DE60333913D1 - Polymerische antireflexbeschichtungen, die durch plasmaverstärkte chemische aufdampfung abgelagert werden - Google Patents

Polymerische antireflexbeschichtungen, die durch plasmaverstärkte chemische aufdampfung abgelagert werden

Info

Publication number
DE60333913D1
DE60333913D1 DE60333913T DE60333913T DE60333913D1 DE 60333913 D1 DE60333913 D1 DE 60333913D1 DE 60333913 T DE60333913 T DE 60333913T DE 60333913 T DE60333913 T DE 60333913T DE 60333913 D1 DE60333913 D1 DE 60333913D1
Authority
DE
Germany
Prior art keywords
plasma
methods
chemical vapor
polymeric
vaporing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60333913T
Other languages
English (en)
Inventor
Ram W Sabnis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brewer Science Inc
Original Assignee
Brewer Science Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Application granted granted Critical
Publication of DE60333913D1 publication Critical patent/DE60333913D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F238/00—Copolymers of compounds having one or more carbon-to-carbon triple bonds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D165/00—Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0276—Photolithographic processes using an anti-reflective coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Vapour Deposition (AREA)
DE60333913T 2002-04-30 2003-04-28 Polymerische antireflexbeschichtungen, die durch plasmaverstärkte chemische aufdampfung abgelagert werden Expired - Lifetime DE60333913D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US37663402P 2002-04-30 2002-04-30
US10/423,618 US6852474B2 (en) 2002-04-30 2003-04-24 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
PCT/US2003/013339 WO2003094213A1 (en) 2002-04-30 2003-04-28 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition

Publications (1)

Publication Number Publication Date
DE60333913D1 true DE60333913D1 (de) 2010-10-07

Family

ID=29406764

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60333913T Expired - Lifetime DE60333913D1 (de) 2002-04-30 2003-04-28 Polymerische antireflexbeschichtungen, die durch plasmaverstärkte chemische aufdampfung abgelagert werden

Country Status (9)

Country Link
US (1) US6852474B2 (de)
EP (1) EP1502292B1 (de)
JP (1) JP2005524240A (de)
KR (1) KR20050003363A (de)
AT (1) ATE479198T1 (de)
AU (1) AU2003232015A1 (de)
DE (1) DE60333913D1 (de)
TW (1) TW200400417A (de)
WO (1) WO2003094213A1 (de)

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US20050255410A1 (en) * 2004-04-29 2005-11-17 Guerrero Douglas J Anti-reflective coatings using vinyl ether crosslinkers
DE102005018737A1 (de) * 2005-04-22 2006-10-26 Infineon Technologies Ag Verfahren zum Übertragen von Strukturen von einer Fotomaske in eine Fotolackschicht
US7375172B2 (en) * 2005-07-06 2008-05-20 International Business Machines Corporation Underlayer compositions containing heterocyclic aromatic structures
KR101152139B1 (ko) * 2005-12-06 2012-06-15 삼성전자주식회사 표시 장치용 세정제 및 이를 사용하는 박막 트랜지스터표시판의 제조 방법
US7914974B2 (en) 2006-08-18 2011-03-29 Brewer Science Inc. Anti-reflective imaging layer for multiple patterning process
CN101743640B (zh) * 2007-07-26 2012-12-19 康斯坦茨大学 具有回蚀刻发射极的硅太阳能电池的制造方法和相应的太阳能电池
US20090096106A1 (en) * 2007-10-12 2009-04-16 Air Products And Chemicals, Inc. Antireflective coatings
US8133659B2 (en) 2008-01-29 2012-03-13 Brewer Science Inc. On-track process for patterning hardmask by multiple dark field exposures
US20090325106A1 (en) * 2008-06-27 2009-12-31 Conley Willard E Method for Implant Imaging with Spin-on Hard Masks
US9640396B2 (en) 2009-01-07 2017-05-02 Brewer Science Inc. Spin-on spacer materials for double- and triple-patterning lithography
KR101866828B1 (ko) * 2010-10-14 2018-06-14 닛산 가가쿠 고교 가부시키 가이샤 폴리에테르 구조를 함유하는 수지를 포함하는 리소그래피용 레지스트 하층막 형성 조성물
US9689072B2 (en) 2014-09-01 2017-06-27 Asm Ip Holding B.V. Method of depositing thin film
WO2016167583A1 (ko) * 2015-04-15 2016-10-20 엘지전자 주식회사 그래핀의 도핑 방법, 그래핀 복합 전극의 제조 방법 및 이를 포함하는 그래핀 구조체
KR102278459B1 (ko) * 2018-08-21 2021-07-16 삼성에스디아이 주식회사 중합체, 유기막 조성물 및 패턴 형성 방법
JP7395773B2 (ja) 2020-05-12 2023-12-11 ラム リサーチ コーポレーション 刺激応答性ポリマー膜の制御された分解
JP2023533710A (ja) * 2020-07-02 2023-08-04 ラム リサーチ コーポレーション 表面保護及び待ち時間延長のための除去可能なｃｖｄポリマーフィルム

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Also Published As

Publication number Publication date
WO2003094213A1 (en) 2003-11-13
TW200400417A (en) 2004-01-01
EP1502292A4 (de) 2009-01-21
EP1502292A1 (de) 2005-02-02
US20030224586A1 (en) 2003-12-04
JP2005524240A (ja) 2005-08-11
AU2003232015A1 (en) 2003-11-17
EP1502292B1 (de) 2010-08-25
ATE479198T1 (de) 2010-09-15
KR20050003363A (ko) 2005-01-10
US6852474B2 (en) 2005-02-08

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