DE68902591D1 - Roentgenstrahl-absorptionsmittel fuer roentgenstrahllithographie und herstellung durch zerstaeubung. - Google Patents

Roentgenstrahl-absorptionsmittel fuer roentgenstrahllithographie und herstellung durch zerstaeubung.

Info

Publication number
DE68902591D1
DE68902591D1 DE8989110677T DE68902591T DE68902591D1 DE 68902591 D1 DE68902591 D1 DE 68902591D1 DE 8989110677 T DE8989110677 T DE 8989110677T DE 68902591 T DE68902591 T DE 68902591T DE 68902591 D1 DE68902591 D1 DE 68902591D1
Authority
DE
Germany
Prior art keywords
ray
spraying
manufacture
absorption agent
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8989110677T
Other languages
English (en)
Other versions
DE68902591T2 (de
Inventor
Masao C O Fujitsu Limit Yamada
Masafumi C O Fujitsu Nakaishi
Jinko C O Fujitsu Limite Kudou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE68902591D1 publication Critical patent/DE68902591D1/de
Application granted granted Critical
Publication of DE68902591T2 publication Critical patent/DE68902591T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/08—Electrical details
    • H05G1/26—Measuring, controlling or protecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE8989110677T 1988-06-14 1989-06-13 Roentgenstrahl-absorptionsmittel fuer roentgenstrahllithographie und herstellung durch zerstaeubung. Expired - Fee Related DE68902591T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14654688A JP2742056B2 (ja) 1988-06-14 1988-06-14 Ｘ線マスク

Publications (2)

Publication Number Publication Date
DE68902591D1 true DE68902591D1 (de) 1992-10-01
DE68902591T2 DE68902591T2 (de) 1993-04-08

Family

ID=15410103

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8989110677T Expired - Fee Related DE68902591T2 (de) 1988-06-14 1989-06-13 Roentgenstrahl-absorptionsmittel fuer roentgenstrahllithographie und herstellung durch zerstaeubung.

Country Status (4)

Country Link
EP (1) EP0346828B1 (de)
JP (1) JP2742056B2 (de)
KR (1) KR910007247B1 (de)
DE (1) DE68902591T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3119237B2 (ja) 1998-05-22 2000-12-18 日本電気株式会社 Ｘ線マスクとその製造方法及び半導体デバイスとその製造方法
JPS63222109A (ja) * 1987-03-11 1988-09-16 Sunstar Inc 毛髪処理剤
US4886942A (en) * 1989-02-24 1989-12-12 Molex Incorporated Strain relief structure for connecting flat flexible cable to a circuit board
US5196283A (en) * 1989-03-09 1993-03-23 Canon Kabushiki Kaisha X-ray mask structure, and x-ray exposure process
US5464711A (en) * 1994-08-01 1995-11-07 Motorola Inc. Process for fabricating an X-ray absorbing mask
JP2877190B2 (ja) * 1996-01-09 1999-03-31 日本電気株式会社 Ｘ線マスク及びその製造方法
US6066418A (en) * 1996-07-10 2000-05-23 Nec Corporation X-ray mask and fabrication process therefor
US6139699A (en) * 1997-05-27 2000-10-31 Applied Materials, Inc. Sputtering methods for depositing stress tunable tantalum and tantalum nitride films
US6911124B2 (en) 1998-09-24 2005-06-28 Applied Materials, Inc. Method of depositing a TaN seed layer
US7253109B2 (en) 1997-11-26 2007-08-07 Applied Materials, Inc. Method of depositing a tantalum nitride/tantalum diffusion barrier layer system
TWI223873B (en) 1998-09-24 2004-11-11 Applied Materials Inc Nitrogen-containing tantalum films
JP2002246299A (ja) * 2001-02-20 2002-08-30 Oki Electric Ind Co Ltd 反射型露光マスク、反射型露光マスクの製造方法、及び半導体素子
KR101109229B1 (ko) * 2010-05-14 2012-01-30 주식회사 케이이씨 이중 접합 게이트를 갖는 반도체 디바이스 및 그 제조 방법
JP2022188992A (ja) * 2021-06-10 2022-12-22 Hoya株式会社 マスクブランク、反射型マスク及び半導体デバイスの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447976A1 (de) * 1965-09-30 1969-10-09 Telefunken Patent Verfahren zum Herstellen von Belichtungsmasken mit hohem Kontrast
US3873824A (en) * 1973-10-01 1975-03-25 Texas Instruments Inc X-ray lithography mask
JPS63136521A (ja) * 1986-11-27 1988-06-08 Sharp Corp Ｘ線リソグラフイ−用マスク
JP3343976B2 (ja) * 1993-02-18 2002-11-11 松下電器産業株式会社 衛生洗浄装置

Also Published As

Publication number Publication date
KR910002308A (ko) 1991-01-31
EP0346828B1 (de) 1992-08-26
KR910007247B1 (en) 1991-09-24
JP2742056B2 (ja) 1998-04-22
EP0346828A2 (de) 1989-12-20
EP0346828A3 (en) 1990-03-28
JPH022109A (ja) 1990-01-08
DE68902591T2 (de) 1993-04-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee