KR920010370U - 고진공 챔버장치 - Google Patents

고진공 챔버장치

Info

Publication number
KR920010370U
KR920010370U KR2019900018746U KR900018746U KR920010370U KR 920010370 U KR920010370 U KR 920010370U KR 2019900018746 U KR2019900018746 U KR 2019900018746U KR 900018746 U KR900018746 U KR 900018746U KR 920010370 U KR920010370 U KR 920010370U
Authority
KR
South Korea
Prior art keywords
vacuum chamber
high vacuum
chamber device
vacuum
chamber
Prior art date
Application number
KR2019900018746U
Other languages
English (en)
Other versions
KR940000402Y1 (ko
Inventor
김영도
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019900018746U priority Critical patent/KR940000402Y1/ko
Publication of KR920010370U publication Critical patent/KR920010370U/ko
Application granted granted Critical
Publication of KR940000402Y1 publication Critical patent/KR940000402Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
KR2019900018746U 1990-11-30 1990-11-30 고진공 챔버장치 KR940000402Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019900018746U KR940000402Y1 (ko) 1990-11-30 1990-11-30 고진공 챔버장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019900018746U KR940000402Y1 (ko) 1990-11-30 1990-11-30 고진공 챔버장치

Publications (2)

Publication Number Publication Date
KR920010370U true KR920010370U (ko) 1992-06-17
KR940000402Y1 KR940000402Y1 (ko) 1994-01-24

Family

ID=19306217

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019900018746U KR940000402Y1 (ko) 1990-11-30 1990-11-30 고진공 챔버장치

Country Status (1)

Country Link
KR (1) KR940000402Y1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100435077B1 (ko) * 2001-08-22 2004-06-16 최문진 간접폐쇄식 고압샤워 마사지기
KR100453839B1 (ko) * 2001-09-04 2004-10-26 진천건설(주) 수중식 물안마 구조를 갖는 건강탕
KR20030039528A (ko) * 2001-11-13 2003-05-22 이정범 안마볼 건강방 설비

Also Published As

Publication number Publication date
KR940000402Y1 (ko) 1994-01-24

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