DE60324262D1 - Polymerisierbare zusammensetzung - Google Patents
Polymerisierbare zusammensetzungInfo
- Publication number
- DE60324262D1 DE60324262D1 DE60324262T DE60324262T DE60324262D1 DE 60324262 D1 DE60324262 D1 DE 60324262D1 DE 60324262 T DE60324262 T DE 60324262T DE 60324262 T DE60324262 T DE 60324262T DE 60324262 D1 DE60324262 D1 DE 60324262D1
- Authority
- DE
- Germany
- Prior art keywords
- acrylic
- methacrylic acid
- polymers
- meth
- polymerizable composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 2
- -1 acrylic ester Chemical class 0.000 abstract 2
- 229920000058 polyacrylate Polymers 0.000 abstract 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 125000005395 methacrylic acid group Chemical group 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 150000002989 phenols Chemical class 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31909—Next to second addition polymer from unsaturated monomers
- Y10T428/31928—Ester, halide or nitrile of addition polymer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Dental Preparations (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
- Medicinal Preparation (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH5372002 | 2002-03-28 | ||
| PCT/EP2003/050077 WO2003082937A2 (en) | 2002-03-28 | 2003-03-21 | Polymerisable composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE60324262D1 true DE60324262D1 (de) | 2008-12-04 |
Family
ID=28458260
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60324262T Expired - Lifetime DE60324262D1 (de) | 2002-03-28 | 2003-03-21 | Polymerisierbare zusammensetzung |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US8119327B2 (de) |
| EP (1) | EP1487888B1 (de) |
| JP (1) | JP2005521763A (de) |
| KR (1) | KR20040105814A (de) |
| CN (1) | CN1294167C (de) |
| AT (1) | ATE412019T1 (de) |
| AU (1) | AU2003240751A1 (de) |
| CA (1) | CA2480421C (de) |
| DE (1) | DE60324262D1 (de) |
| ES (1) | ES2311705T3 (de) |
| WO (1) | WO2003082937A2 (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100733920B1 (ko) * | 2004-09-17 | 2007-07-02 | 주식회사 엘지화학 | 에칭 레지스트용 잉크 조성물, 이를 이용한 에칭 레지스트패턴 형성 방법 및 미세 유로 형성 방법 |
| CN101300527B (zh) * | 2005-10-27 | 2011-11-23 | 亨斯迈先进材料（瑞士）有限公司 | 含有包括环丁二醇的聚酯和均质聚酰胺共混物的透明、多层制品的制备 |
| WO2007123357A1 (en) * | 2006-04-24 | 2007-11-01 | Kolon Industries Inc. | Dry film photoresist resin composition for ldi |
| KR100951874B1 (ko) | 2006-04-24 | 2010-04-12 | 주식회사 코오롱 | Ｌｄｉ용 드라이 필름 포토레지스트 수지 조성물 |
| GB2476976A (en) | 2010-01-18 | 2011-07-20 | Lintfield Ltd | Protected aryl ketones and their use as photoinitiators |
| CN108192413B (zh) * | 2017-12-28 | 2021-02-26 | 深圳市容大感光科技股份有限公司 | 一种快速uv光固化油墨及其应用方法 |
| CN110615865A (zh) * | 2019-11-05 | 2019-12-27 | 江苏睿浦树脂科技有限公司 | 一种耐高温低黄变阻焊uv油墨用树脂及其制备方法 |
| KR102354906B1 (ko) * | 2019-12-16 | 2022-01-25 | 주식회사 노피온 | 열가소성 수지인 폴리우레탄 수지를 포함하는 이방성 도전 접착제, 이를 이용한 솔더범프의 형성 방법 및 접합구조체의 제조방법 |
| CN116376384B (zh) * | 2023-04-21 | 2024-02-02 | 江苏扬瑞新型材料股份有限公司 | 一种uv-led固化的高性能环保涂料 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4361640A (en) | 1981-10-02 | 1982-11-30 | E. I. Du Pont De Nemours And Company | Aqueous developable photopolymer compositions containing terpolymer binder |
| US4472019A (en) | 1982-12-28 | 1984-09-18 | Desoto, Inc. | Topcoats for buffer-coated optical fiber using urethane acrylate and epoxy acrylate and vinyl monomer |
| CA1246290A (en) | 1983-06-30 | 1988-12-06 | Claiborn L. Osborn | Polyol/isocyanate/lactone-acrylate adduct compositions as curable coatings |
| US4722947A (en) * | 1985-08-05 | 1988-02-02 | Pony Industries, Inc. | Production of radiation curable partial esters of anhydride-containing copolymers |
| DE3619130A1 (de) * | 1986-06-06 | 1987-12-10 | Basf Ag | Lichtempfindliches aufzeichnungselement |
| JPS63147159A (ja) | 1986-12-11 | 1988-06-20 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| DE3713601A1 (de) | 1987-04-23 | 1988-11-10 | Stockhausen Chem Fab Gmbh | Verfahren zur herstellung eines stark wasserabsorbierenden polymerisats |
| GB2212164B (en) | 1987-11-12 | 1992-01-29 | Kansai Paint Co Ltd | Low temperature curable composition |
| CN1021542C (zh) * | 1989-03-23 | 1993-07-14 | 重庆医科大学 | 髓内分叉固定器 |
| DE4023240A1 (de) * | 1990-07-21 | 1992-01-23 | Basf Ag | Modifizierte emulsionspolymerisate insbesondere fuer in wasser und waessrigen loesungsmitteln entwickelbare photopolymerisierbare aufzeichnungsmaterialien |
| US5296334A (en) | 1992-08-28 | 1994-03-22 | Macdermid, Incorporated | Radiation-curable composition useful for preparation of solder masks |
| JP3799069B2 (ja) | 1993-12-14 | 2006-07-19 | キヤノン株式会社 | エッチングレジスト性組成物、これを用いたパターン形成方法及び配線基板の製造方法 |
| JPH07170054A (ja) | 1993-12-14 | 1995-07-04 | Canon Inc | 紫外線硬化性組成物、これを用いたパターン形成方法及び配線基板の製造方法 |
| EP0696610B1 (de) * | 1994-08-12 | 2003-04-02 | SOKEN CHEMICAL & ENGINEERING CO. LTD., | Acrylfolie, Acryl-Klebfolie und Verfahren zu ihrer Herstellung |
| DE69620723T2 (de) * | 1995-12-22 | 2002-12-05 | Mitsubishi Chem Corp | Fotopolymerisierbare Zusammensetzung für einen Farbfilter, Farbfilter und Flüssigkristallanzeigevorrichtung |
| EP0801328A1 (de) * | 1996-04-09 | 1997-10-15 | Morton International, Inc. | Lichtempfindliche Bildaufzeichnungszusammensetzung mit Acryl-enthaltendem U.V. Stabilisator |
| US5925484A (en) | 1996-08-02 | 1999-07-20 | Toppan Printing Co., Ltd. | Black photosensitive resin composition, color filter made by using the same, and a process for the production thereof |
| JPH1097067A (ja) | 1996-09-20 | 1998-04-14 | Konica Corp | 感光性組成物及び感光性平版印刷版 |
| JPH10126038A (ja) | 1996-10-18 | 1998-05-15 | Canon Inc | プリント配線基板およびその製造方法 |
| JPH10152536A (ja) | 1996-11-22 | 1998-06-09 | Dainippon Printing Co Ltd | カラーフイルター用感光性着色組成物及びカラーフイルター |
| JP2000034319A (ja) | 1998-07-17 | 2000-02-02 | Dainippon Printing Co Ltd | 共重合樹脂 |
| IL133218A0 (en) | 1998-12-11 | 2001-03-19 | Shipley Co Llc | Photoimageable compositions having improved chemical resistance and stripping ability |
| KR100493961B1 (ko) | 1999-08-17 | 2005-06-10 | 주식회사 엘지화학 | 감광성 수지 조성물 |
| US6754551B1 (en) | 2000-06-29 | 2004-06-22 | Printar Ltd. | Jet print apparatus and method for printed circuit board manufacturing |
| US6605669B2 (en) * | 2001-04-03 | 2003-08-12 | E. I. Du Pont De Nemours And Company | Radiation-curable coating compounds |
| JP2005341521A (ja) | 2004-04-28 | 2005-12-08 | Nitto Denko Corp | 映像センサの実装方法およびそれに用いる粘着テープ |
-
2003
- 2003-03-21 AU AU2003240751A patent/AU2003240751A1/en not_active Abandoned
- 2003-03-21 JP JP2003580396A patent/JP2005521763A/ja active Pending
- 2003-03-21 ES ES03730162T patent/ES2311705T3/es not_active Expired - Lifetime
- 2003-03-21 EP EP20030730162 patent/EP1487888B1/de not_active Expired - Lifetime
- 2003-03-21 CN CNB038071398A patent/CN1294167C/zh not_active Expired - Lifetime
- 2003-03-21 WO PCT/EP2003/050077 patent/WO2003082937A2/en active Application Filing
- 2003-03-21 CA CA 2480421 patent/CA2480421C/en not_active Expired - Fee Related
- 2003-03-21 KR KR10-2004-7015426A patent/KR20040105814A/ko not_active Application Discontinuation
- 2003-03-21 US US10/509,319 patent/US8119327B2/en not_active Expired - Fee Related
- 2003-03-21 DE DE60324262T patent/DE60324262D1/de not_active Expired - Lifetime
- 2003-03-21 AT AT03730162T patent/ATE412019T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| ATE412019T1 (de) | 2008-11-15 |
| WO2003082937A2 (en) | 2003-10-09 |
| WO2003082937A3 (en) | 2004-02-05 |
| US8119327B2 (en) | 2012-02-21 |
| CA2480421C (en) | 2011-04-26 |
| AU2003240751A1 (en) | 2003-10-13 |
| EP1487888A2 (de) | 2004-12-22 |
| JP2005521763A (ja) | 2005-07-21 |
| WO2003082937A9 (en) | 2004-09-16 |
| EP1487888B1 (de) | 2008-10-22 |
| CN1643007A (zh) | 2005-07-20 |
| CN1294167C (zh) | 2007-01-10 |
| KR20040105814A (ko) | 2004-12-16 |
| US20050170094A1 (en) | 2005-08-04 |
| CA2480421A1 (en) | 2003-10-09 |
| ES2311705T3 (es) | 2009-02-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |