DE60332768D1 - Fluorarylsulfonium fotosäure erzeugende verbindungen - Google Patents

Fluorarylsulfonium fotosäure erzeugende verbindungen

Info

Publication number
DE60332768D1
DE60332768D1 DE60332768T DE60332768T DE60332768D1 DE 60332768 D1 DE60332768 D1 DE 60332768D1 DE 60332768 T DE60332768 T DE 60332768T DE 60332768 T DE60332768 T DE 60332768T DE 60332768 D1 DE60332768 D1 DE 60332768D1
Authority
DE
Germany
Prior art keywords
pags
sulfonium
present
sulfonium pags
monomers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60332768T
Other languages
English (en)
Inventor
Eric S Kolb
Erdem A Cetin
Kirk D Hutchinson
Richard A Minns
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forcetec Co Ltd Changwon Gyeongsangnam Kr
Original Assignee
STX Aprilis Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STX Aprilis Inc filed Critical STX Aprilis Inc
Application granted granted Critical
Publication of DE60332768D1 publication Critical patent/DE60332768D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C07F5/027—Organoboranes and organoborohydrides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Holo Graphy (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE60332768T 2002-12-23 2003-12-22 Fluorarylsulfonium fotosäure erzeugende verbindungen Expired - Lifetime DE60332768D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43652102P 2002-12-23 2002-12-23
PCT/US2003/041175 WO2004058699A2 (en) 2002-12-23 2003-12-22 Fluoroarylsulfonium photoacid generators

Publications (1)

Publication Number Publication Date
DE60332768D1 true DE60332768D1 (de) 2010-07-08

Family

ID=32682402

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60332768T Expired - Lifetime DE60332768D1 (de) 2002-12-23 2003-12-22 Fluorarylsulfonium fotosäure erzeugende verbindungen

Country Status (6)

Country Link
US (2) US20050059543A1 (de)
EP (1) EP1583740B1 (de)
AT (1) ATE469126T1 (de)
AU (1) AU2003303482A1 (de)
DE (1) DE60332768D1 (de)
WO (1) WO2004058699A2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1583740B1 (de) * 2002-12-23 2010-05-26 STX Aprilis, Inc. Fluorarylsulfonium fotosäure erzeugende verbindungen
US7192686B2 (en) * 2004-03-31 2007-03-20 Intel Corporation Photoacid generators based on novel superacids
US7498123B2 (en) 2005-03-03 2009-03-03 Exciton, Inc. Infrared dye compositions
DE102006005103A1 (de) * 2006-02-04 2007-08-09 Merck Patent Gmbh Oxonium- und Sulfoniumsalze
US8222364B2 (en) * 2006-04-11 2012-07-17 Dow Corning Corporation Composition including a siloxane and a method of forming the same
US7547501B2 (en) 2006-10-05 2009-06-16 Az Electronic Materials Usa Corp. Photoactive compounds
JP5115126B2 (ja) * 2007-10-05 2013-01-09 Ｔｄｋ株式会社 ホログラム記録媒体
US20090202919A1 (en) * 2007-10-23 2009-08-13 Stx Aprilis, Inc. Apparatus and methods for threshold control of photopolymerization for holographic data storage using at least two wavelengths
WO2009067788A1 (en) * 2007-11-27 2009-06-04 Southbourne Investments Ltd. Holographic recording medium
CN102209939A (zh) * 2008-11-08 2011-10-05 大赛璐化学工业株式会社 体全息记录用感光性组合物及其制造方法
WO2010066380A1 (en) * 2008-12-12 2010-06-17 Bayer Schering Pharma Aktiengesellschaft Triaryl-sulphonium compounds, kit and methods for labeling positron emitting isotopes
JP2012220690A (ja) * 2011-04-07 2012-11-12 Tdk Corp ホログラフィック記録媒体の記録露光量決定方法及び記録方法
CN103797074B (zh) * 2011-05-25 2016-01-20 道康宁公司 包含环氧官能硅氧烷低聚物的环氧官能可辐射固化组合物
US8728715B2 (en) * 2012-01-13 2014-05-20 Funai Electric Co., Ltd. Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate
JP6240409B2 (ja) * 2013-05-31 2017-11-29 サンアプロ株式会社 スルホニウム塩および光酸発生剤
JP6244109B2 (ja) * 2013-05-31 2017-12-06 東京応化工業株式会社 レジスト組成物、化合物、高分子化合物及びレジストパターン形成方法
JP6414411B2 (ja) 2013-08-09 2018-10-31 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 積層造形用の低粘度液状放射線硬化型歯科アライナー成形型用樹脂組成物
EP2868692B1 (de) 2013-11-05 2017-10-25 DSM IP Assets B.V. Stabilisierte matrixgefüllte flüssige strahlungshärtbare Harzzusammensetzungen zur Additivherstellung
CN104238268B (zh) * 2014-08-15 2017-12-26 同济大学 以三苯乙烯为主体的硫鎓盐类光生酸剂、制备方法及其应用
KR102698770B1 (ko) 2015-06-08 2024-08-23 스트래터시스,인코포레이티드 부가적 제조용 액체 하이브리드 자외선/가시광선 복사선-경화성 수지 조성물
EP3567428B1 (de) 2015-10-01 2021-06-23 DSM IP Assets B.V. Flüssige hybride uv/vis-strahlungshärtbare harzzusammensetzungen zur generativen fertigung
EP3827955A1 (de) 2015-11-17 2021-06-02 DSM IP Assets B.V. Verbesserte antimonfreie strahlungshärtbare zusammensetzungen zur generativen fertigung und anwendungen davon in feingussverfahren
JP6798071B2 (ja) 2016-03-14 2020-12-09 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 改善された靭性および耐高温性を有する付加造形用放射線硬化性組成物
JP7215654B2 (ja) 2017-12-15 2023-01-31 コベストロ （ネザーランズ） ビー．ブイ． 粘性熱硬化性樹脂を高温噴射して、積層造形を介して固体物品を作製するための組成物及び方法
CN115179544A (zh) 2017-12-29 2022-10-14 科思创(荷兰)有限公司 用于加成制造的组合物和制品及其使用方法
KR20220056207A (ko) 2019-08-30 2022-05-04 코베스트로 (네덜란드) 비.브이. 적층식 제조용 하이브리드 UV/vis 방사선 경화성 액체 수지 조성물

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4216288A (en) * 1978-09-08 1980-08-05 General Electric Company Heat curable cationically polymerizable compositions and method of curing same with onium salts and reducing agents
US4291114A (en) * 1978-10-18 1981-09-22 Minnesota Mining And Manufacturing Co. Imageable, composite-dry transfer sheet and process of using same
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
JPH04234422A (ja) * 1990-10-31 1992-08-24 Internatl Business Mach Corp <Ibm> 二重硬化エポキシバックシール処方物
US5500453A (en) * 1992-02-07 1996-03-19 Toyo Ink Manufacturing Co., Ltd. (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition
FR2688790B1 (fr) * 1992-03-23 1994-05-13 Rhone Poulenc Chimie Compositions a base de polyorganosiloxanes a groupements fonctionnels reticulables et leur utilisation pour la realisation de revetements anti-adhesifs.
FR2688783A1 (fr) * 1992-03-23 1993-09-24 Rhone Poulenc Chimie Nouveaux borates d'onium ou de complexe organometallique amorceurs cationiques de polymerisation.
US5367614A (en) * 1992-04-01 1994-11-22 Grumman Aerospace Corporation Three-dimensional computer image variable perspective display system
US5380923A (en) * 1993-04-29 1995-01-10 Minnesota Mining And Manufacturing Company Polymeric sulfonium salts and method of preparation thereof
US5514728A (en) * 1993-07-23 1996-05-07 Minnesota Mining And Manufacturing Company Catalysts and initiators for polymerization
US5702846A (en) * 1994-10-03 1997-12-30 Nippon Paint Co. Ltd. Photosensitive composition for volume hologram recording
WO1997013183A1 (en) * 1995-10-06 1997-04-10 Polaroid Corporation Holographic medium and process
JPH09278814A (ja) * 1996-04-12 1997-10-28 Nippon Kayaku Co Ltd 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JPH09278813A (ja) * 1996-04-12 1997-10-28 Nippon Kayaku Co Ltd 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JPH10152495A (ja) * 1996-11-21 1998-06-09 Nippon Kayaku Co Ltd 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
US6406770B1 (en) * 1997-12-26 2002-06-18 Dainippon Ink And Chemicals, Inc. Optical disk and method of manufacturing optical disk
KR100279497B1 (ko) * 1998-07-16 2001-02-01 박찬구 술포늄 염의 제조방법
US6512606B1 (en) * 1999-07-29 2003-01-28 Siros Technologies, Inc. Optical storage media and method for optical data storage via local changes in reflectivity of a format grating
EP1179750B1 (de) * 2000-08-08 2012-07-25 FUJIFILM Corporation Positiv arbeitende lichtempfindliche Zusammensetzung und Verfahren zur Herstellung einer integrierten Präzisions-Schaltung mit derselben
US6664022B1 (en) * 2000-08-25 2003-12-16 Shipley Company, L.L.C. Photoacid generators and photoresists comprising same
EP1583740B1 (de) * 2002-12-23 2010-05-26 STX Aprilis, Inc. Fluorarylsulfonium fotosäure erzeugende verbindungen
EP1578870A2 (de) * 2002-12-23 2005-09-28 Aprilis, Inc. Sensibilisator-farbstoff für fotosäureerzeugende systeme

Also Published As

Publication number Publication date
EP1583740A2 (de) 2005-10-12
ATE469126T1 (de) 2010-06-15
WO2004058699A3 (en) 2004-09-10
WO2004058699A2 (en) 2004-07-15
EP1583740B1 (de) 2010-05-26
US20050059543A1 (en) 2005-03-17
AU2003303482A8 (en) 2004-07-22
US20090182172A1 (en) 2009-07-16
AU2003303482A1 (en) 2004-07-22

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: FORCETEC CO., LTD., CHANGWON, GYEONGSANGNAM, KR

8364 No opposition during term of opposition