DE631649C - Trockengleichrichter - Google Patents
TrockengleichrichterInfo
- Publication number
- DE631649C DE631649C DEN31575A DEN0031575A DE631649C DE 631649 C DE631649 C DE 631649C DE N31575 A DEN31575 A DE N31575A DE N0031575 A DEN0031575 A DE N0031575A DE 631649 C DE631649 C DE 631649C
- Authority
- DE
- Germany
- Prior art keywords
- anode
- group
- dry rectifier
- rectifier according
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 150000002739 metals Chemical class 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 6
- 230000000737 periodic effect Effects 0.000 claims description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 claims description 4
- 229910052740 iodine Inorganic materials 0.000 claims description 4
- 239000011630 iodine Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- BWFPGXWASODCHM-UHFFFAOYSA-N copper monosulfide Chemical compound [Cu]=S BWFPGXWASODCHM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 239000011593 sulfur Substances 0.000 claims description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 14
- 229910052726 zirconium Inorganic materials 0.000 description 13
- 239000010410 layer Substances 0.000 description 11
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 5
- 229910052776 Thorium Inorganic materials 0.000 description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 239000010405 anode material Substances 0.000 description 3
- 229910052735 hafnium Inorganic materials 0.000 description 3
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- MBMLMWLHJBBADN-UHFFFAOYSA-N Ferrous sulfide Chemical compound [Fe]=S MBMLMWLHJBBADN-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229910021607 Silver chloride Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 2
- 229910052981 lead sulfide Inorganic materials 0.000 description 2
- 229940056932 lead sulfide Drugs 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000012857 radioactive material Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- ITRNXVSDJBHYNJ-UHFFFAOYSA-N tungsten disulfide Chemical compound S=[W]=S ITRNXVSDJBHYNJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/16—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising cuprous oxide or cuprous iodide
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B42/00—Obtaining records using waves other than optical waves; Visualisation of such records by using optical means
- G03B42/02—Obtaining records using waves other than optical waves; Visualisation of such records by using optical means using X-rays
- G03B42/025—Positioning or masking the X-ray film cartridge in the radiographic apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/46—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
- H01L21/479—Application of electric currents or fields, e.g. for electroforming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/24—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Hybrid Cells (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL50649A NL34153C (US07122603-20061017-C00045.png) | 1930-03-08 | 1930-03-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE631649C true DE631649C (de) | 1936-06-25 |
Family
ID=47996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEN31575A Expired DE631649C (de) | 1930-03-08 | 1931-02-14 | Trockengleichrichter |
Country Status (9)
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1010646B (de) * | 1951-10-26 | 1957-06-19 | Int Standard Electric Corp | Trockengleichrichter |
DE1042133B (de) * | 1955-10-09 | 1958-10-30 | Koji Yoshida | Verfahren zur Herstellung von Titanoxyd-Gleichrichtern |
DE1093911B (de) * | 1957-06-03 | 1960-12-01 | Sperry Rand Corp | Verfahren zur Befestigung einer metallischen Kontakt-Elektrode an dem Koerper aus halbleitendem Material einer Halbleiteranordnung |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2749489A (en) * | 1950-12-04 | 1956-06-05 | Int Standard Electric Corp | Dry contact rectifiers |
