 2003-08-06 2005-04-01 Sumitomo Bakelite Co Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
CN110028670A (zh) * 2019-04-11 2019-07-19 明士新材料有限公司 低介电损耗负性光敏聚酰胺酸酯树脂、树脂组合物、其制备方法及应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4515887A (en) * 1983-08-29 1985-05-07 General Electric Company Photopatternable dielectric compositions, method for making and use
DE3411697A1 (de) * 1984-03-29 1985-10-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-reliefstrukturen
DE3411660A1 (de) * 1984-03-29 1985-10-03 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-vorstufen
US4578328A (en) * 1984-07-09 1986-03-25 General Electric Company Photopatternable polyimide compositions and method for making
US4551522A (en) * 1985-04-26 1985-11-05 E. I. Du Pont De Nemours And Company Process for making photopolymerizable aromatic polyamic acid derivatives
EP0262446B1 (de) * 1986-09-04 1993-07-21 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Hoch molekulare, amphiphile, photoempfindliche Photopolymere und Herstellungsverfahren

Also Published As

Publication number Publication date
EP0373952A2 (de) 1990-06-20
EP0373952A3 (en) 1990-10-03
EP0373952B1 (de) 1995-02-08
DE68921052D1 (de) 1995-03-23

Similar Documents

Publication Publication Date Title
DE69609757D1 (de) Lichtempfindliche Kunststoffzusammensetzung und lichtempfindliches Element unter Verwendung dieser Zusammensetzung
NO890568L (no) Substituerte pyrroler.
DE68925134T2 (de) Auflade-Element
FI894647A (fi) Ishockeyklubba av sammansatta material samt dess framstaellningsfoerfarande.
DE68926401T2 (de) Lichtempfindliches Material
DE68921952T2 (de) Spannungsgesteuerter Oszillator.
DE68907500D1 (de) Spannungsgesteuerter oszillator.
DK442689D0 (da) Polyisocyanatmaterialer
DE68923408D1 (de) Lichtempfindliches Farbmaterial.
DE69010768T2 (de) Lichtempfindliche Harzzusammensetzung und Laminat unter Verwendung dieser Zusammensetzung.
DE68910621T2 (de) Nichtlineare spannungsabhängige Widerstände.
DE68920758D1 (de) Farbige Tonerzusammensetzung.
DE68921052T2 (de) Lichtempfindliche Kunststoffzusammensetzung und lichtempfindliches Element unter Verwendung dieser Zusammensetzung.
DE68929044D1 (de) Künstliches Tastenmaterial
DE69108424D1 (de) Spannungsgesteuerter Widerstand.
DE68915068T2 (de) Stabilisiertes photographisches Aufzeichnungsmaterial.
ATA290688A (de) Bandartiges konstruktionselement
DE68919890D1 (de) Pyroelektrisches Element.
NO884825L (no) Formtilpasset baereelement.
ATA187988A (de) Leitungselement
DE69018775T2 (de) Lichtempfindliches Harz und daraus hergestelltes Element.
FR2637306B1 (fr) Element de construction
DE3866798D1 (de) Einrichtung mit drei zustaenden und komparatoreinrichtung unter verwendung derselben.
DE3853988D1 (de) Elektrophotographisches Element.
DE68924476T2 (de) Photographisches Element und dessen Herstellung.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee