DE68907565T2 - Vorrichtung mit Hochvakuumkammer. - Google Patents

Vorrichtung mit Hochvakuumkammer.

Info

Publication number
DE68907565T2
DE68907565T2 DE89311911T DE68907565T DE68907565T2 DE 68907565 T2 DE68907565 T2 DE 68907565T2 DE 89311911 T DE89311911 T DE 89311911T DE 68907565 T DE68907565 T DE 68907565T DE 68907565 T2 DE68907565 T2 DE 68907565T2
Authority
DE
Germany
Prior art keywords
vacuum chamber
high vacuum
chamber
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE89311911T
Other languages
English (en)
Other versions
DE68907565D1 (de
Inventor
Loren Neil Pfeiffer
Kenneth William West
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
American Telephone and Telegraph Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc
Application granted granted Critical
Publication of DE68907565D1 publication Critical patent/DE68907565D1/de
Publication of DE68907565T2 publication Critical patent/DE68907565T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
    • F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D8/00—Cold traps; Cold baffles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S417/00—Pumps
    • Y10S417/901—Cryogenic pumps

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
DE89311911T 1988-11-23 1989-11-16 Vorrichtung mit Hochvakuumkammer. Expired - Fee Related DE68907565T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/276,082 US4873833A (en) 1988-11-23 1988-11-23 Apparatus comprising a high-vacuum chamber

Publications (2)

Publication Number Publication Date
DE68907565D1 DE68907565D1 (de) 1993-08-19
DE68907565T2 true DE68907565T2 (de) 1994-01-27

Family

ID=23055088

Family Applications (1)

Application Number Title Priority Date Filing Date
DE89311911T Expired - Fee Related DE68907565T2 (de) 1988-11-23 1989-11-16 Vorrichtung mit Hochvakuumkammer.

Country Status (4)

Country Link
US (1) US4873833A (de)
EP (1) EP0370702B1 (de)
JP (1) JPH0714472B2 (de)
DE (1) DE68907565T2 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6318093B2 (en) 1988-09-13 2001-11-20 Helix Technology Corporation Electronically controlled cryopump
US6022195A (en) 1988-09-13 2000-02-08 Helix Technology Corporation Electronically controlled vacuum pump with control module
EP0384922B1 (de) * 1989-02-28 1993-07-14 Leybold Aktiengesellschaft Mit einem zweistufigen Refrigerator betriebene Kryopumpe
US5261244A (en) * 1992-05-21 1993-11-16 Helix Technology Corporation Cryogenic waterpump
US5483803A (en) * 1993-06-16 1996-01-16 Helix Technology Corporation High conductance water pump
US6902378B2 (en) 1993-07-16 2005-06-07 Helix Technology Corporation Electronically controlled vacuum pump
US5357760A (en) * 1993-07-22 1994-10-25 Ebara Technologies Inc. Hybrid cryogenic vacuum pump apparatus and method of operation
JP2719298B2 (ja) * 1993-07-29 1998-02-25 アプライド マテリアルズ インコーポレイテッド 真空装置の冷却構造
US5469711A (en) * 1994-04-15 1995-11-28 Infrared Components Corporation Cryogenic packaging for uniform cooling
DE69510132T2 (de) 1994-07-20 2000-01-05 Applied Materials Inc Vakuumkammer für Ultrahochvakuumbehandlung bei hoher Temperatur
US6361618B1 (en) 1994-07-20 2002-03-26 Applied Materials, Inc. Methods and apparatus for forming and maintaining high vacuum environments
US5537833A (en) * 1995-05-02 1996-07-23 Helix Technology Corporation Shielded cryogenic trap
JP3452468B2 (ja) * 1997-08-15 2003-09-29 株式会社荏原製作所 ターボ分子ポンプ
US5901558A (en) * 1997-08-20 1999-05-11 Helix Technology Corporation Water pump with integral gate valve
US5887438A (en) * 1997-08-20 1999-03-30 Helix Technology Corporation Low profile in line cryogenic water pump
US5879467A (en) * 1997-09-02 1999-03-09 Applied Materials, Inc. Cycle purging a vacuum chamber during bakeout process
US6077404A (en) 1998-02-17 2000-06-20 Applied Material, Inc. Reflow chamber and process
US6193811B1 (en) 1999-03-03 2001-02-27 Applied Materials, Inc. Method for improved chamber bake-out and cool-down
JP3667202B2 (ja) * 2000-07-13 2005-07-06 株式会社荏原製作所 基板処理装置
US6367267B1 (en) * 2000-09-22 2002-04-09 Applied Epi, Inc. Integrated phase separator for ultra high vacuum system
JP4657463B2 (ja) * 2001-02-01 2011-03-23 エドワーズ株式会社 真空ポンプ
US6718775B2 (en) 2002-07-30 2004-04-13 Applied Epi, Inc. Dual chamber cooling system with cryogenic and non-cryogenic chambers for ultra high vacuum system
US7037083B2 (en) * 2003-01-08 2006-05-02 Brooks Automation, Inc. Radiation shielding coating
US7009193B2 (en) * 2003-10-31 2006-03-07 Infineon Technologies Richmond, Lp Utilization of an ion gauge in the process chamber of a semiconductor ion implanter
DE102004005415B3 (de) * 2003-12-19 2005-05-25 Universität Regensburg Vakuumpumpe und Verfahren zum Betrieb derselben
US7320224B2 (en) * 2004-01-21 2008-01-22 Brooks Automation, Inc. Method and apparatus for detecting and measuring state of fullness in cryopumps
WO2005075826A1 (de) * 2004-02-03 2005-08-18 Universität Regensburg Vakuumpumpe und verfahren zum betrieb derselben
EP2066415A2 (de) * 2006-09-25 2009-06-10 Veeco Instruments Inc. Wärmeisolierte kryotafel für vakuumabscheidungssysteme
CN101734993B (zh) * 2008-11-05 2013-11-13 新疆天业（集团）有限公司 等离子体高温碳转化反应煤粉注入管
US8900362B2 (en) * 2010-03-12 2014-12-02 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of gallium oxide single crystal
CH703216A1 (de) * 2010-05-27 2011-11-30 Hsr Ag Vorrichtung zur Verhinderung des Memory-Effekts bei Kryopumpen.
US8840380B2 (en) * 2011-01-21 2014-09-23 Toyota Motor Engineering & Manufacturing North America, Inc. Temperature control ring for vehicle air pump
US10145371B2 (en) * 2013-10-22 2018-12-04 Taiwan Semiconductor Manufacturing Co., Ltd. Ultra high vacuum cryogenic pumping apparatus with nanostructure material
CN103899511B (zh) * 2014-03-07 2016-04-06 中国科学院等离子体物理研究所 迫流内装式液氦低温冷凝泵
JP6871751B2 (ja) * 2017-02-07 2021-05-12 住友重機械工業株式会社 クライオポンプ

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3252652A (en) * 1963-01-24 1966-05-24 Bendix Balzers Vacuum Inc Process and apparatus for the production of high vacuums
US3338063A (en) * 1966-01-17 1967-08-29 500 Inc Cryopanels for cryopumps and cryopumps incorporating them
US3423947A (en) * 1967-07-17 1969-01-28 Yosimaro Moriya Vacuum traps utilizing electronic refrigerating elements
US3443390A (en) * 1967-10-05 1969-05-13 Nasa Space simulator
FR1587077A (de) * 1968-08-01 1970-03-13
CH476215A (de) * 1968-08-20 1969-07-31 Balzers Patent Beteilig Ag Verfahren zum Betrieb einer kryogenen Pumpstufe und Hochvakuumpumpanordnung zur Durchführung des Verfahrens
FR2114039A5 (de) * 1970-11-13 1972-06-30 Air Liquide
BE791888A (fr) * 1971-11-26 1973-05-24 Air Liquide Dispositif de cryopompage
JPS5533059A (en) * 1978-08-28 1980-03-08 Semiconductor Res Found Pressure-reduced reactor
US4212170A (en) * 1979-04-16 1980-07-15 Oerlikon Buhrle USA Incorporated Cryopump
US4514204A (en) * 1983-03-21 1985-04-30 Air Products And Chemicals, Inc. Bakeable cryopump
FR2545588B1 (fr) * 1983-05-05 1985-10-11 Air Liquide Appareil de refrigeration et piege frigorifique comprenant un tel appareil
JPS60161702A (ja) * 1984-01-27 1985-08-23 Seiko Instr & Electronics Ltd 真空用冷却トラツプ
US4559787A (en) * 1984-12-04 1985-12-24 The United States Of America As Represented By The United States Department Of Energy Vacuum pump apparatus

Also Published As

Publication number Publication date
EP0370702B1 (de) 1993-07-14
EP0370702A1 (de) 1990-05-30
US4873833A (en) 1989-10-17
JPH02245232A (ja) 1990-10-01
JPH0714472B2 (ja) 1995-02-22
DE68907565D1 (de) 1993-08-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: BLUMBACH, KRAMER & PARTNER, 65193 WIESBADEN

8339 Ceased/non-payment of the annual fee