US2749596A (en) * | 1952-01-04 | 1956-06-12 | Robert G Breckenridge | Method of making titanium dioxide rectifiers |
US2766508A (en) * | 1952-05-22 | 1956-10-16 | Gen Electric | Blocking layer for titanium oxide rectifier |
US2784639A (en) * | 1953-05-04 | 1957-03-12 | Eastman Kodak Co | Titanium nitride coated optical element |
US2874102A (en) * | 1953-08-12 | 1959-02-17 | Rca Corp | Electrodes and methods of making same |
US3198718A (en) * | 1960-05-26 | 1965-08-03 | Lockheed Aircraft Corp | Method for making structurally integrated film resistor assembly |
US3199999A (en) * | 1961-03-23 | 1965-08-10 | Hi Shear Corp | Pigment of titanium having titanium oxide coating; electrolytic method of making pigment; and reflector and paint containing same |
US3180807A (en) * | 1961-10-23 | 1965-04-27 | Lockheed Aircraft Corp | Method for making film resistors |
-
1930
- 1930-03-08 NL NL50649A patent/NL34153C/nl active
-
1931
- 1931-01-13 DK DK45412D patent/DK45412C/da active
- 1931-01-22 US US510580A patent/US1985118A/en not_active Expired - Lifetime
- 1931-02-12 BE BE377298A patent/BE377298A/fr unknown
- 1931-02-13 CH CH155911D patent/CH155911A/de unknown
- 1931-02-13 GB GB4584/31A patent/GB361738A/en not_active Expired
- 1931-02-14 AT AT128220D patent/AT128220B/de active
- 1931-02-14 DE DEN31575A patent/DE631649C/de not_active Expired
- 1931-02-25 FR FR712098D patent/FR712098A/fr not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1010646B (de) * | 1951-10-26 | 1957-06-19 | Int Standard Electric Corp | Trockengleichrichter |
DE1042133B (de) * | 1955-10-09 | 1958-10-30 | Koji Yoshida | Verfahren zur Herstellung von Titanoxyd-Gleichrichtern |
DE1093911B (de) * | 1957-06-03 | 1960-12-01 | Sperry Rand Corp | Verfahren zur Befestigung einer metallischen Kontakt-Elektrode an dem Koerper aus halbleitendem Material einer Halbleiteranordnung |
Also Published As
Publication number | Publication date |
---|---|
DK45412C (da) | 1932-03-21 |
NL34153C (US07122603-20061017-C00045.png) | 1934-10-23 |
AT128220B (de) | 1932-05-10 |
US1985118A (en) | 1934-12-18 |
CH155911A (de) | 1932-07-15 |
GB361738A (en) | 1931-11-26 |
FR712098A (fr) | 1931-09-24 |
BE377298A (US07122603-20061017-C00045.png) | 1931-03-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE631649C (de) | Trockengleichrichter | |
DE2009931A1 (de) | Mit hoher Geschwindigkeit sich verbrauchende metallische Elektroden | |
DE2132270B2 (de) | Bleiakkumulatorzelle mit Masseträger aus Legierungen auf Titanbasis | |
DE1671455A1 (de) | Elektrochemische Elektrode | |
DE511038C (de) | Trocken-Gleichrichterzelle | |
DE1496122A1 (de) | Primaerbatterie | |
DE2262660B2 (de) | Nichtwäßriges galvanisches Element | |
DE2511190A1 (de) | Bleidioxidbatterieplatte und verfahren zu deren herstellung | |
DE1806417A1 (de) | Brennstoffzellenelektrode | |
DE2652027A1 (de) | Elektrochemischer generator auf schwefel-natriumbasis | |
DE2010988A1 (de) | Elektrochemische Stromquelle | |
DE645753C (de) | Verfahren zur Verhinderung bzw. Verringerung der Gasentwicklung an der Kathode bei der Ladung von Akkumulatoren | |
CH625084A5 (US07122603-20061017-C00045.png) | ||
DE2032645A1 (de) | Verfahren zur Herstellung von Diffusionsuberzugen aus Tantal oder Niob auf Metallen oder Metallegierungen | |
DE2736995A1 (de) | Feste elektrolytzusammensetzung und diese enthaltendes, elektrischen strom lieferndes element | |
DE2322695A1 (de) | Elektrochemisches bauelement | |
DE628458C (de) | Druckkontakt-Trockengleichrichter | |
AT105971B (de) | Trockene Gleichrichterzelle. | |
DE591168C (de) | Verfahren zur Herstellung von Kuprisulfid fuer negative Elektroden von Trockengleichrichterzellen | |
AT106408B (de) | Trockene Gleichrichterzelle. | |
DE658362C (de) | Lichtelektrische Zelle mit Halbleiterschicht | |
DE484478C (de) | Trockne Gleichrichterzelle | |
DE500533C (de) | Trockne Gleichrichterzelle | |
DE565502C (de) | Verfahren zur Herstellung von unipolaren Leitern | |
DE387072C (de) | Galvanisches Element |