DE68917529D1 - Lichtempfindliche Zusammensetzung und lichtempfindliche lithographische Druckplatte. - Google Patents

Lichtempfindliche Zusammensetzung und lichtempfindliche lithographische Druckplatte.

Info

Publication number
DE68917529D1
DE68917529D1 DE68917529T DE68917529T DE68917529D1 DE 68917529 D1 DE68917529 D1 DE 68917529D1 DE 68917529 T DE68917529 T DE 68917529T DE 68917529 T DE68917529 T DE 68917529T DE 68917529 D1 DE68917529 D1 DE 68917529D1
Authority
DE
Germany
Prior art keywords
photosensitive
printing plate
lithographic printing
composition
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68917529T
Other languages
English (en)
Other versions
DE68917529T2 (de
Inventor
Kiyoshi Goto
Hideyuki Nakai
Hiroshi Tomiyasu
Yoshiko Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Konica Minolta Inc
Original Assignee
Mitsubishi Kasei Corp
Konica Minolta Inc
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63133508A external-priority patent/JP2539664B2/ja
Priority claimed from JP14547688A external-priority patent/JPH021855A/ja
Priority claimed from JP18062488A external-priority patent/JPH0229750A/ja
Application filed by Mitsubishi Kasei Corp, Konica Minolta Inc, Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Kasei Corp
Publication of DE68917529D1 publication Critical patent/DE68917529D1/de
Application granted granted Critical
Publication of DE68917529T2 publication Critical patent/DE68917529T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE68917529T 1988-05-31 1989-05-30 Lichtempfindliche Zusammensetzung und lichtempfindliche lithographische Druckplatte. Expired - Fee Related DE68917529T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63133508A JP2539664B2 (ja) 1988-05-31 1988-05-31 感光性平版印刷版
JP14547688A JPH021855A (ja) 1988-06-13 1988-06-13 感光性平版印刷版
JP18062488A JPH0229750A (ja) 1988-07-20 1988-07-20 感光性組成物および感光性平版印刷版

Publications (2)

Publication Number Publication Date
DE68917529D1 true DE68917529D1 (de) 1994-09-22
DE68917529T2 DE68917529T2 (de) 1995-04-06

Family

ID=27316709

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68917529T Expired - Fee Related DE68917529T2 (de) 1988-05-31 1989-05-30 Lichtempfindliche Zusammensetzung und lichtempfindliche lithographische Druckplatte.

Country Status (2)

Country Link
EP (1) EP0345016B1 (de)
DE (1) DE68917529T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09160233A (ja) 1995-11-17 1997-06-20 Hoechst Ag 平版印刷板製造用感放射線記録材料
EP1077392A1 (de) * 1999-08-16 2001-02-21 Fuji Photo Film Co., Ltd. Lichtempfindliche lithographische Druckplatte

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3868254A (en) * 1972-11-29 1975-02-25 Gaf Corp Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants
DE3174017D1 (en) * 1980-12-17 1986-04-10 Konishiroku Photo Ind Photosensitive compositions
EP0287212B1 (de) * 1987-03-12 1994-12-28 Mitsubishi Chemical Corporation Lichtempfindliche positive Flachdruckplatte

Also Published As

Publication number Publication date
EP0345016A3 (en) 1990-07-11
EP0345016B1 (de) 1994-08-17
EP0345016A2 (de) 1989-12-06
DE68917529T2 (de) 1995-04-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee